CeO2 掺杂BNLKT陶瓷的压电性能与微观结构

利用企业的电子陶瓷工艺制备了CeO2掺杂Bi0.5(Na1-x-yLixKy)0.5TiO3无铅压电陶瓷,并研究了CeO2掺杂对该体系陶瓷的介电压电性能与微观结构的影响。X-射线衍射结果表明,掺杂的CeO2扩散进入了Bi0.5(Na1-x-yLixKy)0.5TiO3钙钛矿结构的晶格;SEM观察结果表明,少量的CeO2掺杂可改进该陶瓷的微结构;介电压电性能研究结果表明,CeO2掺杂对该陶瓷体系的综合性能有较大改善,室温下该体系配方的压电常数d33可达199 pC/N,径向机电耦合系数kp达39.3%,同时降低了陶瓷的介电损耗(tanδ=2.0%),提高了其机械品质因数。     

Simulation and analysis of metamorphic high electron mobility transistors

In this paper, the metamorphic high electron mobility transistors (mHEMTs) are investigated numerically and compared with pseudo-morphic high electron mobility transistors (pHEMTs). The two-dimensional device simulator, MEDICI, is used to solve the Poisson's equation and the electron/hole current continuity equations. The influences of δ-doping concentration and position, gate width, spacer thickness, etc. on the performances of HEMTs are explored. It shows clearly that mHEMTs have higher transconductances, drain currents and DC voltage swings than pHEMTs.     

掺钇(Ba,Sr,Ca)TiO_3纳米粉体及细晶陶瓷的制备与性能

采用sol-gel法制备了Y3+掺杂Ba0.90Sr0.08Ca0.02TiO3(BSCT)纳米粉体及细晶陶瓷。通过TG-DTG、XRD、SEM和TEM对样品结构及形貌进行了表征,并测试了陶瓷的介电性能。研究表明,Y3+掺杂BSCT纳米粉体主要为立方相BaTiO3,烧结后陶瓷晶粒尺寸在0.68~2.24μm可控,Y3+掺杂可以抑制陶瓷晶粒的生长,使陶瓷的tC向低温方向移动。随Y3+掺杂量的增大,陶瓷的介电温谱εr-t趋于平缓,当x(Y3+)为7.0%时,陶瓷的室温εr大幅度提高到9 176。     

掺CH4的SiCOH低介电常数薄膜结构与介电性能研究

以十甲基环五硅氧烷和甲烷作为反应气体，采用电子回旋共振等离子体化学气相沉积(ECR-C VD)方法制备了k = 2.45，485℃下的热稳定性优良的SiCOH低介电常数薄膜.通过薄膜结构的 FTIR谱分析，比较了十甲基环五硅氧烷(D5)液态源和不同甲烷流量下制备的薄膜的键结构差 异，发现在沉积过程中甲烷含量的增大，一方面有利于D5源环结构的保留，另一方面有利于 薄膜中形成高密度的CH_n基团.高密度碳氢大分子基团的存在降低了薄膜密度， 结合薄膜中形成的本构孔隙、低极化率Si—C键以及—OH键减少的共同作用，导致薄膜介电 常数的降低. 关键词： 低介电常数 SiCOH薄膜 碳氢掺杂     

An improved radio frequency heavy ion source

Abstract

An improved r.f. heavy ion source, which can operate with gases, liquids and solids is described. The operating temperature of the ion source may reach 1000°C. It can therefore, generate ion beams of a considerable number of elements. including metallic ions. At present, ion beams of S⁺, Al⁺, As⁺. Zn⁺, Mg⁺, Cd⁺, Ag⁺, Sm⁺, Te⁺, Se⁺, Sn⁺, In⁺, Hg⁺, etc. have been extracted. The extracted total beam current ranges from several hundred microamperes to the order of milliampere. The useful fraction of ion in the total beam is 70–90%. Life span of the source ranges from 40 hours to more than 100 hours. The emittance of the source is 3 × 10^?6 cm rad. Structure and operating characteristics of this ion source are discussed.     

掺Y对PbWO4闪烁体的热释光影响

研究了纯PbWO₄和PbWO₄:Y晶体经γ射线辐照和可见光光照前后室温 以上的热释光.发现大剂量辐照后掺Y可以有效地抑制热释光的强度并使热释光峰移向高温, 说明掺Y有利于提高光输出的稳定性.可见光光照也会影响热释光并可以产生新的热释光峰, 这可能是由于光释电子(或空穴)被浅陷阱重新俘获或是光照后产生了新型色心的结果. 关键词： 4')" href="#">PbWO₄ 掺Y 热释光     

Delta doping in silicon

Two-dimensional doping sheets (“δ-doping”) are integral parts of many novel semiconductor device concepts. Their practical realization in silicon (Si), however, was long delayed by the difficulty to introduce dopants into Si in a well-controlled way during epitaxial growth. Recent advances in the understanding of epitaxial growth and the incorporation of dopants in Si have overcome these difficulties and opened a new field in Si materials and device research. In this article, we review the growth, processing, and characterization of epitaxially grown 5-doped Si. Furthermore, we discuss the electronic subband states of such structures. Finally, we give an overview of device concepts that use 5-doping and analyze their properties.     

The solid state reaction between lanthanum oxide and strontium carbonate

The reaction between lanthanum oxide and strontium carbonate was studied non-isothermally between 350 and 1150 °C at different heating rates, intermediates and the final solid product were characterized by X-ray diffractometry (XRD). The reaction proceeds through formation of lanthanum oxycarbonate La₂O(CO₃)₂, lanthanum dioxycarbonate La₂O₂CO₃, and non-stoichiometric strontium lanthanum oxide La₂SrO_x (x = 4 + δ). La₄SrO₇ was found to be the final product which begins to form at ∼700 °C. Li⁺ doping enhances the formation of the final product as well as commencement of the reactions at lower temperatures.     

Nd2O3掺杂(BaSr)TiO3对陶瓷结构和性能的影响

采用常规固相反应法,以Ba0.6Sr0.4TiO3 10%MgO(BSTO)体系为基体成分,研究了Nd2O3掺杂对其显微组织结构和介电性能的影响规律,结果表明掺杂Nd2O3后,抑制了BSTO晶粒的生长;随着Nd2O3掺杂量的增加,陶瓷的晶粒尺寸变小,密度增大,材料的居里温度向负温度方向移动,并且展宽了介电峰,使材料的温度稳定性提高,此外,随着Nd2O3掺杂量的增加,材料的可调性减小,介电常数减小。     

低量Yb3+掺杂的TiO2复合纳米粉体的制备及光催化活性

姜洪泉,王鹏,线恒泽. 低量Yb3+掺杂的TiO2复合纳米粉体的制备及光催化活性[J]. 化学学报, 2006, 64(2): 145-150.