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101.
Si(111) electrode has been widely used in electrochemical and photoelectrochemical studies. The potential dependent measurements of the second harmonic generation (SHG) were performed to study Si(111) electrode interface. At different azimuthal angles of the Si(111) and under different polarization combinations, the curve of the intensity of SHG with extern potential has a different form of line or parabola. Quantitative analysis showed that these differences in the potential-dependence can be explained by the isotropic and anisotropic contribution of the Si(111) electrode. The change in the isotropic and anisotropic contribution of the Si(111) electrode may be attributed to the increase in the doping concentration of Si(111) electrodes. 相似文献
102.
在石墨烯的化学气相沉积工艺中,铜箔是决定石墨烯薄膜质量的重要因素。传统铜箔由于制备工艺的限制,存在大量的缺陷,导致石墨烯薄膜的成核密度较高。本工作选用抛光铝板、抛光不锈钢板、微晶玻璃和SiO2/Si作为基材,用热蒸镀法制备了不同粗糙度的铜箔,并详细讨论了以该系列铜箔生长高平整度石墨烯薄膜的条件及铜箔对石墨烯薄膜品质的影响。实验结果表明,铜箔以(111)取向为主,与基材分离后,表面具有纳米级平整度。在生长石墨烯后,从SiO2/Si剥离的铜箔成核密度是4种基材中最小的。同时,从SiO2/Si剥离的铜箔晶体结构变化最不明显,具有良好的结晶性,表面几乎不存在铜晶界缺陷。当压强为3 000 Pa,氢气和甲烷流速分别为300 mL/min和0.5 mL/min时,可以获得约1 mm横向尺寸的石墨烯单晶晶畴。 相似文献
103.
采用分子动力学(MD)模拟计算,对Pd82Si18合金快凝过程中基本原子团簇的遗传特性、演化趋势和结构稳定性进行了研究.团簇类型指数法(CTIM)分析表明:非晶固体中Si原子为中心的(102/14418/1551)双帽阿基米德反棱柱(BSAP)团簇数目占据优势.快凝过程中,BSAP结构团簇具有最大的遗传分数,并且其他以Si原子为中心的Kasper团簇大多都会向BSAP结构团簇转变.通过对Si原子为中心的Kasper基本团簇电子性质第一性原理计算发现,体系中BSAP团簇的结合能最低,结构稳定性较高,与分子动力学计算结果一致. 相似文献
104.
Teng Fang Jiazhan Xin Chenguang Fu Dongsheng Li Xinbing Zhao Claudia Felser Tiejun Zhu 《Annalen der Physik》2020,532(11):1900435
Lattice thermal conductivity can be reduced by introducing point defect, grain boundary, and nanoscale precipitates to scatter phonons of different wave-lengths, etc. Recently, the effect of electron–phonon (EP) interaction on phonon transport has attracted more and more attention, especially in heavily doped semiconductors. Here the effect of EP interaction in n-type P-doped single-crystal Si has been investigated. The lattice thermal conductivity decreases dramatically with increasing P doping. This reduction on lattice thermal conductivity cannot be explained solely considering point defect scattering. Further, the lattice thermal conductivity can be fitted well by introducing EP interaction into the modified Debye–Callaway model, which demonstrates that the EP interaction can play an important role in reducing lattice thermal conductivity of n-type P-doped single-crystal Si. 相似文献
105.
ABSTRACT The microstructure evolution and property change of four kinds of low silicon cast aluminum alloy exposed to heat for 0–50?h at 200°C were studied by means of Brinell hardness test, tensile property test, friction and wear property test and XRD analysis. The results show that with increasing thermal exposure time, the tensile strength of each group of samples decreased and the amount of wear increased. The tensile strength of samples with more Si content decreased slowly. When the time increased to 50?h, the increase of wear loss was the largest. The hardness of samples after thermal exposure increases compared with that before thermal exposure. The residual stress of (311) diffraction crystal surface of AlSi3.5Mg0.66 under different thermal exposure time was measured. The type of residual stress changed from residual tensile stress to residual compressive stress after thermal exposure. There is an abnormal phenomenon that the hardness of the sample increased and the amount of wear increased, and it is evident that the distribution of residual stress was inhomogeneous after thermal exposure. It is found that with increasing thermal exposure time to 50?h, the average lattice distortion ε of the low-index crystal plane and the high-index crystal plane in the aluminum alloys gradually increased. 相似文献
106.
107.
