Influence of the Native Oxide Layer on the Silicon Surface During Initial Stages of Nitridation

 Thin SiO₂ layers were produced by thermal oxidation of Si wafer material. To study the effect of nitridation on the oxide layers, the specimens were nitrided in a furnace at high temperature. Non-destructive ion beam analysis was performed to determine changes in the elemental concentrations and depth profiles of the major components. In particular, N and O concentrations were measured using the non-resonant nuclear reactions ¹⁴N(d, α)¹²C and ¹⁶O(d, p)¹⁷O, respectively. To obtain depth profiles of the as-prepared and nitrided specimens, the samples were measured with RBS and heavy ion elastic recoil detection analysis. The ion beam analyses revealed an increase in thickness of the SiO₂ layers with temperature. The specimens nitrided at 1200 °C were almost free of N. Surface topology investigations with scanning electron microscopy revealed concentric annular artificial patterns at the surfaces. In the centre of the pattern, only silicon was measured. Additionally, a band consisting of Si, O, and N surrounding the pattern was discovered. The findings are in agreement with specimens prepared at higher temperatures. Received June 19, 2000. Revision December 9, 2000.     

Influence of different substrates on ZnO nanorod arrays properties

Zinc Oxide (ZnO) nanorod arrays were grown on different substrates by hydrothermal method. The crystallinity of ZnO nanorod was regularly investigated by X-ray diffraction (XRD). Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to examine morphology of the ZnO nanorods. The results indicate that the nanorods grow along [002] orientation. SEM and TEM images and XRD patterns show that the growth of ZnO nanorods on graphene/Quartz substrate is better than the other substrates due to the number and size of the nanorods which are highly affected through the properties of ZnO seed layers and it has lower defects than the other substrates. PL spectra ZnO would have a higher concentration of oxygen vacancy.     

静电纺丝制备质子交换膜燃料电池催化剂层综述

质子交换膜燃料电池催化剂层在成本、耐久性以及性能上的局限是制约燃料电池汽车商业化的瓶颈. 已有文献证明静电纺丝技术制备的纳米纤维催化剂层能提高催化剂利用率、增加三相界面和三相通道以及提高耐久性. 作者结合所在课题组的工作综述了静电纺丝技术制备质子交换膜燃料电池催化剂层的研究进展. 首先,介绍了质子交换膜燃料电池催化剂层的发展历程,并从制备方式和结构两个方面对其进行分类和总结;接下来,从静电纺丝纳米纤维催化剂层的制备、物理特性表征、电化学性能分析及耐久性表征等方面进行了总结;最后,从三相界面、三相通道以及量产适用性的视点比较了三种结构的催化剂层,介绍了质子交换膜燃料电池催化剂层的发展趋势,并梳理了静电纺丝法制备质子交换膜燃料电池催化剂层领域待研的问题.     

低温质子交换膜燃料电池自增湿膜电极研究进展

具有自增湿能力的低温质子交换膜燃料电池膜电极是实现自增湿燃料电池的重要途径,对于燃料电池的商业化具有十分重要的意义,它不仅可以大幅度减小燃料电池系统的体积,提升燃料电池系统的输出功率密度,还可以有效降低燃料电池的制造成本. 目前,低温质子交换膜燃料电池自增湿膜电极的研究主要是集中在构建具有自增湿能力的质子交换膜、自增湿催化层和复合自增湿层三个方面. 本文主要从这三个方面系统介绍近年来国内外低温质子交换膜燃料电池自增湿膜电极方面的研究进展和发展趋势.     

多功能锂硫电池隔膜

锂硫电池具有远超锂离子电池的高理论比容量（1675 mAh ·g^-1）,并且兼具硫资源丰富、生产成本低廉以及环境友好等优势。然而,多硫离子的穿梭效应造成金属锂负极钝化、引起电池容量和库仑效率下降、循环稳定性变差等严重问题,限制锂硫电池的实际应用。从正极和负极之间的隔膜层出发,引入多硫离子穿梭的阻挡层被认为是极为有效的研究策略。这些研究策略在缓解多硫离子穿梭、提高活性物质利用效率、延长循环寿命和循环稳定性方面具有显著效果。本文分类综述了近年来锂硫电池隔膜功能化的研究进展,并对未来隔膜功能化的研究趋势进行了预测。     

