Imprint lithography of pyramidal photonic pillars using hydrazine etching

An inexpensive method to produce a pyramidal-type 2D photonic structures in the silicon substrate was proposed. The method is based on the combination of imprint lithography and wet Si1 0 0 etching in water solution of hydrazine, which etches 1 1 1 faces much more slowly than others. Thermally grown SiO₂ mask for the hydrazine etching was used, because single Al mask cannot be well bonded to the substrate and tends to peel during the etching. It was revealed that transmittance in the infrared spectrum region of the patterned silicon decreases by about five times compared with that of flat silicon substrate and this decrease is almost independent of the angle of the incident beam. In the infrared region, decrease of transmittance of the patterned samples is directly proportional to the wave number. The shape of formed pyramids has strong influence on the transmittance. Decrease of the transmittance is much more rapid and larger in the case of sharpless pillars.     

Radical copolymerization of 2‐trifluoromethylacrylic monomers. II. Kinetics,monomer reactivities,and penultimate effect in their copolymerization with norbornenes and vinyl ethers

Radical copolymerizations of electron‐deficient 2‐trifluoromethylacrylic (TFMA) monomers, such as 2‐trifluoromethylacrylic acid and t‐butyl 2‐trifluoromethylacrylate (TBTFMA), with electron‐rich norbornene derivatives and vinyl ethers with 2,2′‐azobisisobutyronitrile as the initiator were investigated in detail through the analysis of the kinetics in situ with ¹H NMR and through the determination of the monomer reactivity ratios. The norbornene derivatives used in this study included bicyclo[2.2.1]hept‐2‐ene (norbornene) and 5‐(2‐trifluoromethyl‐1,1,1‐trifluoro‐2‐hydroxylpropyl)‐2‐norbornene. The vinyl ether monomers were ethyl vinyl ether, t‐butyl vinyl ether, and 3,4‐dihydro‐2‐H‐pyran. Vinylene carbonate was found to copolymerize with TBTFMA. Although none of the monomers underwent radical homopolymerization under normal conditions, they copolymerized readily, producing a copolymer containing 60–70 mol % TFMA. The copolymerization of the TFMA monomer with norbornenes and vinyl ethers deviated from the terminal model and could be described by the penultimate model. The copolymers of TFMA reported in this article were evaluated as chemical amplification resist polymers for the emerging field of 157‐nm lithography. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1478–1505, 2004     

金纳米颗粒的有序制备及其光学特性

采用纳米球蚀刻技术在石英衬底上制备了不同高度的金纳米颗粒阵列.通过扫描电子显微镜对其表面形貌进行了观测,表明金纳米颗粒为有序分布的三棱柱结构.通过红外—紫外吸收光谱仪在190—900nm波长范围内对其光吸收特性进行了测量, 并成功观测到了金纳米颗粒表面等离子体振荡效应引起的光吸收峰,结果表明随着金纳米颗粒高度的增加,其吸收峰的位置向短波方向移动(蓝移).同时对金纳米颗粒的光吸收特性进行了基于离散偶极子近似的理论计算,并与实验结果进行了比较. 关键词： 纳米球蚀刻技术 金纳米颗粒 离散偶极子近似     

压印光刻中的两步对正技术

压印光刻中套刻需要粗、精两级对正.实验采用一对斜纹结构光栅作为对正标记.利用物镜组观察光栅标记图像的边界特征进行粗对正,其准确度在精对正信号的捕捉范围内;利用光电接收器件阵列组合接收光栅莫尔信号,在莫尔信号的线区进行精对正.由于线性区的斜率大, 精对正过程中得到相应x,y方向的对正误差信号灵敏度高,利用高灵敏度对正误差信号作为控制系统的驱动信号,对承片台进行驱动定位,实现精对正.最终使X,Y方向上的重复对正准确度分别达到了± 21 nm(± 3σ)和±24 nm(± 3σ).     

