透射式GaAs光电阴极AlGaAs/GaAs外延层MOCVD过程中应变结构形成的研究

本文介绍了AlGaAs/GaAs外延层生长的应变状况的生长温度控制模型,并根据AlGaAs/GaAs外延层X射线衍射摇摆曲线的分析从实验上验证了AlGaAs/GaAs外延生长的应变状况的生长温度控制模型.     

透射式GaAs光电阴极AlGaAs/GaAs外延层倒易点二维图分析

本文介绍了摇摆曲线和倒易点二维图在评价晶格完整性时的特点,分析了透射式GaAs光电阴极样品AlGaAs/GaAs外延层的倒易点二维图,获得了晶面弯曲以及AlGaAs外延层中Al组份变化等方面的信息,为优化外延工艺提供了可靠的保证.     

Design,fabrication and characterization of a Schottky diode on an AlGaAs/GaAs HEMT structure for on-chip RF power detection

A Schottky diode was designed and fabricated on an n-AlGaAs/GaAs high electron mobility transistor (HEMT) structure for RF power detection. The processing steps used in the fabrication were the conventional steps used in standard GaAs processing. Current–voltage measurements showed that the devices had rectifying properties with a barrier height of 0.5289–0.5468 eV. The fabricated Schottky diodes detected RF signals well and their cut-off frequencies up to 20 GHz were estimated in direct injection experiments. To achieve a high cut-off frequency, a smaller Schottky contact area is required. The feasibility of direct integration with the planar dipole antenna via a coplanar waveguide transmission line without insertion of matching circuits was discussed. A higher cut-off frequency can also be achieved by reducing the length of the coplanar waveguide transmission line. These preliminary results represent a breakthrough as regards direct on-chip integration technology, towards the realization of a ubiquitous network society.     

Self-assembled GaAs/AlGaAs quantum dots by molecular beam epitaxy and in situ AsBr3 etching

We report on a new method to produce self-assembled, unstrained, GaAs/AlGaAs quantum dots (QDs) with large confinement energy. First we create nanoholes on a GaAs surface by growing InAs islands on GaAs(0 0 1), overgrowing them with GaAs and etching the surface in situ with AsBr₃ gas. Then we transfer the holes to an AlGaAs surface, fill them with GaAs and overgrow them with AlGaAs. In this way we obtain GaAs inclusions in an AlGaAs matrix. We investigate the optical properties of such QDs by photoluminescence spectroscopy and their morphology by atomic force microscopy. We show that the QD size can be tuned and emission with inhomogeneous broadening down to 8.9 meV can be achieved.     

Improved thermal property of strained InGaAlAs/AlGaAs quantum wells for 808-nm vertical cavity surface emitting lasers

The 808-nm vertical cavity surface emitting laser (VCSEL) with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is designed and fabricated. Compared with the VCSELs with Al_0.05Ga_0.95As/Al_0.3Ga_0.7As quantum wells, the VCSEL with strained In_0.13Ga_0.75Al_0.12As/Al_0.3Ga_0.7As quantum wells is demonstrated to possess higher power conversion efficiency (PCE) and better temperature stability. The maximum PCE of 43.8% for 10-μm VCSEL is achieved at an ambient temperature of 30 ℃. The size-dependent thermal characteristics are also analyzed by characterizing the spectral power and output power. It demonstrates that small oxide-aperture VCSELs are advantageous for temperature-stable performance.     

Thickness variations during MOVPE growth on patterned substrates

Experiments have been carried out to investigate thickness variations between epitaxial layers grown on ridges or channels and the surrounding planar surface. Results show a remarkable variation in growth velocity, even for relatively wide channels and ridges. Using these findings, a novel laser/waveguide coupling technique, which uses a single epitaxial growth step, is proposed.     

High temperature MOVPE growth of GaAs/AlGaAs device structures with tertiarybutylarsine

The performance characteristics of epitaxial structures suitable for optoelectronic and electronic devices were investigated. These were fabricated by MOVPE using tertiary-butylarsine, a non-hydride arsenic source. Minority carrier diffusion lengths of 5μm at 3 × 10¹⁸/cm³ and 2μm at 2 × 10¹⁹/cm³ were achieved inp-type GaAs. Recombination velocities at the GaAs/AlGaAs interface are reduced to 1 × 10³ cm/sec by processing under appropriate conditions. Electron mobilities of 4000 cm²/V-sec inn-type (2 × 10¹⁷/cm³) layers resulted in transconductances of 120 mS/mm in 1.5μm gate depletion mode MESFETs. The above values are comparable to those obtained with arsine in this work and others reported in the literature.     

The epitaxial growth of AlGaAs using highly purified trimethylaluminum

Highly purified trimethylaluminum [(CH₃)₃Al] was prepared by reducing the contamination of volatile impurities such as organic silicon and dimethyl-aluminum methoxide [(CH₃)₂AlOCH₃]. The concentration of methoxy group in (CH₃)₃Al was found to decrease considerably when (CH₃)₂Al was distilled in the presence of aluminum trihalide. Among the halides, purification efficiency increased in the order I>Br>Cl. High-quality AlGaAs layer and AlGaAs/GaAs modulation doped structures were grown by organometallic vapor-phase epiloxy (OMVPE) using the purified (CH₃)₃Al. Their electrical properties were discussed in relation to the volatile impurity in the source gas.     

AlGaAs／InGaAs功率PHEMT用异质材料的计算机优化与器件实验结果

借助一新的工艺模拟与异质器件模型用ＣＡＤ软件──ＰＯＳＥＳ（Ｐｏｉｓｓｏｎ－ＳｃｈｒｏｅｄｉｎｇｅｒＥｑｕａｔｉｏｎＳｏｌｖｅｒ），对以ＡｌＧａＡｓ／ＩｎＧａＡｓ异质结为基础的多种功率ＰＨＥＭＴ异质层结构系统（传统、单层与双层平面掺杂）进行了模拟与比较，确定出优化的双平面掺杂ＡｌＧａＡｓ／ＩｎＧａＡｓ功率ＰＨＥＭＴ异质结构参数，并结合器件几何结构参数的设定进行器件直流与微波特性的计算，用于指导材料生长与器件制造。采用常规的ＨＥＭＴ工艺进行ＡｌＧａＡｓ／ＩｎＧａＡｓ功率ＰＨＥＭＴ的实验研制。对栅长０．８μｍ、总栅宽１．６ｍｍ单胞器件的初步测试结果为：ＩＤｓｓ２５０～４５０ｍＡ／ｍｍ；ｇｍ０２５０～３２０ｍＳ／ｍｍ；Ｖｐ－２．０－２．５Ｖ；ＢＶＤＳ５～１２Ｖ。７ＧＨｚ下可获得最大１．６２Ｗ（功率密度１．０Ｗ／ｍｍ）的功率输出；最大功率附加效率（ＰＡＥ）达４７％。     

GaAs／AlGaAs窄量子阱中激子二维特性的退化

用光荧光（ＰＬ）和时间分辨光谱（ＴＲＰＬ）技术研究了ＧａＡＳ／ＡＩＧａＡＳ量子阱结构中荧光上升时间τｆ和激子谱线半宽（ＦＷＨＭ）随阱宽的变化关系，发现在窄阱中，τｆ，随阱宽的变化关系与宽阱时的情况恰恰相反，在窄阱中τｆ随着阱宽的减小而增加，归结为激子二维特性的退化导致声学声子对激子的散射作用减弱造成的．同时观测到窄阱中谱线半宽随着阱宽减小而增加，这也是因为激子特性由维二维向三维转化造成的．