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61.
为了探究超声搅拌磁流变抛光液的制备及优化工艺,利用多物理场数值计算方法,建立了超声搅拌磁流变抛光液的声场仿真模型。研究了20 kHz下不同液位深度、超声变幅杆探入深度、不同功率下磁流变抛光液的声场分布。通过测量磁流变抛光液的声场强度对声场仿真进行了验证。结果表明:随着距变幅杆距离的增加,声强逐渐减弱,高声强区域主要分布在换能器轴线附近。声强在距变幅杆输出端20 mm范围内急剧衰减,变幅杆最佳探入深度为10 mm,增大功率有助于空化区域的扩大。声场仿真结果与实验测量结果基本一致,对磁流变抛光液的制备提供了数值计算基础。 相似文献
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Traditional abrasive fluid jet polishing (FJP) is limited by its high-pressure equipment, unstable material removal rate, and applicability to ultra-smooth surfaces because of the evident air turbulence, fluid expansion, and a large polishing spot in high-pressure FJP. This paper presents a novel cavitation fluid jet polishing (CFJP) method and process based on FJP technology. It can implement high-efficiency polishing on small-scale surfaces in a low-pressure environment. CFJP uses the purposely designed polishing equipment with a sealed chamber, which can generate a cavitation effect in negative pressure environment. Moreover, the collapse of cavitation bubbles can spray out a high-energy microjet and shock wave to enhance the material removal. Its feasibility is verified through researching the flow behavior and the cavitation results of the negative pressure cavitation machining of pure water in reversing suction flow. The mechanism is analyzed through a computational fluid dynamics simulation. Thus, its cavitation and surface removal mechanisms in the vertical CFJP and inclined CFJP are studied. A series of polishing experiments on different materials and polishing parameters are conducted to validate its polishing performance compared with FJP. The maximum removal depth increases, and surface roughness gradually decreases with increasing negative outlet pressures. The surface becomes smooth with the increase of polishing time. The experimental results confirm that the CFJP process can realize a high material removal rate and smooth surface with low energy consumption in the low-pressure environment, together with compatible surface roughness to FJP. 相似文献
65.
针对超薄光学元件在加工过程中因重力和磨头产生应力形变的特点,提出了一种高效、先进的超薄光学元件综合加工方法。该方法综合运用了精密铣磨、精密抛光、离子束修形等先进技术进行面形控制。在铣磨阶段采用受力分析和误差补偿的方法降低了元件变形引入的面形误差;在抛光阶段通过气囊抛光和沥青抛光的迭代实现了面形快速收敛;在离子束加工阶段充分利用其非接触、无应力的加工特点实现了高精度面形修正。实验选择径厚比为34(边长152 mm,厚度6.35 mm)的方形融石英材料进行加工实验。结果表明:在铣磨、抛光、修形阶段的各项指标都达到了精密光学元件的加工水平,最终的面形精度为PV=25 nm,RMS=1.5 nm。该加工方法可以广泛应用于超薄光学元件的高精度加工。 相似文献
66.
Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate 总被引:1,自引:0,他引:1
To improve their chemical mechanical polishing (CMP) performance, ceria nanoparticles were surface modified with γ-aminopropyltriethoxysilane (APS) through silanization reaction with their surface hydroxyl group. The compositions, structures and dispersibility of the modified ceria particles were characterized by Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), laser particle size analyzer, zeta potential measurement and stability test, respectively. The results indicated that APS had been successfully grafted onto the surface of ceria nanoparticles, which led to the modified ceria nanoparticles with better dispersibility and stability than unmodified ceria particles in aqueous fluids. Then, CMP performance of the modified ceria nanoparticles on glass substrate was investigated. Experimental results showed that the modified ceria particles exhibited lower material removal rate (MRR) but much better surface quality than unmodified ceria particles, which may be explained by the hardness reduction of ceria particles, the enhancement of lubrication of the particles and substrate surfaces, and the elimination of the agglomeration among the ceria particles. 相似文献
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Sub-micrometer ultra fine CeO2-ZrO2 mixed oxides have been prepared by milling solid cerium carbonate and zirconium oxy-chloride with ammonia and followed by filtering, drying and calcining procedures. The effects of Ce/Zr molar ratio, milling time and calcining temperature on the phase composition, particle size and morphology, surface charge, as well as the polishing property were investigated. The results show that the mixed oxide calcined at 1 000 ℃ is composed of cubic ceria doped with zirconium and tetragonal zirconia doped with cerium, and the phase composition varies with calcination temperature and the Ce/Zr molar ratio. The monoclinic zirconia is observed when decreasing calcination temperature and shortening milling time, demonstrating that milling and calcining can force the phase transformation from monoclinic zirconia to cerium stabilized tetragonal zirconia and zirconium doped cubic ceria solid solutions. The removal rate for the optical glass polishing varies with Ce/Zr molar ratio. A synergetic polishing effect is found when Ce/Zr molar ratio below 4, and the optimal Ce/Zr molar ratio is 1∶1. At the same time, the cubic ceria content, density, particle size and surface charge all increase when calcination temperature increasing from 800 ℃ to 1 100 ℃. However, the particle morphology changes from disperse quasi-sphere to irregular aggregation and the maximal removal rate for optical glass polishing lies at 1 000 ℃.These facts show that the polishing property of the synthesized ceria-zirconia mixed oxide is affected by the particle physical characteristics comprehensively. 相似文献
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For big software developing companies, it is important to know the amount of problems of a new software product that are expected to be reported in a period after the date of release, on a weekly basis. For each of a number of past releases, weekly data are present on the number of such reports. Based on the type of data that is present, we construct a stochastic model for the weekly number of problems to be reported. The (non‐parametric) maximum likelihood estimator for the crucial model parameter, the intensity of an inhomogeneous Poisson process, is defined. Moreover, the expectation maximization algorithm is described, which can be used to compute this estimate. The method is illustrated using simulated data. Copyright © 2004 John Wiley & Sons, Ltd. 相似文献