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91.
92.
河口水体中痕量稀土元素的共沉淀预富集-电感耦合等离子体质谱法测定研究 总被引:3,自引:0,他引:3
建立了氢氧化铟共沉淀预富集 -电感耦合等离子体质谱法测定河口水体中痕量稀土元素的方法。实验结果表明 ,在80mg·L -1的In3 +和pH9.5的实验条件下 ,在1.0L水样中添加5.0~200.0ng的混合稀土标准溶液 ,均能定量回收 ,回收率在82.2 %~106.9 %之间。方法的分析流程空白为0.04(Tb)~10.17(La)ng·L -1,检出限在0.17(Yb)~1.46(La)ng·L-1之间 ,精密度 (RSD ,n=3)小于11.7 % ,可满足河口淡水和海水样品中的痕量稀土元素定量分析的要求 相似文献
93.
94.
一种用于空气中二氧化碳现场测定的新方法于爱民,杨广德,王锐,金钦汉(吉林大学化学系,长春130023)关键词微波诱导等离子体,离子化检测器,气相色谱仪,二氧化碳二氧化碳在植物生长代谢及其生态平衡过程中起着重要作用,现场测定二氧化碳是目前农业、环境科学... 相似文献
95.
The effect of pressure during thermal plasma chemical vapor deposition of diamond films has been investigated for a pressure range from 100 to 760 Torr. The maximum growth rate in our experiments occurs at 270 Torr for substrate temperatures around 1000°C. The existence of an optimum pressure for diamond deposition may he related to the balance between generation and recombination of atomic hydrogen and carbon-containing active species in front of the substrate. To estimate the concentrations of atomic hydrogen and methyl radicals under thermal plasma conditions, calculations based on thermodynamic equilibrium have been performed. This approximate evaluation provides useful guidelines because rapid diffusion results in a near frozen chemistry within the boundary layer. The effect of substrate pretreatment on diamond deposition depends on the type of substrate used. Two growth modes have been observed-layer growth and island growth of diamond crystals on various substrates. Screw dislocations have been observed in diamond deposition in thermal plasmas, and defects such as secondary nucleations are more concentrated along (III) directions than along (100) directions. 相似文献
96.
Chen-Yuan Tu Ying-Ling Liu Min-Tzu Luo Kueir-Rarn Lee Juin-Yih Lai 《Chemphyschem》2006,7(6):1355-1360
Poly(glycidyl methacrylate), PGMA, chains in linear and arborescent structures were incorporated onto surfaces of poly(tetrafluoroethylene), PTFE, films by hydrogen plasma and ozone treatment and atom transfer radical polymerization. The epoxide groups of the PGMA chains were further reacted with acetic acid (AAc), oxalic acid (XAc), allyl amine (AA), and ethylenediamine (EDN) to introduce hydroxyl and amine groups to the surfaces of the PTFE films. Surface characterizations performed by Fourier Transform infrared attenuated total reflectance (FTIR-ATR) spectroscopy and X-ray photoelectron spectroscopy (XPS) confirmed the surface modification and the chemical structure. The PGMA chains in arborescent structures show a high effectiveness for the enhancement of the adhesion of PTFE films. The adhesion of PTFE films was also significantly enhanced by ring-opening reactions of the PGMA epoxide groups with acetic acid and amine compounds. A high value of 9.5 N cm(-1) in the optimum 180 degrees peel strength test was observed with PTFE/copper assemblies. 相似文献
97.
Multi-temperature thermal plasmas have often to be considered to account for the nonequilibrium effects. Recently André et al. have developed the calculation of concentrations in a multi-temperature plasma by artificially separating the partition functions into a product by assuming that the excitation energies are those of the lower levels (electronic, vibration, and rotation). However, at equilibrium, differences, increasing with temperature, can be observed between partition functions calculated rigorously and with their method. This paper presents a modified method where it has been assumed that the preponderant rotational energy is that of the vibrational level v=0 of the ground electronic state and the preponderant vibrational energy is that of the ground electronic state. The internal partition function can then be expressed as a product of series expressions. At equilibrium for N
2
and N
2
+
partition functions the values calculated with our method differ by less than 0.1% from those calculated rigorously. The calculation has been limited to three temperatures: heavy species Th
, electrons Te
, and vibrational T
v
temperatures. The plasma composition has been calculated by minimizing the Gibbs free enthalpy with the steepest descent numerical technique. The nonequilibrium properties have been calculated using the method of Devoto, modified by Bonnefoi and Aubreton. The ratio =Te/Th
was varied between 1 and 2 as well as the ratio
v
=T
v
/T
h
for a nitrogen plasma. At equilibrium the corresponding equilibrium transport properties of Ar and N
2
are in good agreement with those of Devoto and Murphy except for T>10,000 K where we used a different interaction potential for N–N
+
. The effects of v
and e
on thermodynamic and transport properties of N
2
are then discussed. 相似文献
98.
Rat V. André P. Aubreton J. Elchinger M.F. Fauchais P. Lefort A. 《Plasma Chemistry and Plasma Processing》2002,22(4):453-474
The calculation of two-temperature transport coefficients in an argon–hydrogen plasma at atmospheric pressure is performed using a new theory of two-temperature transport properties recently presented. The latter takes into account the coupling between electrons and heavy species, coupling neglected in the already existing theories of Devoto and Bonnefoi. Transport coefficients are calculated at two-temperatures, the kinetic temperature of electrons Te being different from that of heavy species Th. This paper is divided into two parts. The first one is related to elastic processes and its aim is to compare the results obtained with this new theory for viscosity , translational thermal conductivities tr
e and tr
h and electrical conductivity with the previous results of Bonnefoi. The composition is calculated with the modified equilibrium constant of van de Sanden et al. and the most recent interaction potential are discussed. As it could be expected the electron translational thermal conductivity and the electrical conductivity calculated when taking into account or not the coupling between electrons and heavy species show non-negligible discrepancies. Besides this comparison, the results also show the drastic influence of the non-equilibrium parameter =Te/Th on the values of , , tr
e, and tr
h. 相似文献
99.
100.
Kolman David Heberlein Joachim Pfender Emil 《Plasma Chemistry and Plasma Processing》1998,18(1):73-89
In this paper, a comprehensive model for thermal plasma chemical vapor deposition (TPCVD) with liquid feedstock injection is documented. The gas flow is assumed to be steady, of a single temperature. Radiation and charged species contributions are excluded, but extensive homogeneous and heterogeneous chemistry is included. The liquid phase is traced by considering individual droplets. Discussion on the model's application to diamond production from acetone in a hydrogen–argon plasma is included. The major conclusions are: (1) Liquid injection possesses a capability to deliver the hydrocarbon precursor directly onto the deposition target. (2) For the case of complete evaporation of the droplet before reaching the substrate, the deposition rate is similar to that obtained with gaseous precursors. (3) The computational results compare well with experimental data. The modeling results can be used to optimize the injection parameters with regard to the deposition rate. 相似文献