非负矩阵与有向图的谱半径

本文给出非负矩阵的谱半径的上界、下界,由此给出有向图的谱半径的界.     

Universal elementary constituents of potential transformations shifting waves (qualitative theory)

It is shown that the potential perturbation that shifts a chosen standing wave in space is a block of potential barrier and well for every wave bump between neighbouring knots. The algorithms shifting the range of the primary localization of a chosen bound state in a potential well of finite width are as well applicable to the scattering functions if states of the continuous spectrum are considered as bound states normalized to unity but distributed on an infinite interval with vanishing density. The potential perturbations of the same type on the half-axis concentrate the scattering wave at the origin, thus creating a bound state embedded into the continuous spectrum (zero width resonance).     

多重积分Nash平衡点的Lipschitz估计

设F（p，q）和G（p，q）在无穷远点的邻域内是分别关于p和q的近似凸函数，且具有二次增长．考虑由F和G构成的一对定义在Soblev空间中的泛函．本文利用blowup技巧，证明了这样一对泛函的Nash平衡点实际上是Lipschitz连续的．     

Toughening of epoxies via craze-like damage

The fracture behavior of a core-shell rubber (CSR) modified epoxy is investigated using both fracture mechanics and microscopy tools. The CSR-modified epoxy is found to be toughened via numerous line-array cavitations of the CSR particles, followed by plastic flow of the epoxy matrix. The toughening effect via the above craze-like damage process is found to be as effective as that of the well-known widespread rubber cavitation/matrix shear yielding mechanisms. The conditions for triggering the craze-like damage appear to be both stress state and rubber concentration dependent. The type of rubber tougheners utilized also plays a critical role in triggering this rather unusual craze-like damage in epoxy systems. © 1993 John Wiley & Sons, Inc.     

浅水中污染物扩散的自适应有限元分析法

介绍浅水中污染物扩散分析中的有限元法.分析包括两个部分:1)流场速度、水面高度的计算;2)根据扩散模型计算污染物浓度场.联合使用了自适应网格技术以期提高解的精度,同时减少计算时间和计算机内存的消耗.通过几个有已知解的实例验证了有限元公式和计算机程序.最后,使用这种联合方法分析泰国Chao Phraya河附近海湾中的污染物扩散.     

近场光学显微技术

本文在介绍近场光学显微镜原理的基础上，对近场光学显微技术进行了一定深度的探讨，并着重研究了纳米级探针的制作和纳米级样品与探针间距的控制这两个近场光学显微技术中的关键问题，说明了近场光学显微探针的工作方式，阐述了近场光学成像的衬度类型，介绍了近场光学显微技术在多个领域的应用。在参考大量国内外最新研究成果的基础上，提出了一些个人的见解。     

基于低功耗双边沿D触发器的任意进制异步计数器设计

从D触发器激励表入手，分别给出了采用单边沿D触发器和双边沿D触发器的2^n进制异步加法计数器、减法计数器的设计方法．在此基础上，采用逻辑函数修改技术，通过实例讨论了基于单边沿D触发器和双边沿D触发器的异步任意进制计数器的设计．该设计方法方便，快速，具有一定的实用意义．     

Curved Ferroelectric Liquid Crystal Matrix Displays Driven by Field-Sequential-Color and Active-Matrix Techniques

This paper describes a curved field-sequential-color matrix display using fast-response ferroelectric liquid crystal. Black matrix and transparent electrode patterns were formed on a thin plastic substrate by a transfer method from a glass substrate. While a composite film of liquid crystal and micro-polymers of walls and fibers was formed between the flexible substrates by printing, laminating and curing processes of a solution of monomers and liquid crystal, the mechanical stability was enhanced by use of multi-functional monomers to form large display panels. The image pixels of the matrix panel were driven by an active matrix scheme using an external switch transistor array at a frequency of 180 Hz for intermittent three-primary-color backlight illumination. The flexible A4-paper-sized color display with 24 × 16 pixels and 60 Hz field frequency was demonstrated by illuminating it with sequential three-primary-color lights from light-emitting diodes of the backlight. Our display system is useful in various information displays because of its freedom of setting and location.     

Banach空间二阶周期边值问题解的存在性

利用一些比较结果，讨论了Banach空间中二阶周期边值问题解的存在性，获得了若干解的存在性与唯一性结果。     

Multilayer optics for XUV spectral region: technology fabrication and applications

We present research investigations in the field of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scientific instrumentation. We discuss normal incidence multilayer optics in the spectral region of “water window”, multilayer optics for collimation and focusing of hard X-ray, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography (ψ-13nm) and short period multilayer optics.