平均孤子在能量补偿偏离时的自稳定传输

分析了平均孤子传输系统中用于能量补偿的掺铒光纤放大器增益超过或低于理想值时平均孤子传输特性的劣化,提出并证明了利用工作在饱和区的掺铒光纤放大器可实现平均孤子在能量补偿偏离时自稳定传输,讨论了这一措施的可行性及适用范围。     

Investigation of the self association of higher fatty alcohols and acids on chromatographic sorbents

Summary Three different sorbents, one with high activity (silica gel), the second with medium activity (cellulose powder) and the third having low activity (chromatographic paper) were compared in respect of their usefulness for the evaluation of the self association of selected higher fatty alcohols and acids. The obtained results are correlated with IR spectroscopic data and theoretical considerations.     

用人字形光栅检验校正光束准直性

分析人字形光栅副莫尔条纹的特点，研究了一种用莫尔偏折术检校光束准直性的改进方法，利用双场莫尔条纹方向平行性进行判定，此法使用方便且精度可提高一倍以上。     

各向异性超常介质中的反常线性现象

从麦克斯韦方程组出发,结合超常介质的特殊性质,分析了电磁波在一种具有线性色散关系的各向异性超常介质中的传播特性。在线性色散关系的情况下,得到了超常介质的介电张量和磁导率张量各元素之间的条件表达式。根据能量守恒定律和电磁场的边界连续性条件,在横电波(TE)和横磁波(TM)入射时,分析了折射波矢和能流与入射波矢和能流方向之间的关系。发现无论是TE波还是TM波,在这种介质中传输时,都产生了光准直的现象,且TE波和TM波的传输方式是相反的。     

Beam collimation for CSNS/RCS

The current design of the CSNS/RCS beam collimation system consists of a two-stage betatron collimation and a single momentum collimator. This paper summarizes various aspects of collimator design, including collimation principle and layout, material choice and collimator mechanical structure, etc. At last,radiation and thermal analysis are carried out to illustrate the feasibility of the current beam collimation scheme.     

-kernels of Lie groups

We study a filtration on the group of homotopy classes of self maps of a compact Lie group associated with homotopy groups. We determine these filtrations of and completely. We introduce two natural invariants and defined by the filtration, where is a prime number, and compute the invariants for simple Lie groups in the cases where Lie groups are -regular or quasi -regular. We apply our results to the groups of self homotopy equivalences.

     

Beam collimation for CSNS/RCS

The current design of the CSNS/RCS beam collimation system consists of a two-stage betatron collimation and a single momentum collimator. This paper summarizes various aspects of collimator design, including collimation principle and layout, material choice and collimator mechanical structure, etc. At last, radiation and thermal analysis are carried out to illustrate the feasibility of the current beam collimation scheme.     

Optical, structural and adsorption properties of zinc peroxide/hydrogel nanohybrid films

Hybrid nanofilms from zinc-peroxide/poly(acrylamide) (ZnO₂/PAAm) and zinc-peroxide/poly(N-isopropyl-acrylamide) (ZnO₂/PNIPAAm) were prepared using the photopolymerization procedure. The thin layers were prepared by the combination of the Layer-by-Layer (LbL) self-assembly method and photopolymerization using UV light in every step of the procedure. The hybrid multilayer films consisting of layers of zinc peroxide nanoparticles and hydrogel alternating in a sandwich-like fashion with thicknesses of 65-246 nm. The chemical structures of the hybrid films were investigated by FTIR spectroscopy, their morphology was studied by atomic force microscopy (AFM). The build up of the films was studied by measuring the optical reflection spectrum, and we have calculated the refractive index and layer thickness of the hybrid layers using simulating software. The adsorption properties of the ZnO₂/hydrogel nanohybrid composite networks were investigated by measuring water and ethanol vapour adsorption by a quartz crystal microbalance (QCM). It was established that on partially hydrophobic ZnO₂/PNIPAAm hybrids the adsorbed amounts were lower, against the hydrophilic ZnO₂/PAAm film the vapour amount was higher. These results correspond to those of the bulk gel swelling results.     

A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

Self-assembly of block copolymer is an effective strategy to prepare periodic structures at nanoscale. In this paper an unique and very simple method to prepare inorganic silica nanopattern is demonstrated from self-assembling of poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) on the surface of silicon wafer. To simplify the patterning process, at first we obtain highly ordered PDMS microdomains, which are covered with PS layer by controlling solvent vapor annealing conditions. Following exposure to UV/O₃ irradiation, nanopatterned surface consisting of silicon oxide is fabricated directly via selectively etching PS phase and converting PDMS phase into silicon oxide. As tuning the composition of the block copolymer, hexagonally packing dot and straight stripe pattern can be obtained. Finally, the time evolution from spheres morphology to aligned long cylinders is discussed. These results hold promise for nanolithography and the fabrication of nanodevices.