Simplified current decoupler for microchip capillary electrophoresis with electrochemical and pulsed amperometric detection

There is a need to develop broadly applicable, highly sensitive detection methods for microchip CE that do not require analyte derivatization. LIF is highly sensitive but typically requires analyte derivatization. Electrochemistry provides an alternative method for direct analyte detection; however, in its most common form, direct current (DC) amperometry, it is limited to a small number of easily oxidizable or reducible analytes. Pulsed amperometric detection (PAD) is an alternative waveform that can increase the number of electrochemically detectable analytes. Increasing sensitivity for electrochemical detection (EC) and PAD requires the isolation of detection current (nA) from the separation current (muA) in a process generally referred to as current decoupling. Here, we present the development of a simple integrated decoupler to improve sensitivity and its coupling with PAD. A Pd microwire is used as the cathode for decoupling and a second Au or Pt wire is used as the working electrode for either EC or PAD. The electrode system is easy to make, requiring no clean-room facilities or specialized metallization systems. Sensitive detection of a wide range of analytes is shown to be possible using this system. Using this system we were able to achieve detection limits as low as 5 nM for dopamine, 74 nM for glutathione, and 100 nM for glucose.     

Three-Dimensional Modeling of the Turbulent Plasma Jet Impinging upon a Flat Plate and with Transverse Particle and Carrier-Gas Injection

Modeling results are presented concerning the turbulent thermal plasma jet impinging normally on a substrate and with transverse injection of feedstock particles and their carrier gas from a single injection tube. The k- two-equation model is employed to model the turbulence, and particle dispersion is studied considering the interaction between the moving particles and turbulent eddies and considering the effect on particle trajectories of the random variation of the turbulent fluctuating velocities in their magnitude and direction. A well-validated three-dimensional (3-D) computer code is used in the modeling. The 3-D effects due to the carrier gas injection on the jet flow field and thus on the particle trajectories and heating histories are shown to be appreciable. The radial location of the injection tube with respect to the plasma jet is shown to be a critical parameter for the study of 3-D effects, besides the carrier-gas/plasma stream mass flux ratio. Particle dispersion considerably widens the distribution of the particle trajectories and heating histories. In addition, although pertinent swirl number is often rather small, swirling may also affect the modeling results.     

液相色谱电化学安培检测乳粉中的脂溶性维生素A, E和D3

利用维生素A、D3、E均有电化学活性的特点,采用电化学安培检测,建立了HPLC检测奶粉中的脂溶性维生素A、D3、E的新方法.流动相为甲醇∶水=95∶5(V/V),含0.05 mol/L高氯酸钠.检测器采用玻碳电极,直流安培模式(DC),氧化电位 1.3 V.方法检测限为:VA、VD3、-αVE、-γVE、-δVE分别为0.08、2.3、0.16、0.19、0.28ng.回收率分别为:90.2%~98.2%、91.2%~103%、92.7%~99.5%、92.6%~97.4%、90.7%~98.0%.同紫外检测比较,方法具有灵敏度高、抗干扰强的特点.     

射频磁控溅射CNx薄膜的结构与衬底温度关系的研究

使用射频磁控溅射方法在不同衬底温度下（ts=室温，350，500℃）于Si(001)衬底上沉积了CNx膜，并利用拉曼（Raman)光谱、傅里叶变换红外光谱（FTIR）及X射线衍射光电子能谱（XPS）对CNx膜的化学结合状态与温度的关系进行了研究。Raman光谱结果表明，随衬底温度（ts) 增加，D带向低频方向移动，G带向高频方向移动；它们的半高宽分别由375和150cm^-1减小至328和142cm^-1；ID／IG由3．76减小至2.88。FTIR谱中除无序D带（1400cm^-1)和石墨G带（1570cm^-1)外，还有－700cm^-1,～2210cm^-1(C=N),2330cm^-1(C-O)及3255－3351cm^-1(N-H)等峰。XPS测试结果表明：随衬底温度增加，N与C的物质的量比由0.49下降至0.38，sp^2(C-N)组分与sp^3(C-N)组分强度比呈增大趋势。低温（350℃）退火并未对CNx膜的化学结合状态产生较大影响；高温（900℃）退火样品则显示出较好的结晶化程度。     

Fundamental aspect and behavior of saturated fluorocarbons in glow discharge in absence of potential source of hydrogen

The glow discharge of a series of saturated fluorocarbons, C_nF_2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF₄ and C₂F₆, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C₈F₁₈, polymerized as well as C₂F₄. After plasma exposure, the surface of glass substrate was characterized by measurements of water contact angle, water droplet rolling-off angle, and ESCA. Although all saturated fluorocarbon plasmas could alter the surface more hydrophobic than before, the deposited materials from fluorocarbons with higher F/C were not stable. Also, in plasmas with high F/C fluorocarbons, i.e., CF₄ and C₂F₆, sputtering of the electrode material was observed. © 1992 John Wiley & Sons, Inc.     

