能动抛光磨盘的变形实验研究

 能动抛光磨盘实时产生不同的表面变形，在对大口径非球面光学元件进行精磨和抛光时实现与工件表面良好的大尺寸吻合，可以消除传统光学加工采用小尺寸磨头时带来的高频残余误差并提高加工效率。以加工直径1.3m左右，F/2的抛物面光学元件为例，对能动磨盘在不同离轴度时能够产生的变形进行了计算和实验。结果表明，能动磨盘能够以较高精度产生旋转对称或非对称的抛物面形状。对能动磨盘产生变形后的残余误差进行了分析。     

腔长失调对光腔衰荡法测量精度的影响

 只考虑腔长失调因素下建立了反射率模拟测量的理论模型。根据高斯光束传输规律分析了腔长失调对衰荡腔模式耦合的影响，推导了腔长失调与谐振腔输出脉冲信号、衰荡信号与反射率之间的关系，模拟了腔长失调在±10mm范围内的光脉冲衰荡现象。结果表明：对于光敏面直径为0.2mm的高速探测器，为了保证10^-6的测量精度，腔长的失调量应控制在±1mm之间。在光路调节中采用具有对数变换功能的示波器和动态范围较大的探测器，可以提高测量精度。     

高能闪光照相中影响光程确定的几个因素

 利用闪光照相基本原理和成像原理，在直接记录法和转换屏记录法的情况下，研究了闪光照相中影响X射线在材料中光程确定的主要因素。结果表明，影响光程确定的几个因素是：散射效应、光源角分布效应、立体角效应和能谱效应。对于高能闪光照相，散射效应是影响光程确定的最主要因素，散射的存在使光程的测量值比实际值降低20%～40%。因此必须在做CT之前，对散射的影响进行修正。     

神光-Ⅱ装置三倍频实验中靶场单元技术的改进

 主要介绍为了满足神光-Ⅱ高功率激光装置三倍频光（351nm，3ω）的物理实验要求，靶场三倍频模拟光源和瞄准监视系统两个主要单元技术的改进，即三倍频模拟光源由基频光（1 053nm，3ω）通过腔外的KTP+BBO晶体倍频获得，再经八路分光系统和主激光耦合；瞄准监视系统由透射式光学系统改进为反射式光学系统，避免原系统存在较大的色差，提高瞄准精度。     

3-Aminopropylsilatrane and Its Derivatives: A Variety of Applications

Silatranes arouse much research interest owing to their unique structure, unusual physical–chemical properties, and diverse biological activity. The application of some silatranes and their analogues has been discussed in several works. Meanwhile, a comprehensive review of the wide practical usage of silatranes is still absent in the literature. The ability of silatranes to mildly control hydrolysis allows them to form extremely stable and smooth siloxane monolayers almost on any surface. The high physiological activity of silatranes makes them prospective drug candidates. In the present review, based on the results of numerous previous studies, using the commercially available 3-aminopropylsilatrane and its hybrid derivatives, we have demonstrated the high potential of 1-organylsilatranes in various fields, including chemistry, biology, pharmaceuticals, medicine, agriculture, and industry. For example, these compounds can be employed as plant growth biostimulants, drugs, optical, catalytic, sorption, and special polymeric materials, as well as modern high-tech devices.     

强激光装置中玻璃疵病在线检测的光学系统设计

介绍了一种用于玻璃疵病在线检测的近摄工作距成像光学系统,其光组结构形式采用了光阑后置的准远心结构形式,主要光学参量为f′=14 mm;在物像距为250 mm约束条件下,物方视场达到90 mm（对角线）;F/number=3.56;光谱适应范围为400~800 nm,对应的空间分辨率为100 lp/mm时,调制传递函数大于0.29.     

Untersuchungen zur Empfindlichkeit der β-Rückstreumethode bei der Messung dünner Auftragsschichten mit einem 11C-Spezialpräparat

Die Bestimmung dünner Auftragsschichten auf bewegten Trāgermaterialien mit der β-Rūckstreumethode hängt wesentlich von der Empfindlichkeit der Messung und der Dynamik des Prozesses ab.

In diesem Beitrag wird für spezielle Stoffe der Einfluβ der Trāgermaterialien bei Mehrschichtproblemen auf die Empfindlichkeit untersucht.     

Doping profiles from the capacity-voltage (C–V) characteristics of the [111] Si(p) single crystals doped by the In+ -ion-implantation

The ²³⁵U(n, f) cross-section has been measured after the installation of a liquid nitrogen cooled methane moderator at GELINA. The results are compared with previous data, and the influence of the cross section shape on the Westcott gf-factor is discussed.     

Radiation background due to radioactive sources in a luminescence dating laboratory

For practical reasons, usually, luminescence dating laboratories contain in the same room (or in adjacent rooms) the equipment and the radioactive sources, as well as the storage cabinet for the samples. It is generally assumed that the absorbed dose due to ambient radioactivity is null or at least negligible in terms of human health (below the dose limit).To test the actual dose rate inside our laboratory room, an investigation combining portable dose rate meter, portable NaI(Tl) gamma spectrometry, and blue-OSL dosimetry using Al₂O₃:C pellets was made. Although our measurements show the presence of X-rays as far as 3 m from the sources, the dose rates are below the safety regulation and does not affect the dating of the sample stored in the same room as the radioactive sources.