大孔径宽光谱变焦镜头设计北大核心CSCD

在高压电线运输电力过程中容易发生电晕放电现象,存在安全隐患,因此,进行电晕放电的检测十分必要。利用日盲紫外镜头进行电晕检测是检测手段之一。基于Zemax多重组态功能设计了一款大孔径宽光谱变焦镜头,目的是配合变焦范围为90 mm~165 mm变焦距紫外镜头应用,可在电晕放电信号检测时,全天候、快速准确找出损坏线路的位置。该镜头采用4组元、近对称结构型式,F数为1.4,可变焦范围在30 mm~55 mm,工作光谱波段为400 nm~850 nm,空间频率100 lp/mm处全视场MTF≥0.4,最大畸变≤±3%,均采用标准球面设计,系统总长为110 mm,适用于0.847 cm(1/3英寸)CCD,能较好地矫正各类像差,满足各零件基本加工工艺要求。     

不同因素对可调节人工晶体屈光调节力的影响

首先以Hwey-Lan Liou眼模型为基础，根据等效性原则，保持该眼模型中自然晶状体屈光度不变，对无穷远点成像。然后利用ZEMAX实现光线追迹的方法，将自然晶状体替换为可调节人工晶状体（accommodative intraocular lens，AIOL），结合对人眼成像质量影响的分析，研究了AIOL在眼内的移动度、材料、中心厚度、结构、光学面非球面性等因素对其屈光调节力的影响。结果表明:AIOL移动度对其调节力贡献最大,材料、中心厚度、结构对调节力基本无影响；具有非球面光学面的AIOL调节力相对较大。     

Software lens compensation applied to athermalization of infrared imaging systems

A different approach, aiming to achieve the constant blur status of point-spread function (PSF) at a certain defocused plane, is described. The correlation between the two PSF is used to control the PSF blur similarity, and simultaneously the Strehl ratio is also used to control the PSF blur minimization. By designing the PSF so that it is significantly insensitive to defocus or related defocus quantity, for example, due to temperature change, all the constantly blurred images can be accurately de-blurred by a simple inverse restoration filter for an adequate range of defocus. We refer to that as “software lens compensation” and apply a design method to solve the athermalization of middle wavelength infrared (MWIR) imaging systems. The resultant PSF is almost invariant in the temperature range from −10 to 50°C at the same focal plane. Consequently, the constant blur spot can be removed by a simple digital signal processing. Thus, clear and sharp de-blurred images at different temperatures are obtained.     

Effect of the defect on the focusing in a two-dimensional photonic-crystal-based flat lens

We have investigated in detail the influence of defect on the focusing of electromagnetic waves in a two-dimensional photonic-crystal flat lens by using the finite-difference time-domain method. The result shows that many focusings can be observed at the symmetrical positions when a defect is introduced into the lens. Furthermore, the wave-guides in the lens can confine the transmission wave effectively and improve the quality of the focusing.     

193nm光刻曝光系统的现状及发展

投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。重点介绍了目前193nm光刻设备曝光系统的发展现状和趋势，以及为提高曝光质量所采用的相关分辨率增强技术；通过分析曝光系统的构成和其中的关键技术，探讨了国内研制相关曝光设备所面临的挑战。     

梯度折射率棒透镜的色差模型

本文提出一个梯度折射率棒透镜(GRIN－RodLens)的色差模型,并运用本模型合理地解释了在色差测量过程发现的各类色差现象.     

透镜不胶盘单件抛光技术

本文介绍了在ＹＧ３６６高速抛光机上进行的透镜不胶盘单件抛光技术。这一新的抛光方法比弹性成盘法和刚性成盘法有许多优点：它省掉了许多辅助工序，缩短了抛光时间，所以生产周期短，效率高，成本低。同时给出了根据透镜的结构参数进行生产技术准备和评估抛光过程稳定性的公式。最后提出了进一步改进的设想。     

Aberration-corrected catadioptric magnifiers useful for simple microfiche readers

The present paper considers the magnifying power and aberration properties of three different catadioptric magnifying systems useful for application as simple hand-held microfiche readers. These are in the form of a plano-convex lens, a meniscus lens and an achromatic doublet lens and all their outer surfaces have been coated with a semi-reflecting film so that they behave like catadioptric elements. These can be designed to give magnification in the range of 15 × to 25 × with sufficient eye relief. Using such magnifiers, it is possible to read microfiche having frame sizes of 16 × 12 mm and 12 × 9 mm. The cemented achromatic doublet coated on the outer surfaces seems to give a very good image for use in microfiche reader.     

Changes Brought about by a Lens in an Obliquely Incident Laser Beam

In the paraxial optics approximation, we have studied the transformation of a simple Gaussian beam of light obliquely incident on an isotropic lens for the case where the axis of the beam and the principal optical axis of the lens are crossed straight lines. The data obtained are compared with the corresponding results for the case where the axes of the beam and lens are coplanar.     

Submicron External Electro-optic Measuring System Based on an Electro-optic Solid Immersion Lens

In this paper, all electro-optic solid immersion lens (EOSIL) is introduced, which is made of GaAs. A reflecting external electro-optic measuring system based on the EOSIL is built. With a hemispherical GaAs EOSIL used as the external probe, 0.7 µm spot size is obtained when the wavelength of the probing beam from a laser diode is 1.3 µm and a microscope objective with 0.3 numerical aperture is used. The principle of the measuring system is analyzed by Jones matrix. By using the system, the electrical signals propagating on a microstrip transmission line are successfully measured. The voltage sensitivity about 5 mV/ is measured when 10 kHz sinusoidal electric signal is applied on the microstrip line.