压印光刻中的两步对正技术

压印光刻中套刻需要粗、精两级对正.实验采用一对斜纹结构光栅作为对正标记.利用物镜组观察光栅标记图像的边界特征进行粗对正,其准确度在精对正信号的捕捉范围内;利用光电接收器件阵列组合接收光栅莫尔信号,在莫尔信号的线区进行精对正.由于线性区的斜率大, 精对正过程中得到相应x,y方向的对正误差信号灵敏度高,利用高灵敏度对正误差信号作为控制系统的驱动信号,对承片台进行驱动定位,实现精对正.最终使X,Y方向上的重复对正准确度分别达到了± 21 nm(± 3σ)和±24 nm(± 3σ).     

氩离子激光固化环氧树脂制作三维微结构

利用激光束进行三维成像是通过逐层光引发聚合形成宏观尺度的三维实体 .最近出现的激光全息光刻技术是利用激光束的干涉产生三维全息图案 ,让感光树脂在全息图案中曝光 ,从而一次形成三维周期有序微结构 .通过调节激光干涉及波长可控制三维结构的形状及尺寸 .利用该技术获得亚微米尺度上周期性重复的三维微结构 ,可用于制作三维光子晶体 [1,2 ]等具有独特性能的聚合物材料 .本文用铁芳烃化合物与特种环氧树脂配制成阳离子型可见光固化树脂 ,在氩离子激光器产生的多束可见连续激光相干形成的空间干涉光场中曝光 ,成功地制备出亚微米量级的三…     

Heat‐Free Biomimetic Metal Molding on Soft Substrates

Fabrication of bio‐templated metallic structures is limited by differences in properties, processing conditions, packing, and material state(s). Herein, by using undercooled metal particles, differences in modulus and processing temperatures can be overcome. Adoption of autonomous processes such as self‐filtration, capillary pressure, and evaporative concentration leads to enhanced packing, stabilization (jamming) and point sintering with phase change to create solid metal replicas of complex bio‐based features. Differentiation of subtle differences between cultivars of the rose flower with reproduction over large areas shows that this biomimetic metal patterning (BIOMAP) is a versatile method to replicate biological features either as positive or negative reliefs irrespective of the substrate. Using rose petal patterns, we illustrate the versatility of bio‐templated mapping with undercooled metal particles at ambient conditions, and with unprecedented efficiency for metal structures.     

分辨力增强技术的频谱分析

离轴照明和衰减型相移掩模作为重要的分辨力增强技术,不仅可以提高光刻的分辨力,同时还可以改善成像焦深,扩大光刻工艺窗口,实现65~32 nm分辨成像。从频谱的角度分析了离轴照明和衰减型相移掩模对成像系统交叉传递函数和像场空间频率分布的影响,研究这两种技术的物理光学本质,由此进一步优化光学成像系统设计、分辨力增强技术和确定设备使用的参量。对分辨力增强技术的频谱分析研究表明,分辨力增强技术通过调整像场频谱分布,改善了光学光刻的图形质量。对于65 nm密集图形,离轴照明和相移掩模结合后可以使成像衬比度最高达到0.948,工艺窗口在5%曝光范围内焦深达到0.51μm。     

Fabrication of metal oxide nanostructures based on Atomic Force Microscopy lithography

Atomic Force Microscopy (AFM) mechanical lithography is a simple but significant method for nanofabrication. In this work, we used this method to construct nanostructures on Pt/Cu bilayer metal electrodes under ambient conditions in air. The influence of various scratch parameters, such as the applied force, scan velocity and circle times, on the lithography patterns was investigated. The Pt-Cu-Cu _x O-Cu-Pt nanostructure was constructed by choosing suitable scratch parameters and oxidation at room temperature. The properties of the scratched regions were also investigated by friction force microscopy and conductive AFM (C-AFM). The I–V curves show symmetric and linear properties, and Ohmic contacts were formed. These results indicate that AFM mechanical lithography is a powerful tool for fabricating novel metal-semiconductor nanoelectronic devices. Supported by the National Natural Science Foundation of China (Grant No. 90306010), the Program for New Century Excellent Talents in University of China (Grant No. NCET-04-0653), the National Basic Research Program of China (Grant No. 2007CB616911), and the Science and Technology Department of Henan Province (Grant No. 072300420100)     

193nm光刻曝光系统的现状及发展

投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。重点介绍了目前193nm光刻设备曝光系统的发展现状和趋势，以及为提高曝光质量所采用的相关分辨率增强技术；通过分析曝光系统的构成和其中的关键技术，探讨了国内研制相关曝光设备所面临的挑战。     

激光等离子体软X射线接近式光刻术初步研究

描述了用高功率脉冲激光打靶产生的等离子体作为软Ｘ射线源而进行的接近式软Ｘ射线光刻研究，采用负性辐射线光刻胶聚氯甲基苯乙烯，得到了一些新的实验结果。