以脉冲微型反应技术研究了脱铝八面沸石对异丙苯的催化裂化行为,并与反应条件下表面酸性进行了关联。样品裂化活性随骨架Si/Al比增加呈山峰形变化,Si/Al=5.38时最大;反应条件下酸中心数随脱铝深度增加却单调降低。动力学数据表明,样品裂化反应速度常数与强质子酸中心数随骨架Si/Al比增加具有平行的山峰形变化规律,Si/Al比为8.87附近的样品最高。 相似文献
108.
Harry J. Whitlow Margaretha Andersson Mikael Hult Leif Persson Mohamed El Bouanani Mikael Östling Carina Zaring Nils Lundberg David D. Cohen Nick Dytlewski Peter N. Johnston Ian F. Bubb Scott R. Walker Erik Johanson Sture Hogmark P. Anders Ingemarsson 《Mikrochimica acta》1995,120(1-4):171-181
Recoil Spectrometry covers a group of techniques that are very similar to the well known Rutherford backscattering Spectrometry technique, but with the important difference that one measures the recoiling target atom rather than the projectile ion. This makes it possible to determine both the identity of the recoil and its depth of origin from its energy and velocity, using a suitable detector system. The incident ion is typically high-energy (30–100MeV)35C1,81Br or127I. Low concentrations of light elements such as C, O and N can be profiled in a heavy matrix such as Fe or GaAs. Here we present an overview of mass and energy dispersive recoil Spectrometry and illustrate its successful use in some typical applications. 相似文献
109.
The photoionization spectroscopy of Si(CH3)3Cl in the range of 50 -130 nm was studied with synchrotron radiation source. The adiabatic ionization potentials of molecule Si(CH3)3Cl and radical Si(CH3)3 are 10.06 ±0.02 eV and 7.00±0.03 eV respectively. In addition, the appearance potentials of Si(CH3)2Cl+, Si(CH3)3+, SiCl+ and SiCH3+ were determined:
AP(Si(CH3)2Cl+) =10.49±0.02eV, AP(Si(CH3)3+) = 11.91 ±0.02eV
AP(SiCl+) = 18.64 ±0.06eV, AP(SiCH3+)= 18.62 ±0.02eV
From these, some chemical bond energies of Si(CH3)3Cl+ were calculated:
D(Si(CH3)2Cl+ - CH3) =0.43 ±0.02eV, D(Si(CH3)3+ - Cl) = 1.85 ± 0.02eV
D(SiCH3+ - (2CH3 + Cl)) = 8.56 ± 0.06eV, D(SiCH3+ - 2CH3) =6.71±0.06eV
D(SiCl+ - 3CH3) = 8.58 ± 0.06eV, D(SiCl+- 2CH3) = 8.15 ±0.06eV
D(SiCH3+- (CH3 + Cl)) =8.13 ±0.06eV 相似文献
AP(Si(CH3)2Cl+) =10.49±0.02eV, AP(Si(CH3)3+) = 11.91 ±0.02eV
AP(SiCl+) = 18.64 ±0.06eV, AP(SiCH3+)= 18.62 ±0.02eV
From these, some chemical bond energies of Si(CH3)3Cl+ were calculated:
D(Si(CH3)2Cl+ - CH3) =0.43 ±0.02eV, D(Si(CH3)3+ - Cl) = 1.85 ± 0.02eV
D(SiCH3+ - (2CH3 + Cl)) = 8.56 ± 0.06eV, D(SiCH3+ - 2CH3) =6.71±0.06eV
D(SiCl+ - 3CH3) = 8.58 ± 0.06eV, D(SiCl+- 2CH3) = 8.15 ±0.06eV
D(SiCH3+- (CH3 + Cl)) =8.13 ±0.06eV 相似文献
110.
A. Yamazaki Y. Inoue M. Koike T. Sakamoto R. Otsuka 《Journal of Thermal Analysis and Calorimetry》1993,40(1):85-97
Thomsonite with ideal chemical composition and with an ordered framework structure was synthesised hydrothermally from zeolite Na?A, which was ground to X-ray amorphous, with 0.05 mol dm?3 CaCl2 solution at 200°C. The dehydration behaviour of the prepared thomsonite was examined by TG-DTA. It was revealed that thomsonite lost most of zeolitic water below 450°C in three steps at about 180°, 340° and 390°C. The peak profiles of, the two higher-temperature endotherms were sharp and similar, and the weight loss at each step was approximately equal. 相似文献