Synthesis and characterization of Cu,Ni and Zn binding capability of some amino- and imidazole hydroxamic acids: Effects of substitution of side chain amino-N for imidazole-N or hydroxamic-N-H for -N-CH3 on metal complexation

Solution equilibrium studies on Cu(II)-, Ni(II)- and Zn(II)-N-Me-β-Alaninehydroxamic acid (N-Me-β-Alaha), -N-Me-α-alaninehydroxamic acid (N-Me-α-Alaha), -Imidazole-4-carbohydroxamic acid (Im-4-Cha), -N-Me-imidazole-4-carbohydroxamic acid (N-Me-Im-4-Cha) and -Imidazole-4-acetohydroxamic acid (Im-4-Aha) systems have been performed by pH-potentiometry, UV–Vis spectrophotometry, EPR, CD, ESI-MS and ¹H NMR methods. According to the results: (i) the amino-N atoms are more basic in N-Me-α-Alaha and N-Me-β-Alaha than the hydroxamate function, but the trend is just the opposite between the imidazole-N(3) and hydroxamate. (ii) The metal ion anchor is always the hydroxamate part in the amino acid derivatives, while it is always the imidazole-N(3) in the studied imidazolehydroxamic acids. (iii) The three studied N-Me derivatives do not form metallacrowns. Only hydroxamate type chelate is formed with N-Me-β-Alaha, but with N-Me-α-Alaha a new type of coordination mode (via amino-N and hydroxamate-O) also exists. N-Me-Im-4-Cha also forms a dinuclear complex, [M₂L₃], with Cu(II) and Ni(II) (but not with Zn(II)). In this complex, one of the three ligands might bridge the two metal ions (five-membered hydroxamate-(O,O) plus five-membered (N_im, O_carb) bridging bis-chelating mode), while each of the additional two ligands binds to one metal. (iv) The two studied N–H derivatives, having dissociable proton on the hydroxamic-N, are able to form metallacrown species. A pentanuclear complex, [M₅L₄H₋₄], is exclusively formed above pH 4 between Cu(II) and Im-4-Aha. Interestingly, this 12-metallacrown-4 type complex, although together with various mononuclear binding isomers, appears also with Ni(II) and Zn(II). Unfortunately, the complexes of Im-4-Cha are not soluble in water at physiological pH at all.     

废水中偏二甲肼在Ni/Fe催化剂上的催化分解研究

研究了Ni/Fe催化剂对废水中偏二甲肼臭氧化分解的催化作用,考察了组分含量、体系的pH值和偏二甲肼初始浓度对催化反应的影响.结果表明,Ni/Fe催化剂对水中偏二甲肼的臭氧化具有良好的催化活性.催化剂组分含量、体系的pH值和初始浓度对反应的影响程度不大.对催化剂的XRD表征结果表明,催化剂主要由尖晶石结构的铁酸盐和FeNi3合金相组成,催化剂的良好催化性能与催化剂中尖晶石结构的铁酸盐和FeNi3合金相的形成有关.     

COMBINED PARTIAL OXIDATION AND CARBONDIOXIDE REFORMING OF METHANE PROCESS TO SYNTHESIS GAS

IntroductionIthasbccndcmonstratcdthatmcthancrcformingt"ithcarbondioxidcpr0ducessynthcsisgasrichincarbonmonoxidc-x"hichisuscfulforthcs}nthcsisofaccticacid'dimcthylcthcrando.o-alcoholsll'2].Carbondioxidcref0rmingismorccndothcrmicthanstcamrcformingfCH4 CO2,'2CO 2H2Ai/'2,,=2473kJ..ol-1(l)Accordingl\"thisrcact1onnccdshighcrtcmpcraturcandlimitsspaccvclocityoffccdgas,Wehavcprct'ious1\studicdmcthancrcformingt"lthC02inthcmonotubcproccssl3J.Inordertoconvcrtmcthancinfccdgascomplctcl}',thcspaccvcloci…     

Residence times in kink sites and Markov chain model of alloy and intermetallic compound deposition

The concept of the residence time τ_ksp of an atom in a kink site has recently been suggested to understand the processes in electrochemical deposition of alloys and intermetallic compounds. Different kink sites with different residence times must be defined for alloys and intermetallic compounds. Based on this model, the finite Markov chain theory is applied to describe the selectivity of the growth process. An analytical relationship between the alloy composition and the metal ion concentrations in the electrolyte is derived. General model parameters are ratios g _i = K _ii/K _ij of equilibrium constants of the reaction of electrolyte ions with different kink sites on the surface (i, j representing different alloy components). These ratios are called selectivity constants. For simple conditions, the equation g _i ≈ τ_ii/τ_ij connects the g _i values with the residence times. The theory is tested in the deposition of alloys Co-Ni (anomalous co-deposition) and Ni-Mo (induced co-deposition). Additionally, Bi₂Te₃, an example of stoichiometric semiconductor deposition, is treated. Published in Russian in Elektrokhimiya, 2006, Vol. 42, No. 10, pp. 1216–1223. The text was submitted by the authors in English.     