卟啉配位剂meso－四（对－羧基苯基）卟啉（H_2TCPP）极谱行为的研究

采用直流极谱和循环伏安等多种手段研究了卟啉配位剂（Ｈ_２ＴＣＰＰ）在汞电极上的极谱性质。在碱性介质中，Ｈ_２ＴＣＰＰ的电极反应具有以下三个特性：（１）第一步为受扩散控制的２ｅ并有２Ｈ~＋参与的可逆还原过程，第二和第三步为不可逆各为２ｅ的还原反应；（２）Ｈ_２ＴＣＰＰ在汞电极上存在强吸附性；（３）第一步电极反应产物可发生随后的化学反应，即前两步还原经由ＥＣＥ机理进行。     

苯乙烯-异戊二烯嵌段共聚物分子运动的脉冲核磁共振研究

用西德Bruke,MSL-300核磁共振谱仪研究了三个不同系列的苯乙烯-异戊二烯嵌段共聚物的固体回波谱。用PASCAL语言在谱仪提供的计算机上、用线性最小二乘法回归分析把实验曲线分解成快速和慢速两个组分,它们分别对应于嵌段共聚物中刚性相和流动相,从而给出样品两相结构的定性定量信息。     

Electrochromic nickel oxide films made by reactive r.f. sputtering from different targets

We describe the preparation and optical–electrical characterization of thin electrochromic layers based on nickel oxide (NiO_x). These layers were deposited by reactive radiofrequency (r.f.) sputtering from nickel or nickel oxide targets, maintaining the r.f. power and varying the oxygen flow in a gas mixture of Ar and O₂ from 5% up to 30%. The Ni/O ratio in the deposited thin films was determined by Rutherford backscattering spectroscopy (RBS) and the microstructure was investigated by x‐ray diffraction. The deposition rate was found to be strongly dependent on the type of target used. The electrochromic behaviour in aqueous alkaline electrolyte (0.1 N KOH solution) was investigated by electrochemical cyclization. Samples deposited by the NiO target exhibited the lowest N/O ratio (0.5) and the highest value of intercalated charge (～4.9 × 10^?2 mC cm^?2 nm^?1). Among the same samples the highest value of the intercalated charge was found for those deposited at low oxygen flow, but these samples exhibit the smallest reversible changes in optical absorption in the wavelength range 330–1200 nm. Samples deposited by the nickel target do not exhibit significant variations in the value of the exchanged charge; the measured Ni/O ratio indicates a stoichiometry closer to NiO. We also observed the switching behaviour by analysing the films in cyclic time mode at a fixed wavelength. The commutation response time is estimated by measurement under the application of a step waveform potential. Copyright © 2004 John Wiley & Sons, Ltd.     

Comparison of Pulsed Electrochemical Detection Modes Coupled with Microchip Capillary Electrophoresis

There is a need to develop analytical methods that are capable of rapidly measuring small biological markers in the field of metabolomics. Among others, carbohydrates play an important role biologically yet are traditionally hard to detect since they have no chromophore or fluorophore. In the present report, the first application of integrated pulsed amperometric detection (iPAD) coupled with microchip electrophoresis to the analysis of glucose, mannose, sucrose, maltose, glucosamine, lactose, maltotriose and galactose is demonstrated. iPAD is an electrochemical detection mode that can be used for direct detection of carbohydrates, amines and sulfur containing compounds. The effect of different solution parameters, including the buffer concentration, pH and the concentration of SDS on both separation and detection response was analyzed. In addition, a comparison study between PAD and iPAD was performed using glucose, glucosamine, sucrose and maltose as model carbohydrates.     

Depth profiles of shallow implanted layers by soft ion sputtering and total-reflection X-ray fluorescence

A new method suitable for depth profiling of shallow layers on different materials is presented. It is based on a soft and planar ion sputtering combined with differential weighing, total-reflection X-ray fluorescence (TXRF) spectrometry and Tolansky interferometry. By means of a stepwise repetition of these techniques it is possible to determine both density/depth and concentration/depth profiles. The respective quantities are expressed in terms inherent only to the sample and traceable to the SI-units or subunits gram, nanometer and mole. It is a unique feature of this method that density/depth profiles can directly be obtained from measurements without any calibration or theoretical approximation. The method is applied to a Si wafer implanted with Co ions of 25 keV energy and a nominal dose of 1×10¹⁶ cm⁻². The depth resolution is shown to be <3 nm while a total depth of some 100 nm can be reached. The concentration/depth profile is compared with RBS measurements, wet-chemical etching plus TXRF and Monte Carlo simulations. In view of the fact that only similar but not exactly the same samples have been examined by these methods, a good correspondence can be noticed.