信产部13项行政审批被取消调整

目前消息，2007年10月12曰，国务院宣布了第四批取消和调整的行政审批项目，共取消行政审批项目128项，调整行政审批项目58项。其中，宣布取消通信工程施工企业资格认证，通信勘察设计企业资质认证，通信、电子投资项目立项审批，通信、电子计量标准器具审核，中断通信互联互通审批，境内电信企业境外上市审核，国际电话结算价备案，研制无线电发射设备核准，通信电子质检机构设立与授权等九项原由信息产业部进行的行政审批。[第一段]     

先进计量应对新材料和制程复杂度的挑战

45nm节点以下的计量要求将变得非常复杂，需要在集成计量与瑞士军刀式的全能平台之间取得平衡。     

计量使工艺得以实现

计量并不廉价——计量专家的费用和计量工具的成本就不低——但如果是以生产和成品率为目标的话，那么它绝对算得上价廉物美。     

恩智浦半导体产品在电表领域中的应用

电子式电表概述 电子式电表是通过电子计量设备，为个人家庭、工业和商用住宅提供用电结算的仪表，原有传统结算仪表使用机电计量设备。除电表外，此项技术也可以用于水表和煤气表，并实现三表合一。电子式电表或自动抄表系统（AMR）可通过无线连接（如ISMRF链路、蜂窝网络等）或有线连接（如电话线或电力线）读取用户的用电量数据。     

Advanced approaches to high precision MEMS metrology based on interferometric, confocal, and tactile techniques

Geometrical features of micro-systems can be determined by either tactile or optical profiling techniques, which show different non-linear transfer characteristics. This has to be considered especially, if the instruments operate close to their physical limitations. Depending on the specific measuring task either point-wise or areal optical measurement may be advantageous. Hence, examples for both approaches are discussed. Furthermore, systematic effects, which are related to the measuring principle have to be taken into account, e.g. if sharp edges or slopes are present on the measuring object. As it is shown, for white-light interferometry these difficulties can be solved by a two-wavelength technique.     

Model based reference metrology for dimensional characterization of micro- and nanostructures

The requirements on the precision of dimensional metrology are especially stringent in the area of semiconductor manufacturing. This holds in particular for the measurement and control of the linewidths of the smallest structures on masks and silicon wafers and their corresponding reference metrology. In this paper we will describe the physical models and the reference instrumentation which were developed for photomask linewidth metrology at the PTB. It will be shown, how the results of the different methods can be used for comparative analyses. Application of these methods will be demonstrated exemplarily on the basis of newly developed photomask linewidth standards.     

压电陶瓷微驱动器用于超精定位的技术研究

对压电陶瓷微位移驱动器用于超精密二维柔性微定位系统的几个关键技术进行了理论分析和实验研究,并得到了二维微定位系统的双向静态、动态特性曲线。经测试,通过闭环控制的定位重复性精度在-１５ｎｍ～＋１５ｎｍ以内,采取这些关键技术措施是可行的。     

相移干涉计量中高精度相移器的研究

相移器是相移干涉计量中的关键技术,对测量精度有很大的影响,关系到相移技术的成败。介绍了一种闭环控制的高精度相移器,输出电压精度为０．１％,相移器重复误差小于３°,用该相移器的电子散斑干涉计量系统测量精度可达λ／１００。