Incorporating dust lift-off into a CFD model of a blast furnace gravity dust-catcher

A gravity dust-catcher separates a mixture of dusts from the spent top gas flow of a blast furnace. These dusts are predominantly made up of limestone, iron ore and coke/coal. As a result of the turbulent gas flow patterns within a dust-catcher, modelling of the flow pattern can be very complex, attributed to the turbulent vortices that can be formed within the main body of the structure. Using data from an experimental prototype test rig, a simple model to capture the lift-off characteristics of particle lift-off from dust pile surfaces is created and incorporated into a computational fluid dynamics (CFD) model of the dust-catcher.The variation of particle separation performance over a typical blast furnace (BF) operational cycle is analysed. An attempt is made to explain the observed phenomena in terms of particle–fluid interaction. It is found that particle separation efficiency is largely unaffected by dust lift-off at low dust-catcher hopper fullness levels, but is significant at higher levels. It is found that the topography of the dust surface is important when predicting particle lift-off trends. It is concluded that this is due to the exposure experienced by a given particle when subjected to a surface velocity.     

Probability of rebound and eject of sand particles in wind-blown sand movement

When incident particles impact into a sand bed in wind-blown sand movement, rebound of the incident particles and eject of the sand particles by the incident particles affect directly the development of wind sand flux. In order to obtain rebound and eject lift-off probability of the sand particles, we apply the particle-bed stochastic collision model presented in our pervious works to derive analytic solutions of velocities of the incident and impacted particles in the post-collision bed. In order to describe randomness inherent in the real particle-bed collision, we take the incident angle, the impact position and the direction of resultant action of sand particles in sand bed on the impacted sand particle as random variables, and calculate the rebound and eject velocities, angles and coefficients (ratio of rebound and eject velocity to incident velocity). Numerical results are found in accordance with current experimental results. The rebound and eject lift-off probabilities versus the incident and creeping velocities are predicted. The project was supported by the National Natural Science Foundation of China (10532040, 10601022). The English text was polished by Yunming Chen.     

激光分离脆性材料的研究

传统分离脆性材料的技术由于易产生残余应力、显微裂纹与边部碎屑等缺陷，越来越不能满足半导体工业高精度与高清洁度的要求。激光微细加工技术以无污染、无接触及加工精度高、操作柔性好等优势，正成为一种很有潜力的脆性材料精密加工技术。介绍了用于分离脆性材料的几种典型激光微细加工技术，包括激光烧蚀切割技术、激光诱导张应力控制微裂纹扩展技术与激光剥离技术的工艺原理、特点及研究现状，指出了其存在的主要问题并探讨了其改进措施。最后预测了激光分离技术的发展前景。     

Micropatterning and transferring of polymeric semiconductor thin films by hot lift-off and polymer bonding lithography in fabrication of organic field effect transistors (OFETs) on flexible substrate

Micropatterning and transferring of polymeric semiconductor thin films by hot lift-off and polymer bonding lithography in fabrication of OFETs with polymeric dielectric on the flexible substrate was proposed. The desired polymeric semiconductor patterns were fabricated on the flat polydimethylsiloxane (PDMS) surface with a selective lift-off method we proposed previously. The isolated and well defined polymeric semiconductor patterns left on the flat PDMS surface can be further transferred to the gate polymeric dielectric surface by polymer bonding lithography due to the low interfacial energy of PDMS. The transistor fabricated with this ‘dry’ process has a higher field-effect mobility compared with that using spin coated semiconductor layer.     

湿法和溶脱法的亚微米ZnO:Al光栅制备

以激光干涉法得到的光刻胶图案为掩模,采用湿法刻蚀和溶脱-剥离法制备了具有良好减反射特性的亚微米掺铝氧化锌（ZnO:Al, AZO）光栅。表面形貌特征和反射光谱测试结果表明,湿法刻蚀较溶脱-剥离法得到的AZO光栅表面更为粗糙,两者均方根粗糙度分别为25.4,7.6 nm。在400～900 nm波段,两种方法制备的周期和高度相同的光栅,平均总反射率分别由AZO薄膜的12.5%下降到8.3%和10.2%。两者的平均镜面反射率分别为6.2%和6.6%,平均漫反射率分别为2.1%和3.6%。湿法刻蚀得到的表面较为粗糙AZO光栅的漫反射明显减弱,从而导致总的减反特性优于溶脱-剥离法得到的表面起伏相对较小的AZO光栅。     

Solvent-Tolerant Patterning of Poly(3-hexylthiophene) Film by Subtractive Photolithography

This study investigates how the fringing field affects the total current flow within a conducting polymer. In order to extract the fringing field component of bar pattern resistors, a solvent-assisted patterning method using subtractive photolithography was successfully established for the conducting polymer poly(3-hexylthiophene). By comparing the current quantities of unpatterned and patterned resistors, a conductance factor for the fringing field was calculated, proving to be almost constant regardless of the resistor length. It is therefore concluded that the length as well as the width of the conducting polymer film need to be suitably patterned for the precise operation of organic electronic devices. In this regard, the patterning method developed will be useful for the fabrication of micro-scale devices.