An Integrated CAD Methodology for Yield Enhancement of VLSI CMOS Circuits Including Statistical Device Variations

In this paper a novel CAD methodology for yield enhancement of VLSI CMOS circuits including random device variations is presented. The methodology is based on a preliminary characterization of the technological process by means of specific test chips for accurate mismatch modeling. To this purpose, a very accurate position-dependent parameter mismatch model has been formulated and extracted. Finally a CAD tool implementing this model has been developed. The tool is fully integrated in an environment of existing commercial tools and it has been experimented in the STMicroelectronics Flash Memory CAD Group.As an example of application, a bandgap reference circuit has been considered and the results obtained from simulations have been compared with experimental data. Furthermore, the methodology has been applied to the read path of a complex Flash Memory produced by STMicroelectronics, consisting of about 16,000 MOSFETs. Measurements of electrical performances have confirmed the validity of the methodology, and the accuracy of both the mismatch model and the simulation flow.     

逻辑函数化简语义树

提出了一种逻辑函数化简语义树算法，其特点是在求全部本源蕴涵项和从本源蕴函项集合中选取最小覆盖两步中都采用同一算法，因此，算法程序的编写可较为简单，最后，从解题质量和解题速度等方面对该算法进行了评价。     

CAD技术在电子封装中的应用及其发展

现代电子信息技术的发展,推动电子产品向多功能、高性能、高可靠性、小型化、低成本的方向发展,微电子封装、IC设计和IC制造共同构成IC产业的三大支柱。计算机辅助设计(CAD)作为一种重要的技术手段在IC产业中发挥了巨大作用,已广泛应用于电子封装领域。本文结合各个时期电子封装的特点,介绍了封装CAD技术的发展历程,并简要分析了今后发展趋势。     

An algorithm ofk-line location for BBL in LSI/VLSI

In this paper, aK-line location algorithm for building block cells in LSI/VLSI is presented. When the relative positions of rectangular cells are given, there are 2 states according to the two orientations of a cell. It is proved that to find the optimum solution from the 2^N states can be reduced to calculate theN states inK-line algorithm. So the algorithm is shown very effective and can be used with association for cluster method in BBL placement. Under certain conditions, this method can also be used to pesudo BBL placement directly.     

Raphael-深亚微米集成互连参数仿真优化系统

针对超深亚微米层次下的金属互连设计,使用Raphael(集成布线互连)仿真系统完成了互连寄生效应参数的提取。介绍了Raphael仿真系统的主要功能及基本应用,并分析了常规集成布线互连参数模型。采用二层跨越式互连结构,对寄生电阻、电容参数进行了仿真,并得到电流密度的分布结果。这些参数的提取及验证对电路的布局设计是十分重要的。     

CAD软件在工程地质三维建模中的应用

如何快速、准确地建立地质体的三维模型一直是众多岩土工程数值模拟工作者所面临的难题。虽然三维地学模拟软件具有很好的三维地质建模能力,但是由于数据结构的差异,采用他们现行三维地学模拟软件建立的地质模型难以导入数值模拟分析软件中,以为相应工程问题的数值模拟服务。目前,随着各种CAD、CAM软件行业的的飞速发展,涌现出了许多优秀的三维建模软件,而且这些软件大都与现行数值分析软件有着良好的数据接口功能。据此,本文提出了采用现行CAD软件来建立工程地质体的三维模型,使得建立的模型达到既"可视"又"可算"的目的。将其应用于云南某高速公路边坡的三维建模中,证明了该法具有方便、快捷和合理等优点。     

Characterization of polyethylenimine by electrospray ionization and matrix-assisted laser desorption/ionization

Branched polyethylenimines (PEIs) with lower average molecular weights (600, 1200 and 1800 Da) have been studied by Electrospray Ionization (ESI) and Matrix‐Assisted Laser Desorption/Ionization (MALDI) mass spectrometry. In both, ESI and MALDI mass spectra, the main distribution arises from protonated PEI oligomers with NH₂ end groups, [PEI + H]⁺, which are observed at m/z 43n + 18. A trace of sodium contamination in the PEI samples results in the presence of a series that appears at m/z 43n + 40 [PEI + Na]⁺. However, only the MALDI mass spectra show a [PEI + K]⁺ series at m/z 43n + 56, because of matrix contamination with potassium, and a series generated by condensation of the matrix with PEI at m/z 43n + 30. Collisionally activated dissociation tandem mass spectrometry (CAD (MS/MS)) of protonated PEI oligomers is shown to yield three fragment ion series b_n, and K_n. The experiments have demonstrated the capabilities of these mass spectrometry techniques, along with CAD MS/MS to detect and characterize such polar synthetic polymers. Copyright © 2011 John Wiley & Sons, Ltd.     

TDA4501—TDA3565亮度通道CAD优化设计

本文概要介绍如何通过CAA及CAD提高图像分辨率。     

随机均衡器的计算机辅助最优化设计

本文提供了一种实用的随机均衡器的计算机辅助设计方法.以二元件均衡器为链接模型,以非线性最小二乘法为最优化方式,解决了多节均衡器链接中初始参数值的选取问题.讨论了0.618法在非单一极值区间的应用.并且通过实例计算说明这一方法的有效性和实用性.