Inside Front Cover: The Elastic Properties and Plastic Behavior of Two‐Dimensional Polymer Structures Fabricated by Laser Interference Lithography (Adv. Funct. Mater. 10/2006)

The probing of the micromechanical properties within a two‐dimensional polymer structure with sixfold symmetry fabricated via interference lithography reveals a nonuniform spatial distribution in the elastic modulus “imprinted” with an interference pattern in work reported by Tsukruk, Thomas, and co‐workers on p. 1324. The image prepared by M. Lemieux and T. Gorishnyy shows how the interference pattern is formed by three laser beams and is transferred to the solid polymer structure. The elastic and plastic properties within a two‐dimensional polymer (SU8) structure with sixfold symmetry fabricated via interference lithography are presented. There is a nonuniform spatial distribution in the elastic modulus, with a higher elastic modulus obtained for nodes (brightest regions in the laser interference pattern) and a lower elastic modulus for beams (darkest regions in the laser interference pattern) of the photopatterned films. We suggest that such a nonuniformity and unusual plastic behavior are related to the variable material properties “imprinted” by the interference pattern.     

Hierarchically Ordered Polymer Films by Templated Organization of Aqueous Droplets

Hierarchically ordered structures facilitate the incorporation of diverse functions simultaneously. The present report introduces a simple and novel strategy for producing hierarchically ordered polymeric films. Hierarchical ordering of aqueous droplets on a polymer solution is realized by the imposition of physical confinement via various shaped gratings. After drying of the solution, well‐ordered hierarchical structures were fabricated in the remaining polymer film. The size of the grating structure and the lattice size of spontaneous hexagonally packed aqueous pores comprise two different length scales, thereby offering multiscale ordering. Interfacial wetting of the polymer solution to the grating surface was crucial in terms of obtaining a highly ordered structure that can be tuned by dissolving a small amount of surfactant in the polymer solution. The present novel approach provides a new opportunity for lithography‐free fabrication of complex hierarchical structures.     

Observation of room temperature negative differential resistance in solution synthesized ZnO nanorod

We report the observation of negative differential resistance (NDR) in solution synthesized ZnO nanorod. The ZnO nanorod was fabricated as a two terminal planar device using lithographically patterned Au electrodes. The measured current–voltage response of the device has shown a negative differential resistance behavior. The peak-to-valley current ratio of the NDR is found to be greater than 4. The mechanism of this observed NDR effect has been explained based on charge trapping and de-trapping at the nanoscale contacts. It is the first observation of negative differential resistance effect in solution synthesized ZnO nanorod.     

用于光刻机模拟运动的精密工件台宏动定位系统研制

为给步进扫描光刻机的设计研究提供理论指导,解决光刻机工件台宏动定位平台的设计和控制问题,根据工业应用中步进扫描光刻机的运动特点和工作要求,设计了一种H型精密工件台宏动定位系统和同步控制方案。试验结果表明,其各项性能指标均满足设计要求,对指导实际工业应用具有一定的参考价值。     

用于IC封装的光刻设备

光刻是圆片级封装的一种最重要的工艺,无论是焊盘分布、焊凸形成、密封或其它新出现的需求,晶圆上精确的成像区域对每一种工序来讲是最重要的。评述了一些圆片级封装的光刻系统及为什么某些专门的设备能很好地适于应用,会是接近式光刻机、步进投影光刻机还是一些替代设备在未来的几年内来满足这种需求?我们将探索这种可能性。     

光刻技术及其应用的状况和未来发展

光刻技术及其在产业中的开发应用一直是业界人们关注的焦点之一,概述了目前几种具有潜力的光刻机技术及其应用的状况,同时通过对相关光刻的技术性和经济性比较,简述了其未来的发展。     

《国际半导体技术蓝图》(2005版)光刻部分解析

对2005年公布的《国际半导体就十时微蓝图》中光刻部分进行了介绍与分析,并与之前的版本进行比较,列出了光刻技术面临的挑战和潜在技术方案。最后指出,浸入式光刻、纳米压印、极紫外光刻和ML2将是未来几年重点研究对象。     

一种激光直写式光刻光路系统

针对曲面栅网器件的光刻工艺,提出了一种可动态调焦的激光直写式光刻系统,该系统将紫外激光器的光束经过整形扩束、动态z向调焦、x/y振镜、聚焦等单元使器件上相应位置涂覆的光刻胶直接感光,再经过显影、刻蚀等工艺直接制作出相应器件. 它可以应用到一些精度要求不太高的平面或非平面器件的光刻加工工艺, 取代传统的使用掩模版的光刻工艺或其它的加工工艺.     

温度气压对高分辨力光刻物镜像质影响研究

分析温度气压对物镜光学材料、透镜厚度间隔,以及空气折射率的影响,并用空气折射率对物镜像质影进行模拟计算。研究表明物镜焦面产生较大漂移,对僧率有一定影响,而对畸变影响较小,指出对物镜进行温度气压控制补偿是必要的。     

电子束曝光UV3正性抗蚀剂的工艺研究

为了在体硅CMOSFinFET中用等离子体腐蚀精细凹槽图形，研究了将电子束直写曝光用于原为深紫外光学曝光的UV3正性抗蚀剂的工艺技术；详细分析了包括膜厚、曝光能量、曝光剂量、显影时间、设计尺寸和衬底材料等在内的各类工艺参数与实际曝光图形效果的关系；特别指出了曝光过程中特有的延迟效应及解决办法。采用最终的优化工艺条件，得到了合适的图形效果。