CO2 Electroreduction in Ionic Liquids: A Review

The increasing emission of carbon dioxide (CO₂) caused by the unrestrained consumption of fossil fuels in recent hundreds of years, has caused global environmental and social problems. Meanwhile, CO₂ is a cheap, abundant and renewable C1‐feedstock, which can be converted into alcohols, ethers, acids and other value‐added chemicals. Compared with the thermal reactions, electrochemical reduction of CO₂ is more attractive because of its advantages by using the seasonal, geographical and intermittent energy (tide, wind and solar) under mild conditions. In recent years, taking ionic liquids (ILs) as electrolytes in the CO₂ electrochemical reduction reaction has been paid much more attention due to the advantages of lowering the overpotential of CO₂ electroreduction and improving the Faradaic efficiency. In this paper, we summarized the recent progresses of electrochemical reduction of CO₂ in ILs electrolytes, and analyzed the reaction mechanism of CO₂ reaction in the electrode‐electrolyte interface region by experimental and simulation methods. Finally, the research which needs to be highlighted in this area was proposed.     

镀锡层上钛-磷复合体系钝化膜的制备与表征

通过钛盐与磷酸盐体系复配的方法,在镀锡层表面得到了一种钛-磷复合体系钝化膜. 利用扫描电子显微镜(SEM)、X射线光电子能谱 (XPS)、盐雾试验、Tafel极化曲线和EIS交流阻抗谱测试等方法,研究了所得钝化膜的表面形貌、组成与耐蚀性能. 结果表明,得到的钝化膜层的主要组成成分为Ti₃(PO₄)₄nH₂O和TiO₂,在镀锡层表面结晶细致并有封孔的作用,因此有很好的耐蚀性能.     

A Strategy for Rapid Construction of Blood Vessel‐Like Structures with Complex Cell Alignments

A method is developed that can rapidly produce blood vessel‐like structures by bonding cell‐laden electrospinning (ES) films layer by layer using fibrin glue within 90 min. This strategy allows control of cell type, cell orientation, and material composition in separate layers. Furthermore, ES films with thicker fibers (polylactic‐co‐glycolic acid, fiber diameter: ≈3.7 µm) are used as cell‐seeding layers to facilitate the cell in‐growth; those with thinner fibers (polylactic acid, fiber diameter: ≈1.8 µm) are used as outer reinforcing layers to improve the mechanical strength and reduce the liquid leakage of the scaffold. Cells grow, proliferate, and migrate well in the multilayered structure. This design aims at a new type of blood vessel substitute with flexible control of parameters and implementation of functions.     

Atomic Layer Deposition of the Metal Pyrites FeS2, CoS2, and NiS2

Atomic layer deposition (ALD) of the pyrite‐type metal disulfides FeS₂, CoS₂, and NiS₂ is reported for the first time. The deposition processes use iron, cobalt, and nickel amidinate compounds as the corresponding metal precursors and the H₂S plasma as the sulfur source. All the processes are demonstrated to follow ideal self‐limiting ALD growth behavior to produce fairly pure, smooth, well‐crystallized, stoichiometric pyrite FeS₂, CoS₂, and NiS₂ films. By these processes, the FeS₂, CoS₂, and NiS₂ films can also be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which thereby highlights the broad and promising applicability of these ALD processes for conformal film coatings on complex high‐aspect‐ratio 3D architectures in general.     

原子层沉积：一种多相催化剂“自下而上”气相制备新策略

多相催化剂是极为重要的一类催化剂,在许多重要工业反应中扮演关键角色。然而,传统的湿化学合成手段在很多情况下难以做到对催化剂活性位点的结构、组成以及其周围局部环境的原子级精细调控,继而给优化催化剂性能、理解多相催化机理带来较大的挑战。原子层沉积(ALD)是一种气相催化剂合成技术,其原理是基于两种前驱体蒸汽交替进样并在载体表面上发生分子层面上的“自限制”反应,实现目标材料在载体表面上的精准沉积。利用其分子层面上的“自限制”反应特性,并通过改变沉积周期数、次序和种类等方法可以实现对催化剂活性位结构的原子级精细控制,进而为人们提供了一种催化剂“自下而上”精细可控合成的新策略。在本文中,我们总结了利用ALD方法在负载型单金属和双金属催化剂精细设计方面的进展,讨论了ALD方法在设计高效催化剂方面的特点与优势。特别地,我们总结了利用ALD方法制备单原子和双原子结构金属催化剂的方法与策略。此外,我们总结了利用氧化物可控沉积精准调控金属催化活性中心周围的微环境,从而实现提升催化剂活性、选择性和稳定性的方法。最后我们展望了ALD技术在催化剂制备领域中应用的潜力。