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31.
The accuracy of ultrashallow depth profiling was studied by secondary ion mass spectrometry (SIMS) and high‐resolution Rutherford backscattering spectroscopy (HRBS) to obtain reliable depth profiles of ultrathin gate dielectrics and ultrashallow dopant profiles, and to provide important information for the modeling and process control of advanced complimentary metal‐oxide semiconductor (CMOS) design. An ultrathin Si3N4/SiO2 stacked layer (2.5 nm) and ultrashallow arsenic implantation distributions (3 keV, 1 × 1015 cm?2) were used to explore the accuracy of near‐surface depth profiles measured by low‐energy O2+ and Cs+ bombardment (0.25 and 0.5 keV) at oblique incidence. The SIMS depth profiles were compared with those by HRBS. Comparison between HRBS and SIMS nitrogen profiles in the stacked layer suggested that SIMS depth profiling with O2+ at low energy (0.25 keV) and an impact angle of 78° provides accurate profiles. For the As+‐implanted Si, the HRBS depth profiles clearly showed redistribution in the near‐surface region. In contrast, those by the conventional SIMS measurement using Cs+ primary ions at oblique incidence were distorted at depths less than 5 nm. The distortion resulted from a long transient caused by the native oxide. To reduce the transient behavior and to obtain more accurate depth profiles in the near‐surface region, the use of O2+ primary ions was found to be effective, and 0.25 keV O2+ at normal incidence provided a more reliable result than Cs+ in the near‐surface region. Copyright © 2007 John Wiley & Sons, Ltd. 相似文献
32.
本文对直径为100mm带套筒构件埋地燃气管道绝缘接头的强度进行了计算和实验分析研究.计算研究中根据在符合实际工程下确定带套筒构件埋地燃气管道绝缘接头密封部位的应力和位移,以及对管道密封性能的影响;实验研究中根据对直径为100mm带套筒构件埋地燃气管道绝缘接头进行符合实际工况的试验,测量绝缘接头密封部位的应力和位移,以及密封圈的受损程度.对计算和实验结果进行分析比较,确定带套筒构件埋地燃气管道绝缘接头在装配中的最小预紧力,分析在不同因素作用下管道绝缘接头的安全性,并为其它直径类型带套管构件埋地燃气管道绝缘接头的设计提供可靠的依据. 相似文献
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Superconducting qubits are Josephson junction-based circuits that exhibit macroscopic quantum behavior and can be manipulated as artificial atoms.Benefiting from the well-developed technology of microfabrication and microwave engineering,superconducting qubits have great advantages in design flexibility,controllability,and scalability.Over the past decade,there has been rapid progress in the field,which greatly improved our understanding of qubit decoherence and circuit optimization.The single-qubit coherence time has been steadily raised to the order of 10 to 100μs,allowing for the demonstration of high-fidelity gate operations and measurement-based feedback control.Here we review recent progress in the coherence and readout of superconducting qubits. 相似文献
37.
The enhanced low-dose-rate sensitivity (ELDRS) and dose-rate dependence of vertical NPN transistors are investigated in this article.The results show that the vertical NPN transistors exhibit more degradation at low dose rate,and that this degradation is attributed to the increase on base current.The oxide trapped positive charge near the SiO2-Si interface and interface traps at the interface can contribute to the increase on base current and the two-stage hydrogen mechanism associated with space charge effect can well explain the experimental results. 相似文献
38.
在He等人所做的嵌入到Fabry-Perot谐振腔中约瑟夫森结阵列的微波辐照研究基础上,提出了同时实现约瑟夫森结阵列阻抗匹配和相位锁定的方法,进行了相关的电磁仿真和数值计算.双晶约瑟夫森结阵列被制作在YSZ双晶基片上,同时被嵌入到Fabry-Perot谐振腔内.通过在基片上制作与结阵列集成的串联馈电半波偶极天线阵,并对其结构进行优化实现了结与天线的匹配,数值计算表明结的辐射效率达到94%;利用天线阵辐射场的特征和对模型合理的设计,使Fabry-Perot谐振腔和基片同时谐振在合适的模式下,从而使结阵列与谐
关键词:
约瑟夫森结阵列
阻抗匹配
相位锁定
Fabry-Perot谐振腔 相似文献
39.
An ab initio analysis of the periodic array of Au/Si nanostructure composed of gold clusters linked to silicon quantum dot (QD) co-doped by aluminium and phosphorus along [111] direction is presented in this paper. The density functional theory (DFT) is used to compute the electronic structure of the simulated system. Non-adiabatic coupling implemented in the form of dissipative equation of motion for reduced density matrix is used to study the phonon-induced relaxation in the simulated system. The density of states clearly shows that the formation of Au–Si bonds contributes states to the band gap of the model. Dynamics of selected photo-excitations shows that hole relaxation in energy and in space is much faster than electron relaxation, which is due to the higher density of states of the valence band. 相似文献
40.
结合SiGe材料的优异性能与超结结构在功率器件方面的优势,提出了一种超结SiGe功率二极管.该器件有两个重要特点:一是由轻掺杂的p型柱和n型柱相互交替形成超结结构,取代传统功率二极管的n-基区;二是阳极p+区采用很薄的应变SiGe材料.该二极管可以克服常规Si p+n-n+功率二极管存在的一些缺陷,如阻断电压增大的同时,正向导通压降随之增大,反向恢复时间也变长.利用二维器件模拟软件MEDICI仿真
关键词:
超结
锗硅二极管
n
p柱宽度
电学特性 相似文献