A surface adsorption model for electroless cobalt alloy thin films

Thin cobalt alloy films have been obtained using electroless deposition solution with two reducing agents: dimethylamine borane (DMAB) and sodium hypophosphite. This system allows spontaneous and self-activated deposition of barrier layers on Cu lines and via contacts for ultra large scale integration (ULSI) interconnects applications. This work presents a study of the solution composition effects on the material properties and composition of the films. First, we present the deposition rates, the electrical resistance, the various element profiles in the thin film, and the thin film roughness. Next, we discuss the film’s composition and its dependence on the ratio between the reducing agents composition in the solution. The experimental results suggest that the film phosphorous and boron composition is determined by the surface adsorption rates of the reducing agents. Therefore, a surface co-adsorption model of the two reducing agents is proposed, formulated, analyzed, and compared to the experimental results. Finally, we discuss the model and its significance to the formation of high-quality ultra-thin barrier layers. Dedicated to Professor Dr. Algirdas Vaskelis on the occasion of his 70th birthday.     

Anodic stripping voltammetry of sulphide at a nickel film: towards the development of a reagentless sensor

The determination of sulphide at an electrochemically generated nickel oxide layer at glassy carbon and screen-printed electrodes in acidic media has been examined and appraised. The NiO layer was found to produce a stripping-like signal to sulphide and gave a linear peak current response from 20 to 90 μM. The response was further enhanced by repetitive cycling allowing accumulation of nickel sulphide at the electrode surface such that lower micromolar levels of sulphide (i.e. 5 μM) can be determined. The response at the NiO layer to sulphide is shown to be reproducible over a period of 24 h, thereby offering the development of a disposable amperometric sensor for sulphide.     

Concentration profiles and breakthrough curves in non-linear chromatography

The treatment of the non-linear isotherm in chromatography by one of the authors [1] is extended to other cases of practical interest. The original paper dealt with the case of an initially thin zone resulting in a Poisson distribution the asymmetry of which is a function of the plate number and the non-linearity constant. The present work shows that the same relations apply to initially thick zones and to the cases of washing and deposition leading to simple relations for breakthrough curves. For significantly non-linear isotherms other quasi-Gaussian distributions can give a better fit.     

K-La-Ni/Si-2催化低碳烷烃与二氧化碳重整制合成气(英文)

Ｎｉ／Ｓｉ２催化剂具有较好的低碳烷烃与二氧化碳重整制合成气的反应性能，添加Ｌａ２Ｏ３助剂和Ｋ２Ｏ助剂可提高催化剂活性和合成气收率，从而进一步改善催化剂的低碳烷烃与ＣＯ２重整制合成气的反应性能，研制的ＫＬａＮｉ／Ｓｉ２催化剂，用于天然气与ＣＯ２重整反应制合成气可达９７％的低碳烷烃转化率和９５％以上的合成气收率。     

油溶性金属Ni纳米微粒的制备与表征

纳米材料的制备、性能与应用已成为近年来的研究热点之一犤１犦。由于在催化、光学和电学材料中的广泛应用，超细单分散的金属微粒的制备与性质已引起人们的广泛兴趣。通常制备金属纳米微粒的方法有两种：一是把固体金属材料分裂为纳米尺寸的颗粒，如机械粉碎、电弧放电及金属原子蒸气沉积犤２犦，用这种方法制备的金属微粒粒径一般都比较大，且粒子尺寸分布宽，另一种是把金属原子制成纳米尺度的颗粒，如乳液聚合法犤３犦、热解犤４犦、γ－射线辐照犤５犦、脉冲电沉积犤６犦和化学还原犤７犦等，这种方法制备的微粒粒径通常分布窄且粒子小…     

Microstructure and electrical properties of BaTiO<Subscript>3</Subscript> and (Ba,Sr)TiO<Subscript>3</Subscript> ferroelectric thin films on nickel electrodes

Nickel thin films have been sputtered on standard Si/SiO₂ substrates with TiO₂ as an adhesive layer. The thermal stability of these substrates was analyzed. SEM images show an increase in grain size with annealing temperature. They were found to be stable till 800°C, beyond which the nickel layer disintegrated. These substrates were used for deposition of BaTiO₃ and (Ba,Sr)TiO₃ dielectric thin films under a reducing atmosphere. The dielectric thin films were processed with various pyrolysis and annealing temperatures in order to optimize the dielectric properties. Increased pyrolysis temperatures showed an increase in the grain size. Results on these nickelised substrates were finally compared with dielectric films deposited on platinized silicon substrates under identical conditions but crystallized in an oxygen atmosphere.