等离子体合成射流能量效率及工作特性研究

基于等离子体激励器工作过程中气体放电的焦耳加热作用, 并结合局部热力学平衡等离子体物理假设, 开展了等离子体合成射流三维唯象数值研究, 获得了完整工作周期内等离子体合成射流流场发展演变过程. 研究结果表明, 单次能量沉积建立的自维持周期性射流中存在有实现激励器腔体"充分" 回填的最大脉冲工作频率––饱和频率. 大的能量沉积、小的激励器出口直径和相同腔体体积下大的径高比都可以产生速度更高的射流, 而射流速度的提高会伴随有饱和频率的降低. 一个饱和周期内, 最多约有16%的初始腔内气体喷出, 吸气复原仅能实现初始腔体质量90%左右的回填.一个大气压条件下, 容性电源供能的等离子体合成射流激励器电能向气体热能和射流动能的转化效率分别约为5%和1.6%. 关键词： 等离子体激励器 合成射流 能量效率 饱和频率     

脉冲高能量密度等离子体薄膜制备与材料表面改性

脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。文章主要介绍了作者近几年来在这方面的研究成果。从理论和试验上研究了脉冲高能量密度等离子体的产生机制及其物理性质，研究了脉冲等离子体与材料相互作用的基本物理现象和物理机制，诊断测量表明，脉冲等离子体具有电子温度高（10－100eV）、等离子体密度高（10^14-10^16cm^-3）、定向速度高（－10^7cm/s）、功率大（10^4W/cm^2）等特点，在制备薄膜时具有沉积速率高，薄膜与基底粘结力强，并兼有激光表面处理、电子束处理、冲击波轰击、离子注入、溅射、化学气相沉积等综合性特点，可以在室温下合成亚稳态相和其他化合物材料。在此基础上，系统地进行了脉冲等离子体薄膜制备和材料表面改性及其机理的研究，在室温下的不同材料衬底上成功的沉积了性能良好的较大颗粒立方氮化硼、碳氮化钛、氮化钛、类金刚石、氮化铝等薄膜材料，沉积薄膜和基底之间存在一个很宽的过渡层，因此导致薄膜与基底有很强的粘结力，经脉冲等离子体处理过的金属材料表面性能得到了极大改善。     

The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD

Hydrogenated amorphous and microcrystalline silicon films were deposited by inductively coupled plasma chemical vapor deposition (ICP-CVD) at low substrate temperatures using H₂-diluted SiH₄ as a source gas. High-density plasma generated by inductively coupled excitation facilitates the crystallization of silicon films at low temperatures, and microcrystalline silicon films were obtained at the substrate temperature as low as 180 °C. The columnar structure of the films becomes more and more compact with an increase of their crystallinity. The reduction of hydrogen content in the films causes a narrowing of the optical bandgap and an enhancement of the absorption with increasing the substrate temperature. The microcrystalline silicon films show two electronic transport mechanisms: one is related to the density of state distribution in the temperature region near room temperature and the other is the variable range hopping between localized electronic states close to the Fermi level below 170 K. A reasonable explanation is presented for the dependence of the optoelectronic properties on the microstructure of the silicon films. The films prepared at a substrate temperature of 300 °C have highly crystalline and compact columnar structure, high optical absorption coefficient and electrical conductivity, and a low hydrogen content of 3.8%.     

Seed priming with cold plasma improved seedling performance,secondary metabolism,and expression of deacetylvindoline O-acetyltransferase gene in Catharanthus roseus

The plasma-primed seeds of Catharanthus roseus were cultured in a hormone-free culture medium under sterile conditions. Plasma of 30 or 60 s improved root length (mean = 41.4%) and biomass (mean = 47%), whereas plasma of 90 s delayed plant growth. The plasma treatments enhanced concentrations of photosynthetic pigments and soluble phenols. Plasma of 90 s increased the proline level. With a similar trend, plasma priming induced activities of phenylalanine ammonia-lyase, catalase (about twofold) and peroxidase (31%) enzymes. Plasma also upregulated the expressions of deacetylvindoline O-acetyltransferase gene by an average of 7.8 times. Similarly, the plasma-treated seedlings contained higher concentrations of alkaloids (mean = 72%). Here, molecular evidence is provided on the plasma-associated modifications in secondary metabolism.     

Diffraction of electromagnetic waves by a resistive half-plane in magneto-ionic plasma

The interaction of magnetic polarized electromagnetic wave with a resistive half-plane in magneto-ionic plasma is investigated. The method of transition boundary is used for the evaluation of the diffracted wave. The excitation of surface waves is examined in the medium and their diffracted fields are derived by using the diffraction theory for grazing incidence. The uniform field expressions are obtained with the aid of the uniform theory for evanescent waves. The behaviours of the derived scattered waves are studied numerically.     

