Effects of Substrate Temperature on Helium Content and Microstructure of Nanocrystalline Titanium Films

Helium-charged nanocrystalline titanium films have been deposited by HeAr magnetron co-sputtering. The effects of substrate temperature on the helium content and microstructure of the nanocrystalline titanium films have been studied. The results indicate that helium atoms with a high concentration are evenly incorporated in the deposited titanium films. When the substrate temperature increases from 60℃ to 350℃ while the other deposition＇parameters are fixed, the helium content decreases gradually from 38.6 at.% to 9.2at.%, which proves that nanocrystalline Ti films have a great helium storage capacity. The 20 angle of the Bragg peak of （002） crystal planes of the He-charged Ti film shifts to a lower angle and that of （100） crystal plane is unchanged as compared with that of the pure Ti film, which indicates that the lattice parameter c increases and a keeps at the primitive value. The grain refining and helium damage result in the diffraction peak broadening.     

温度测量装置的控制方法

在现代工业生产中，温度测量装置的使用十分广泛。在许多场合如热处理、热加工、温度实验等都需要严格的控温条件，才能保证产品的质量。因此，对使用中的温度测量（或控制）装置必须进行控制，确保其可靠性。温度测量装置属于计量器具，应遵循我国《计量法》的规定定期周检，但是在实际工作中，情况往往比较复杂，需区别对待和处理。温度测量装置有许多种类，具体的控制方法大体有两类：1.送实验室周检；2.现场校准。周检法用于能运送到实验室的有适用检定规程的温度测量装置，如常用的XCT型动圈式温度指示调节仪（适用国家计量检定规程J…     

Growth of NaBi（WO4）2 Dendrite and Mechanism

The solid-liquid interface motion of NaBi（WO4）2 （NBWO） melt crystal growth is observed in an in situ system, in which the whole processes of interface transition from fiat interface and cellular to dendrite are visualized. The spacing of the dendrite under smaller temperature gradient turns out to be larger than that under larger temperature gradient, which is found to be sensitive to the temperature distribution. The mechanism of dendrite growth of NBWO is studied based on the model of the growth units of anion coordination polyhedra. The { 001} face has two apex links, so it shows higher stability and has high growth rate and forms the arm of dendrite, whereas the {010} face has only one apex link, and thus shows relative slower growth rate and firstly forms the branches.     

精密垫片精冲工艺有限元分析与模具设计

精密垫片零件，如图1所示，零件材料为1Cr18Ni9Ti，强度大（σb=650MPa），有一定塑性。从零件尺寸精度看，φ4mm外圆为IT7级精度，φ4mm外圆与φ2mm内孔有很高的同轴度要求，冲裁断面与零件两端面有垂直度要求，普通冲压不能达到零件精度：从工序的角度看，有冲孔和落料工序，剪切面粗糙度Ra≤3．2μm，属于光洁冲裁范畴；另外，技术条件中要求零件两大面不得有任何划伤，且光滑平整。总体上看，该零件的冲压加工性不好，难度较大，对模具的设计、选材、制造要求都较高。     

得可展示精密丝网和网板技术

今年4月1日至3日在拉斯维加斯APEX展会的得可展台上将展示一系列令人振奋的精密丝网和网板。批量印刷引领者得可将在展台1659展示大批公认的新设计产品，强调其全球顾客配备需实现更多工艺控制的原因。     

贴装焊盘上的通孔回流焊接时漏锡的工艺解决方案

当前通信行业尤其是军工企业处于特殊的考虑，所设计的PCB贴装焊盘上存在通孔，造成回流焊接时锡膏融化后沿着孔流走，不能形成有效焊点，即使形成焊点也因为少锡致使焊点机械强度及电气性能下降。现在的补救措施就是花费大量的人工进行补焊，但人工补焊对单元板质量的危害是极其深远的，现有某公司实际案例情况说明如下：     

新品推荐——软件工具类

BPM Helix自动烧录系统，KIC Explorer热温度曲线系统，LeadTracer—RoHS XRF系统，SMT3000LD自动去助焊剂系统     

NEC开发32nm逻辑LSI多层布线技术

NEC和NEC电子开发出了面向32nm工艺逻辑LSI的多层布线技术，布线间隔为100nm。通过改变low-k膜的成膜方法，达到了32nm工艺LSI所需的性能，同时解决了绝缘耐久性过低的问题。