一种控制矩形光刻胶光栅槽深和占宽比的方法

利用光刻胶的非线性效应可以制作出了矩形的全息光栅。制作矩形光栅时,对槽形的控制被简化为对槽深和占宽比这两个参量的控制。首先借助实时潜像监测技术获得最佳曝光量,然后根据显影监测曲线的特征找出光栅槽底的残胶厚度为零的显影时刻,就能得到槽底干净的矩形光栅,同时保证槽深近似等于光刻胶的初始厚度;如果此后继续显影,就能适度减小占宽比。实验结果和理论分析都证实了这种控制方法的可靠性。对1200lp／mm的光栅,目前工艺能精确调控的最大槽深为1μm,占宽比在0．2～0．6范围内。实验还揭示,为了提高对光栅槽形的调控能力,必须首先提高干涉条纹的稳定性。     

相位板装配倾斜对波前编码系统点扩散函数的影响

分析了装配误差引起的相位板倾斜对波前编码系统的影响,通过坐标变换推导了相应条件下的广义光瞳函数。结果表明：倾斜因子对系统的相位板系数具有放大效果,其随倾斜角绝对值的增大而增大,而与倾斜角的正负无关。相位板倾斜会放大系统点扩散函数包络面的两条直角边,相应地降低其光学传递函数值。在子午倾斜的条件下,子午方向的相位板系数放大效果大于弧矢方向,从而导致点扩散函数包络面在子午方向的放大效果大于弧矢方向,子午方向光学传递函数值的降低效果大于弧矢方向。采用MATLAB以及商用光学软件进行仿真实验,验证了上述结论。     

基于光束扫描宽化技术的激光掩模微加工系统

利用Nd∶KGW激光器,采用光束扫描宽化技术和掩模微缩成像方法研制了用于微打标及微型零件雕刻成形的激光掩模微加工系统。系统采用计算机打印的塑料胶片或液晶作掩模,光束扫描面积为（有效掩模面积）30 mm×30 mm。微缩成像系统的缩小倍率分别为8～10倍（f=100 mm透镜）和15～20倍（f=50 mm透镜）。对该系统的加工尺寸和加工精度进行了分析。实验结果表明：系统达到的最小标刻宽度和加工图形精度均为10μm,与分析结果一致。系统的单次加工深度为0.07～0.1μm,最大加工深度为200μm,可满足工业微加工技术的基本要求。     

A novel method of high resolution imaging through random perturbation wave front

A novel method is proposed for eliminating the effect of the traditional optical aberration on high resolution imaging by random perturbation wave front and digital image processing. A random phase mask, whose phase spectrum fluctuation is accordant with Kolmogorov distribution, is positioned near the aperture stop of optical system, making the optical aberration image become random perturbation image, that is, the intermediate image. The blind deconvolution algorithm based on maximum-likelihood estimation technique is used to restore the intermediate image acquired by a digital detector. The effects of optical aberrations and the noise on the restoration image are explored. To demonstrate the validity of the method proposed, the computer simulation and laboratory experiments are carried out for the imaging of the optical system with primary aberration. The results have shown that the present method is well suited for effectively improving the imaging quality of the optical system with certain aberration, thus making the optical system resolution close to or reach the diffraction-limit of the optical system.     

考虑公司信息披露情绪的欧式脆弱期权定价

从公司信息披露的角度来看,定量数据直观地反映了公司的经营和财务状况,而描述性的非结构文本信息是对定量数据的有效补充。本文从公司年报中挖掘信用违约文本信息,构建语调变量情绪指标,以调控脆弱期权的违约临界值,改进经典的Klein欧式脆弱期权定价模型。研究表明:随着语调变量指标的增大,欧式看涨看跌期权价格呈递减趋势,且指标越接近1,期权价格递减速度越快,说明期权价格对负向情绪更加敏感,符合金融市场实际情况。此外,应用研究发现不考虑情绪指标的Klein模型倾向于低估期权价格,考虑公司信息披露情绪的脆弱期权定价模型能更准确地分析财务困境对信用风险的影响,结果更贴近实际情况。     

Characterization of some convergent bivariate subdivision schemes with nonnegative masks

Knowing that the convergence of a multivariate subdivision scheme with a nonnegative mask can be characterized by whether or not some finite products of row-stochastic matrices induced by this mask have a positive column. However, the number of those products is exponential with respect to the size of matrices. For nonnegative univariate subdivision, this problem is completely solved. Thus, the convergence in this case can be checked in linear time with respect to the size of a square matrix. This paper will demonstrate the necessary and sufficient conditions for the convergence of some nonnegative bivariate subdivision schemes by means of the so-called connectivity of a square matrix, which is derived by a given mask. Moreover, the connectivity can be examined in linear time with respect to the size of this matrix.     

二维连续信号的近似采样定理

利用加细方程的面具,给出该方程的一个近似解,并根据这个近似解构造出二维连续信号的近似采样定理.其近似采样函数是所求加细方程的近似解,它是由加细方程的面具唯一确定的逐段线性函数,且有显示的计算公式.因此可以根据需要选择加细方程的面具,从而达到控制近似采样函数的衰减速度.     

液晶空间光调制器在阿达玛变换光谱仪中的应用研究—编码模板缺陷的补偿措施

论述了液晶空间光调制器作为固定不动的编码模板在阿达玛变换光谱仪中的应用,对编码模板的缺陷进行了研究,提出了编码模板缺陷的补偿措施.模拟实验证明了我们给出的补偿措施是正确的.     

An Accurate Characterization of CRT Monitor (II) Proposal for an Extension to CIE Method and Its Verification

According to the ICC specification that is widely used for storing colorimetric characteristics of imaging devices for the current color management systems (CMSs), CRT monitor characteristics can be described by the tone reproduction curves (TRCs) of the red, green and blue channels and a transformation matrix from linearized RGB values to tristimulus values. This idea is based on CIE Technical Report 122#x2013;1996: #x201C;The Relationship between Digital and Colorimetric Data for Computer-Controlled CRT Displays,#x201D; which resulted from the research by Berns et al. This method produces very accurate results under normal conditions. However, users often change the settings of contrast or brightness knobs to a different position from the factory default adjustments. For some of these cases, the characterization method described in the CIE 122 does not produce accurate results. In this paper, we propose an extension to the CIE method for such cases. We investigated the effect of user controls on CRT monitor characteristics at various settings, and verified that our method produced accurate results under any conditions.     

A study on the innovative microlens projection lithography applied to the production of microstructures

Microlens projection lithography is a kind of non‐contact projection lithography that uses microlens array components as the projection lenses to produce a large area of microstructural array patterns on photoresisting film. This technology requires partial masking of light on the non‐lens portion of the microlens array, and the conventional approach is through an aligned exposure followed by the plating process that would require accurate positioning equipment, so it is naturally time‐consuming as well as costly in terms of the entire production process. This study applies an innovative technology in the production process that uses a microcircular‐hole array to penetrate a stainless‐steel substrate as the mold, and in collaboration with gas‐assisted thermal pressuring production process that utilizes surface tension of the plastic film to fabricate the hemisphere‐shaped plastic microlens array that is capable of masking light as the projection lens. With such a lens, in collaboration with optic expansion film, Fresnel lens, and millimeter‐grade single‐pattern photomasks, the microlens array projection lithographical optical system is constructed. Using regular millimeter‐grade photomasks, a micrometer‐grade array pattern is successfully fabricated on the photoresist layer through the process of projection exposure and development using such a microlens array projection lithographical optical system. Copyright © 2007 John Wiley & Sons, Ltd.