微波瑞利散射法测定空气电火花激波等离子体射流的时变电子密度

大气压空气电火花激波等离子体射流的电子密度在亚微秒时间尺度上瞬变,其电子密度的测定很难.基于微波瑞利散射原理,本文测量了空气电火花冲击波流注放电等离子体射流的时变电子密度.实验结果表明:测量系统的标定参数A为1.04 × 105 V·Ω·m–2;空气流注放电等离子体射流的电子密度与等离子体射流的半径和长度有关,结合高速放电影像展示的等离子体射流的等效半径和等效长度,测定的电子密度在1020 m–3的量级,且随时间先快速增长至峰值再成指数衰减.此外,本文还探讨了等离子体射流的不同等效尺度对测定结果的影响;分析结果表明,采用时变等效半径和时变等效长度的计算结果最有效,且第1个快速波峰是由光电离的电离波导致的.     

消毒灭菌的电离辐射与电磁辐射等物理技术比较分析北大核心CSCD

消毒灭菌技术广泛应用于食品工业、医疗领域、水处理等方面。相对于传统化学和热效应的消毒灭菌方法,γ射线、X射线、电子束、微波、低温等离子体、紫外线、高压脉冲电场等物理手段具有不污染环境、消毒灭菌温度低、没有化学残留物等优点而日益受到重视。但这些物理技术手段各有不同,本文首先介绍了γ射线、X射线、电子束、微波、低温等离子体、紫外线、高压脉冲电场等消毒灭菌的技术原理,然后对比了各自优缺点和应用领域。每种方法都有优势和不足,应针对不同的消毒灭菌对象而选择不同的方式。最后,展望了消毒灭菌的发展方向,提出了消毒灭菌在家庭日常消毒、医疗垃圾处理、有人状态下的室内空气消毒等方面的迫切需求。     

激光惯性约束聚变中光学汤姆逊散射研究进展

当前,激光惯性约束聚变在越来越接近点火的极端能量密度条件下,实验与模拟的偏离逐渐增大,一个关键原因是缺乏对黑腔等离子体状态及其影响黑腔能量学和内爆对称性的细致研究和判断。光学汤姆逊散射主动式、诊断精确、参数完备的优点,使之成为激光惯性约束聚变黑腔等离子体状态参数精密诊断的标准方法。中国面向激光惯性约束聚变研究的光学汤姆逊散射实验技术的发展与神光系列激光装置的建设和在其上开展的物理实验紧密相关。近年来,四倍频汤姆逊散射实验技术在神光III原型和100 kJ激光装置上相继建立,部分实验结果不仅加深了对激光惯性约束聚变靶物理的认识,还反映了实验条件对汤姆逊散射诊断的影响,促进了实验技术的精密化发展。在未来,还需要进一步发展多支路汤姆逊散射、五倍频汤姆逊散射和超热相干汤姆逊散射等新技术,面向点火黑腔条件,大幅提升激光等离子体状态参数的诊断精度,开展新物理机制的探索和研究,在激光惯性约束聚变和其他高能量密度物理科学领域发挥更重要的作用。     

Application of inertia-induced excitation theory for nonlinear acoustic modes in colloidal plasma equilibrium flow

Application of inertia-induced acoustic excitation theory offers a new resonant excitation source channel of acoustic turbulence in the transonic domain of plasma flow. In bi-ion plasmas like colloidal plasma, two well-defined transonic points exist corresponding to the parent ion and the dust grain-associated acoustic modes. As usual, the modified ion acoustic mode (also known as dust ion-acoustic (DIA) wave) dynamics associated with parent ion inertia is excitable for both nanoscale-and micronscale-sized dust grains. It is found that the so-called (ion) acoustic mode (also known as dust-acoustic (DA) wave) associated with nanoscale dust grain inertia is indeed resonantly excitable through the active role of weak but finite parent ion inertia. It is interestingly conjectured that the same excitation physics, as in the case of normal plasma sound mode, operates through the active inertial role of plasma thermal species. Details of the nonlinear acoustic mode analyses of current interest in transonic domains of such impure plasmas in hydrodynamic flow are presented.      

Calculation of the Effect on the Reflection of the Plane Electromagnetic Wave for Non-Magnetized Plasma with Different Electron Density Distributions

In this paper, shift operator finite-difference time-domain (SO-FDTD) method is applied for the calculation of the dispersive medium. The high efficiency and accuracy of this method is verified by calculating the reflection of the plane electromagnetic wave impinging on a non-magnetized plasma slab with different electron density distributions. The results show that the average electron density only determines overall trends of the reflection, and different distributions affect the oscillating process of the reflection. If the average electron density maintains the same, the distribution of electron density with homogenous or inhomogeneous alternation will sharply take effects on the reflection. And magnitude of alternation of electron density affects the incident frequency directly when the reflection tends to uniform.