ELGA全自动超纯水处理系统的工艺和设备特点

在集成电路工业已经进入超大规模集成电路时代的今天,如何使超纯水这一重要基础材料的纯度达到电子级Ⅰ级水准,已成为我国净化技术中超纯水处理领域一个急待解决的技术问题。本文专题介绍英国ELGA公司全自动超纯水处理系统工艺流程和设备的特点,最后介绍了该系统生产的超纯水所达到的质量指标。     

表面贴装加工领域的清洗技术及市场现状

本文针对环保和绿色制造的发展趋势,就SMT制造领域是否需要取消清洗工艺做了初步的探讨,并且论述了目前国内外在该领域的技术现状和清洗工艺及设备的市场状况。     

洁净系统风管制作工艺简介

结合施工经验和国家技术规范，简要介绍对洁净风管的制作工艺和注意事项。     

Behavior of Ru surfaces after ozonated water treatment

In order for the development of cleaning technology of extreme ultra violet lithography photomask, the behavior of Ru surfaces after treatment with ozonated deionized water (DIO₃) solution was studied using Ru and ruthenium oxide particles and 2 nm-thick Ru capping layers. No significant changes in crystalline structures or chemical states of the Ru surfaces, nor any similarities with the structures or states of ruthenium oxide, were observed after DIO₃ treatment. Oxidation of ruthenium to form RuO₂ or RuO₃ was not observed. Adsorption of H₂O molecules on the Ru layer increased the surface roughness, but the desorption of H₂O molecules recovered it. Local chemisorption of H₂O molecules on the Ru surface may be the reason why rougher Ru surfaces were observed after DIO₃ cleaning.     

PCB清洗工艺及半水清洗工艺的应用

清洗是PCB组装中的一道重要工序,它对电子产品的质量和可靠性起着极为重要的作用.对于高性能电子产品,不论是通孔插装还是表面组装,在回流焊、波峰焊或浸焊后,基板及其组件都需要进行严格有效的清洗,以去除助焊剂残留物和各种污染物.特别是对于表面组装工艺,由于助焊剂可进入表面组装元器件和基板之间的微小空隙中,从而使清洗显得更为...     

在线式等离子清洗在封装中的应用

IC封装工艺过程中,芯片表面的氧化物及颗粒污染物会降低产品质量,如果在封装工艺过程中的装片前、引线键合前及塑封固化前进行等离子清洗,则可有效去除这些污染物.介绍了在线式等离子清洗设备及清洗原理,并对清洗前后的效果做了对比.     

Water-assisted femtosecond laser ablation for fabricating three-dimensional microfluidic chips

When the femtosecond laser focused in the water, the breakdown will be induced. The generated high-speed jet and shock wave can be used to etch silica glass for fabricating three-dimensional (3D) microfluidic chips. We present a simple and practical method to produce 3D multilayer microfluidic chips in silica glass. This method offers high design flexibility and fabricating feasibility. We also introduce a convenient cleaning method for diluting and ejecting the ablated debris from microchannel. Therefore, the femtosecond laser induced high-speed jet and shock wave can be used to fabricate complex microfluidic chips in silica glass. Experimental results show that the diameter of microchannel is uniform and the complexity of the microfluidic chip is under control. As a proof of principle, we demonstrate the feasibility of the fabricating process by using the water-assisted femtosecond laser ablation.     

光刻版清洗工艺及设备研究

光刻版的洁净程度直接影响到光刻的效果,定期对光刻版进行清洗是保证光刻版洁净的必要手段。根据光刻版污染物的特点介绍了多种光刻版清洗工艺及相关设备的种类及组成．最后通过试验考查了工艺设备的使用效果。     

使用准水基清洗剂的最新洗净实例

随着电子仪器向小型化、轻量化、高速化、多机能化方向的发展,实装电路板也由于各公司自行设计的各种式样而增多。在此,将介绍这些实装电路板的洗净时遇到的问题及其解决办法的事例。     

使用半水基清洗剂的清洗技术 (第二次报告)

在电子仪器的助焊剂清洗作业中,日本使用得最多的是半水基清洗剂。首先就半水基清洗剂的概念和特点加以说明,并介绍清洗剂。其次介绍数例在封装电路板的清洗作业中遇到的问题及其解决办法。