Photophysical processes and photochemical reactions involved in poly(N-vinylcarbazole) and in copolymers with carbazole units

This paper is devoted to the analysis of the photochemical behaviour of copolymers with carbazole units exposed to long-wavelength radiation. These copolymers are constituted of two types of carbazolylethyl methacrylate units (CEM) with octyl methacrylate moieties (OMA). The exposure of copolymers and PVK to UV light results in dramatic modifications of the physical and photophysical properties of the polymer. These modifications can be correlated with modifications of the chemical structure of the matrix. The photoageing of copolymers and PVK has been analysed by fluorescence, ESR, UV-vis and infrared spectroscopies. The effects of crosslinking and chain scissions were determined by gel fraction measurements and size exclusion chromatography.     

Mechanistic study of thermal behavior and combustion performance of epoxy resins: I homopolymerized TGDDM

Tetraglycidyl 4,4′-diaminodiphenylmethane (TGDDM) undergoes homopolymerization on heating. Intramolecular reactions which compete with crosslinking favor the formation of cyclic structures with increasing thermal and fire resistance of the resin, whereas physical mechanical properties tend to decrease. The mechanism of thermal decomposition of TGDDM is studied by thermogravimetry, differential scanning calorimetry and thermal volatilization analysis with characterization of volatiles evolved and residue left. Thermal degradation of poly-(TGDDM) starts at 260°C with elimination of water from secondary alcoholic groups which is a typical pathway for epoxy resin degradation. Resulting unsaturations weaken bonds in the β-position and provoke the first chain breaking at allyl–amine and allyl–either bonds. With increasing temperature, saturated alkyl–ether bonds and alkyl carbon–carbon bonds are broken first, followed by the most stable alkyl–aryl bonds at T>365°C. The combustion performance of TGDDM is discussed on the basis of the thermal degradation behavior.     

The application of the concept of reaction layer to the study of electrode processes coupled with the second-order chemical reactions at microelectrodes under steady-state conditions

Under steady-state conditions, the current equations of the second-order EC, ECE and DISPI reactions at microdisk, microspherical and microring electrodes are derived with the aid of the concept of the reaction layer. The conditions under which these equations would be valid are also discussed. Using these equations, methods to determine the kinetic parameters for the second-order EC, ECE and DISPI reactions are presented. The reduction of 2,6-diphenyl-pyrylium cation and oxidation of triphenylamine were investigated as examples of the second-order EC and ECE reactions.     

Characterization of Autocatalytic Reactions in Modified Cellulose/NMMO Solutions by Thermal Analysis and UV/VIS Spectroscopy

The thermal stability of cellulose/N-methylmorpholine-N-oxide (NMMO) solutions were investigated using UV/VIS spectrometry with a temperature programming cuvette and caloric measurements by means of the Systag calorimeter RADEX (mini-autoclave). Both analytical methods allow to characterize the influences of stabilizers and additives. With the temporal course of the optical density, temperature and pressure thermal runaway reactions with gas evolution and accumulation of chromophoric degradation products were recognized. Kinetic model calculations compared with UV/VIS measurements demonstrate the existence of autocatalytic reactions in cellulose/NMMO solutions. Varying the heating rate autocatalysis can be proved by dynamic caloric measurements as well.     

Thermodynamic study of the three isomers of bromo and iodobenzoic acids. Part II

Using our technique of combustion of small amount of a substance, we determined by calorimetry the standard molar enthalpy of formation in the condensed state and atT=298.15 K of the three isomers of bromo and iodobenzoic acids. Associating to these values their standard molar enthalpies of sublimation previously measured, it was possible to determine their standard molar enthalpies of formation in the gaseous state and atT=298.15 K. The experimental values of the thermodynamic properties _f H _m ^o (cr, 298.15 K), _f H _m ^o (cr, 298.15 K), _sub H _m ^o (298.15 K), and _f H _m ^o (g, 298.15 K) are given for the two series. From the experimental value of the standard molar enthalpy of atomization, it was possible to determine an enthalpy value for the C_b-Br and C_b-I bonds. The experimental and theoretical values of the resonance energy of bromo and iodobenzoic acids are compatible. The relative stability of some monosubstituted derivatives of benzoic acid studied in our laboratory is also discussed.Part I is concerned with Ref. 22 (for bromobenzoic acids) and with Ref. 23 (for iodobenzoic acids).     

Optimal dynamic advertising policies for hereditary processes

In this paper, the Nerlove-Arrow model of optimal dynamic advertising policies is generalized by assuming a general probability distribution of the forgetting time, rather than the exponential one. A control problem with integrodifferential equations of motion is defined for which the transitory and steady-state properties of the optimal advertising policy are examined. The effects of assumptions like IHR-distributions and DHR-distributions, the existence of an upper bound for the forgetting time, etc., are explained. It is shown that there are two (in the case of an exponential distribution even three) different current-value adjoint functions associated with the problem, and relations between the two (three) are established. Also provided is a sensitivity analysis.Thanks are due to G. Feichtinger and S. Jorgensen for useful discussions.     

