旋转双棱镜光束指向控制技术综述

旋转双棱镜系统通过两棱镜的共轴独立旋转改变光的传播方向,可用于调整光束或视轴指向。与传统的两轴、三轴式光电平台相比,基于旋转双棱镜设计的光束或视轴调整装置具有精度高、结构紧凑、动态性能好等优点,已成为传统光电平台的有益补充。本文分析了双棱镜系统的光束指向调整机制;介绍了国内外相关基础研究的热点问题,主要涉及光束转向机制、光束扫描模式、棱镜回转控制以及棱镜引起的光束变形、成像色差、成像畸变的研究。文中描述了该项技术的应用进展,给出了利用该项技术开发的典型产品以及该项技术在激光光束指向调整和目标搜索、识别与跟踪成像方面的应用。最后,探讨了旋转棱镜在扫描模式、光束质量、成像色差与畸变、回转控制等方面面临的技术难题,并对其发展趋势进行了展望。     

磁控溅射制备W掺杂VO2/FTO复合薄膜及其性能分析

为了获得相变温度低且热致变色性能优越的光学材料, 室温下在F:SnO₂ (FTO)导电玻璃基板表面沉积钨钒金属膜, 再经空气气氛下的热氧化处理, 制备了W掺杂VO₂/FTO复合薄膜, 利用X射线光电子能谱、X射线衍射和扫描电镜对薄膜的结构和表面形貌进行了分析. 结果表明: 高温热氧化处理过程中没有生成W, F, V混合氧化物, W以替换V原子的方式掺杂. 与采用相同工艺和条件制备的纯VO₂/FTO复合薄膜相比, W掺杂VO₂薄膜没有改变晶面取向, 仍具有(110)晶面择优取向, 相变温度下降到35 ℃左右, 热滞回线收窄到4 ℃, 高低温下的近红外光透过率变化量提高到28%. 薄膜的结晶程度明显提高, 表面变得平滑致密, 具有很好的一致性, 对光电薄膜器件的设计开发和工业化生产具有重要意义. 关键词： W掺杂 2')" href="#">VO₂ FTO导电玻璃 磁控溅射     

光学薄膜测量时平顶光束激励的表面热透镜理论模型

推导了调制的平顶光束激励下基于Fresnel衍射积分的表面热透镜理论，通过数值模拟，比较了平顶光束和高斯光束激励下样品内部温度场、表面形变场和探测光衍射信号的径向分布，分析了影响表面热透镜信号的实验参数.结果表明，在最佳探测位置，平顶光束激励下的表面热透镜系统比相同情况下高斯光束激励下的灵敏度高，最高时约2倍，更有利于薄膜吸收测量. 关键词： 表面热透镜 光学薄膜 平顶光束     

Band gap control of phononic beam with negative capacitance piezoelectric shunt

Periodic arrays of negative capacitance shunted piezoelectric patches are employed to control the band gaps of phononic beams. The location and the extent of induced band gap depend on the mismatch in impedance generated by each patch. The total impedance mismatch is determined by the added mass and stiffness of each patch as well as the shunting electrical impedance. Therefore, the band gap of the shunted phononic beam can be actively tuned by appropriately selecting the value of negative capacitance. The control of the band gap of phononic beam with negative capacitive shunt is demonstrated numerically by employing transfer matrix method. The result reveals that using negative capacitive shunt to tune the band gap is effective.     

富硅氮化硅／c—Si异质结中的电流输运机理研究

采用对靶磁控溅射方法在P型晶体硅（c—Si）衬底上沉积n型富硅氮化硅（SiNx）薄膜,形成了富硅SiNx／c—Si异质结．异质结器件呈现出较高的整流比,在室温下当V=4-2V时为1．3×10^3．在正向偏压下温度依赖的J—V特性曲线可以分为三个明显不同的区域．在低偏压区载流子的输运满足欧姆传输机理,在中间偏压区的电流是由载流子的隧穿过程和复合过程共同决定的,在较高偏压区的电输运以具有指数陷阱分布的空间电荷限制电流（SCLC）传输机理为主．     

Interaction of light filaments in air

This paper analytically investigates the interaction of light filaments generated by a femtosecond laser beam in air. It obtains the Hamiltonian of a total laser field and interaction force between two filaments with different phase shifts and crossing angles. The property of the interaction force, which leads the attraction or repulsion of filaments, is basically dependent on the phase shift between filaments. The crossing angle between two filaments can only determine the magnitude of the interaction force, but does not change the property of the force.     

Influence of AlN buffer layer thickness on structural properties of GaN epilayer grown on Si (111) substrate with AlGaN interlayer

We present the growth of GaN epilayer on Si (111) substrate with a single AlGaN interlayer sandwiched between the GaN epilayer and AlN buffer layer by using the metalorganic chemical vapour deposition. The influence of the AlN buffer layer thickness on structural properties of the GaN epilayer has been investigated by scanning electron microscopy, atomic force microscopy, optical microscopy and high-resolution x-ray diffraction. It is found that an AlN buffer layer with the appropriate thickness plays an important role in increasing compressive strain and improving crystal quality during the growth of AlGaN interlayer, which can introduce a more compressive strain into the subsequent grown GaN layer, and reduce the crack density and threading dislocation density in GaN film.     

High accuracy calculation of the hydrogen negative ion in strong magnetic fields

Using a full configuration-interaction method with Hylleraas-Gaussian basis function, this paper investigates the 1¹0⁺, 1¹(–1)⁺ and 1¹(–2)⁺ states of the hydrogen negative ion in strong magnetic fields. The total energies, electron detachment energies and derivatives of the total energy with respect to the magnetic field are presented as functions of magnetic field over a wide range of field strengths. Compared with the available theoretical data, the accuracy for the energies is enhanced significantly. The field regimes 3 < γ < 4 and 0.02 < γ < 0.05, in which the 1¹(–1)⁺ and 1¹(–2)⁺ states start to become bound, respectively, are also determined based on the calculated electron detachment energies.     

反应离子刻蚀ZnTe的THz辐射和探测研究

运用电光采样技术揭示了反应离子刻蚀（RIE）ZnTe晶体表面THz辐射的光学整流产生机制， 观察到0.25 ps的THz场分布.通过比较刻蚀前后以及不同刻蚀条件下ZnTe样品在不同激发功 率下的THz辐射强度，发现由于反应离子刻蚀破坏了ZnTe样品表面的有序性，晶体的电光系 数随射频功率的增加而减小.借助于计算不同刻蚀条件下ZnTe晶体的频率响应函数，分析了 随射频功率增加ZnTe晶体响应频谱展宽的现象. 关键词： THz辐射 反应离子刻蚀 ZnTe     

Harmonic operation of high gain harmonic generation free electron laser

In high gain harmonic generation (HGHG) free electron laser (FEL), with the right choice of parameters of the modulator undulator, the dispersive section and the seed laser, one may make the spatial bunching of the electron beam density distribution correspond to one of the harmonic frequencies of the radiator radiation, instead of the fundamental frequency of the radiator radiation in conventional HGHG, thus the radiator undulator is in harmonic operation (HO) mode. In this paper, we investigate HO of HGHG FEL.Theoretical analyses with universal method are derived and numerical simulations in ultraviolet and deep ultraviolet spectral regions are given. It shows that the power of the 3rd harmonic radiation in the HO of HGHG may be as high as 18.5% of the fundamental power level. Thus HO of HGHG FEL may obtain short wavelength by using lower beam energy.