Rapid Thermal Annealing Effects on Structural and Optical Properties of Self-Assembled InAs／GaAs Quantum Dots Capped by InAIAs／InGaAs Layers

Effects of rapid thermal annealing on the optical and structural properties of self-assembled InAs/GaAs quantum dots capped by the InAlAs/InGaAs combination layers are studied by photoluminescence and transmission electron microscopy. The photoluminescence measurement shows that the photoluminescence peak of the sample after 850℃ rapid thermal annealing is blue shifted with 370meV and the excitation peak intensity increases by a factor of about 2.7 after the rapid thermal annealing, which indicates that the InAs quantum dots have experienced an abnormal transformation during the annealing. The transmission electron microscopy shows that the quantum dots disappear and a new InAlGaAs single quantum well structure forms after the rapid thermal annealing treatment. The transformation mechanism is discussed. These abnormal optical properties are attributed to the structural transformation of these quantum dots into a single quantum well.     

发射光谱法测定ITO透明导电膜的Sn／In

本文采用运动电极，火花激发，讨论了膜样品分析中标样和分析样品的一致性，介绍了选用多个样品叠加摄谱对ＩＴＯ膜中Ｓｎ／Ｉｎ浓度比的测量。结果表明分析方法的精密度和准确度满足分析要求。     

Interface Properties of InAs／AlSb Superlattices Characterized by Grazing Incidence X-Ray Reflectivity

Two kinds of superlattice interfaces of InAs/AlSb superlattices are realized in an optimized interface growth process, where one is AlAs-like and the other is InSb-like grown on a relaxed AlSb buffer layer. The superlattice properties such as interface roughness and layer thickness are studied by grazing incidence x-ray reflectivity. The reflectivity curves are simulated by standard software till the simulation curves match well with the experimental curves. The simulation indicates that AlAs-like interfaces are much rougher than InSb-like interfaces. Grazing incidence x-ray reflectivity is also discussed as a powerful tool to assessing the structure properties of superlattices.     

InP基InAlAs—InAs HEMT

对ＩｎＡｓ沟道ＩｎＡｌＡｓ－ＩｎＡｓ高电子迁移率晶体管材料及器件的设计和器件制作工艺进行了研究，器件样品性能良好，１μｍ栅长ＩｎＡｌＡｓ－ＩｎＡｓ ＨＥＭＴ器件的最大跨导３００Ｋ时达到２５０ｍＳ／ｍｍ。这是国内首次研制成功的ＩｎＡｓ沟道ＨＥＭＴ器件。     

1.3μm InGaAs/InAs/GaAs Self-Assembled Quantum Dot Laser Diode Grown by Molecular Beam Epitaxy

报道了分子束外延生长的1.3μm多层InGaAs/InAs/GaAs自组织量子点及其室温连续激射激光器. 室温带边发射峰的半高宽小于35meV，表明量子点大小比较均匀. 原子力显微镜图像显示，量子点密度可以控制在(1～7)E10cm-2范围之内，而面密度处于4E10cm-2时有良好的光致发光谱性能. 含有三到五层1.3μm量子点的激光器成功实现了室温连续激射.     

Enhancement of H2 Sensing Properties of In2O3-based Gas Sensor by Chemical Modification with SiO2

The sensitivity and selectivity to H2 of a new In203-based gas sensor were improved significantly by surface chemical modification. A dense layer of SiO2 near the surface of the porous In2O3 bead was formed by chemical vapor deposition (CVD) of diethoxydimethysilane (DEMS). The dense layer functioned as a molecular sieve, thereby the diffusion of gases with large molecular diameters, except for 1-12, was effectively controlled, resulting in a prominent selectivity and high sensitivity for H2. The working mechanism of the sensor was also presented.     

InGaAs／GaAs应变量子阱中的激子发光动力学

本文详细测量并分析了ＩｎＧａＡｓ／ＧａＡｓ应变量子阱中的激子发光衰退特性，研究了激子发光寿命与Ｉｎ组分和阱宽的关系．发现Ｉｎ组分增大时，激子寿命变短，而发光寿命与阶宽的关系不大．文章分析了影响发光寿命的诸多因素，指出在ＩｎＧａＡｓ／ＧａＡｓ量子阱中，由合金无序造成的散射对激子发光寿命有重要的影响．     

提高红外写入液晶光阀透明电极导电性能方向的研究

介绍了一种改善红外写入液晶光阀半导体透明导电膜导电性能的一种方法。通过对氧化铟掺铟比例的研究，经过大量科学实验，并采用Ｘ光电子能谱仪对两者的比例进行了定量分析，发现在对膜层透过特性影响不大的情况下，两者之间的质量百分比在９０％比１０％左右时，其膜层导电性能有明显提高，从方电阻十几ｋΩ／□降至７３０Ω／□。我们将此缺点制备的ＢａＦ２为基底，在中心波长为１０．６μｍ，处透过率为５６％，方电阻为７３０Ω