石油焦与煤混合燃料热重分析研究

石油焦与煤混合燃烧是高效处理石油焦的有效方法，作者对选用的石油焦和煤不同配比的混合燃料进行了热重分析研究。使用常压高温热天平研究、分析了各配比混合燃料的热解特性和燃烧特性。并根据化学动力学方法计算了各过程的化学动力学参数，即活化能E和频率因子A0。结果表明，各混合燃料热解起始温度大致相同，随煤焦比减小，挥发分析出速率变缓，最大释放速度所对应的温度升高，最终失重率减小，挥发分释放特性指数减小；随煤焦比增大，混合燃料着火温度和燃尽温度逐渐降低，最大燃烧速率所对应的温度降低，燃烧特性指数增大；随煤焦比减小，活化能和频率因子增大。     

Cu-Mg/Al复合氧化物催化碳颗粒物燃烧性能的研究

恒定二价与三价阳离子比为3(nM2+/nM3+=3),采用共沉淀法制备不同Cu含量的系列水滑石前驱物, 800 ℃焙烧4 h形成复合氧化物(CuO质量百分数分别为0％、5％、10％、15％、20％、30％、40％)用作柴油车排放碳颗粒物燃烧的催化剂,并采用XRD、BET、TG-DSC、FT-IR、TPR等表征手段研究了Cu、Mg含量对材料前驱物物化性能的影响及对其衍生复合氧化物催化碳颗粒物燃烧性能的影响．结果表明,Cu、Mg含量对材料的热稳定性、比表面和催化氧化活性有显著的影响. Mg有助于提高催化剂的热稳定性; Cu含量增加,催化剂比表面下降,但比表面不是影响催化剂活性的主要因素. CuO含量为15％时,催化剂具有最好的催化活性和稳定性,碳颗粒物的起燃温度(T10)和半转化温度(T50)分别为336 ℃和409 ℃.在CuO含量≤30％时可以形成结构完整的水滑石前驱物, CuO含量为40％时出现Cu(OH)2杂相; CuO含量< 20％时,经高温焙烧可得到均匀的复合氧化物, CuO含量≥20％时出现CuO偏析． TPR结果表明焙烧温度和复合氧化物的组成决定了材料的可还原性能．     

Thermodynamics of phenylated polyphenylene between 0 and 340 K

In an adiabatic vacuum calorimeter, the temperature dependence of the heat capacity C _p of phenylated polyphenylene and initial comonomer 1,4-bis(2,4,5-triphenylcyclopentadienone-3-yl)benzene was studied between 6 and 340 K with an uncertainty of about 0.2%. In a calorimeter with a static bomb and an isothermal shield their energies of combustion DUcomb were measured. From the experimental data, the thermodynamic functions C _p ⁰ (T), H ⁰(T)-H ⁰(0), S ⁰(T)-S⁰(0), G ⁰(T)-H ⁰(0) were calculated from 0 to 340 K, and standard enthalpies of combustion ΔH _comb ⁰ and thermodynamic parameters of formation-enthalpies ΔH _f ⁰, entropies ΔH _f ⁰, Gibbs functions ΔG _f ⁰ - of the substances studied were estimated at T=298.15 K at standard pressure. The results were used to calculate the thermodynamic characteristics (ΔH _f ⁰ ,ΔS _f ⁰, ΔG _f ⁰) of phenylated polyphenylene synthesis in the range from 0 to 340 K. This revised version was published online in July 2006 with corrections to the Cover Date.     

Mechanism of silicon film deposition in the RF plasma reduction of silicon tetrachloride

Plasma-chemical reduction of SiCl₄ in mixtures with H₂ and Ar has been studied by optical emission spectroscopy (OES) and laser interferometry techniques. It has been found that the Ar:H₂ ratio strongly affects the plasma composition as well as the deposition (r _D) and etch (r _E) rates of Si: H, Cl films and that the electron impact dissociation is the most important channel for the production of SiCl_x species, which are the precursors of the film growth. Chemisorption of SiCl_x and the reactive surface reaction SiCl_x+H–SiCl_(x–1)0+HCl are important steps in the deposition process. The suggested deposition model givesr _D [SiCl_x][H], in agreement with the experimental data. Etching of Si: H, Cl films occurs at high Ar: H₂ ratio when Cl atoms in the gas phase become appreciable and increases with increasing Cl concentration. The etch rate is controlled by the Cl atom chemisorption step.