染料掺杂光子晶体荧光带隙边缘的激射研究

利用激光全息光刻技术, 在重铬酸盐明胶 感光材料中制备了掺杂有机染料的层状光子晶体. 在532 nm纳秒脉冲激光激励下, 样品的荧光光谱表现出良好的带隙特征; 随着抽运能量的增加, 在荧光带隙带边位置获得了激射光, 并进一步研究了光子晶体的带边位置与染料荧光峰的匹配对激射的影响.带边位置越靠近染料的荧光峰, 激射阈值越低, 反之则不易产生激射.该研究为超低阈值光子晶体激光器的发展提供了思路和方法. 关键词： 全息光刻 光子晶体 荧光带隙 低阈值激射     

Complex three-dimensional microparticles from microfluidic lithography

Complex 3D microparticle, as an emerging and attractive field, has attracted more and more attention due to its versatile morphologies and broad range of applications. In this review, we provide an overall recent progress in 3D microparticles fabricated by microfluidic lithography. This review will focus on the synthesis mechanisms, synthesis process, the resultant 3D microparticles, and their applications. Finally, we will look into the future trends in complex 3D microparticles. This review will be beneficial for researchers in numerous fields, including functional materials, sensors, encryption, and biomedical engineering.     

Enhanced Photochromism of Diarylethene Induced by Excitation of Localized Surface Plasmon Resonance on Regular Arrays of Gold Nanoparticles

Localized surface plasmon resonance (LSPR) excitation on the photochromic reaction of a diarylethene derivative (DE) was studied by surface enhanced Raman scattering (SERS). UV and visible light irradiations transform reversibly DE between open-form (OF) and closed-form (CF) isomers, respectively. A mixture of PMMA and DE (either OF or CF isomer) was spin-coated onto gold nanorods (GNRs) arrays, designed by electron beam lithography, with two localized surface plasmon resonances (LSPR) at distinct wavelengths, due to their anisotropy. The photochromic reaction rates from CF to OF isomers, under LSPR excitation, were monitored from SERS spectral changes under different polarizations, on the same GNR substrate to compare the effect of LSPR field strength. It appears that the photoisomerization rate was faster when LSPR was excited with the polarization parallel to the GNR long axis. The present results highlight a potential genuine mechanism, from near field LSPR excitation, involved in the photochromic enhancement of diarylethene photochromes.     

基于分步式压印光刻的激光干涉仪纳米级测量及误差研究

针对在未做隔离保护处理的环境中,基于Michelson干涉原理的激光干涉仪测量系统存在严重的干扰误差,不适合分步式压印光刻纳米级对准测量的要求.采用Edlen公式的分析及计算,不仅在理论上揭示出环境温度、湿度、气压等变化对激光干涉仪测量准确度的影响,而且证明影响测量准确度的最大干扰源是空气流动的结果.通过气流隔离措施和系统测量反馈校正控制器,能够实时补偿激光干涉仪两路信号的相差.最终,测量漂移误差在10 min内由13 nm降低到5 nm以内,满足压印光刻在100 mm行程中达到20 nm定位准确度要求.     

Heat‐Free Biomimetic Metal Molding on Soft Substrates

Fabrication of bio‐templated metallic structures is limited by differences in properties, processing conditions, packing, and material state(s). Herein, by using undercooled metal particles, differences in modulus and processing temperatures can be overcome. Adoption of autonomous processes such as self‐filtration, capillary pressure, and evaporative concentration leads to enhanced packing, stabilization (jamming) and point sintering with phase change to create solid metal replicas of complex bio‐based features. Differentiation of subtle differences between cultivars of the rose flower with reproduction over large areas shows that this biomimetic metal patterning (BIOMAP) is a versatile method to replicate biological features either as positive or negative reliefs irrespective of the substrate. Using rose petal patterns, we illustrate the versatility of bio‐templated mapping with undercooled metal particles at ambient conditions, and with unprecedented efficiency for metal structures.