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101.
IntroductionReactive oxygen species(ROS) are known to de-stroy biomacromolecules and cause cell injury[1]. Un-der normal circumstances, there is a balance betweenthe production of ROS and their destruction. Many dis-eases, such as brain ischemia, tumor, v…  相似文献   
102.
严格渐进伪压缩映象之修正型Mann迭代算法的强收敛性   总被引:2,自引:0,他引:2  
本文利用CQ方法获得了k-严格渐进伪压缩映象修正型迭代算法的强收敛结果.此结果推广并改进了T.H.Kim和徐洪坤2006年获得的相应的一主要结果.即,从渐进非扩张映象推广到k-严格渐进伪压缩映象,并且去掉了闭凸子集C的有界性假设条件.  相似文献   
103.
A novel double‐layer alignment film (DLAF) was developed to obtain greater control of the alignment characteristics of the liquid crystal director. The DLAF consists of a thin fluorinated polymer layer on the top of a rubbed non‐fluorinated, non‐branched polyimide layer (PI 2555). Two types of fluorinated polymer with different chemical structures and wetting behaviour on PI 2555 were chosen, to provide either continuous or discontinuous top layers. The continuous top layer DLAF (DLAF‐1) exhibits an abrupt pretilt transition from planar to homeotropic as the top layer thickness increases. The discontinuous top layer DLAF (DLAF‐2) exhibits a gradual transition where the pretilt correlates with the coverage of fluorinated top layer. These two types of transitions fit with de Gennes' local Frederick's transition and Kwok's inhomogeneous alignment theories, respectively. The abrupt pretilt transition system may be promising for chemical/biosensor applications, whereas the gradual transition system is suitable for pretilt control in LCD devices.  相似文献   
104.
In a stochastic convex feasibility problem connected with a complete probability space (Ω,A,μ) and a family of closed convex sets (Cω)ωεΩ in a real Hilbert space H, one wants to find a point that belongs to Cω for μ almost all ω ε Ω. We present a projection based method where the variable relaxation parameter is defined by a geometrical condition, leading to an iteration sequence that is always weakly convergent to a μ almost common point. We then give a general condition assuring norm convergence of this equation to that μ almost common point  相似文献   
105.
CHENG Yu 《中国光学》2010,3(1):27-32
This paper overviews some display technologies which play main roles on today's display market. And new technologies which may be used for tomorrow's display technologies have been discussed. New technologies will boost the development of display technologies.  相似文献   
106.
Considering a single-mode laser system with cross-correlated additive colored noise and multiplicative colored noise, we study the effects of correlation among noises on the normalized intensity correlation function C(s).C(s) is derived by means of the projection operator method.  相似文献   
107.
In this paper, we consider and analyze a new class of projection methods for solving pseudomonotone general variational inequalities using the Wiener-Hopf equations technique. The modified methods converge for pseudomonotone operators. Our proof of convergence is very simple as compared with other methods. The proposed methods include several known methods as special cases.  相似文献   
108.
The four vector extrapolation methods, minimal polynomial extrapolation, reduced rank extrapolation, modified minimal polynomial extrapolation and the topological epsilon algorithm, when applied to linearly generated vector sequences are Krylov subspace methods and it is known that they are equivalent to some well-known conjugate gradient type methods. However, the vector -algorithm is an extrapolation method, older than the four extrapolation methods above, and no similar results are known for it. In this paper, a determinantal formula for the vector -algorithm is given. Then it is shown that, when applied to a linearly generated vector sequence, the algorithm is also a Krylov subspace method and for a class of matrices the method is equivalent to a preconditioned Lanczos method. A new determinantal formula for the CGS is given, and an algebraic comparison between the vector -algorithm for linear systems and CGS is also given.  相似文献   
109.
We prove that the value of the quasi-trace on an idempotent element in an AW*-factor of type is the same as the dimension of its left (or right) support.

  相似文献   

110.
193nm光刻曝光系统的现状及发展   总被引:3,自引:0,他引:3  
投影曝光工艺是集成电路制造过程中的关键环节,曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。重点介绍了目前193nm光刻设备曝光系统的发展现状和趋势,以及为提高曝光质量所采用的相关分辨率增强技术;通过分析曝光系统的构成和其中的关键技术,探讨了国内研制相关曝光设备所面临的挑战。  相似文献   
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