Hydrogen embrittlement assisted by ball-milling to obtain AlCuFe nanoparticles

In this work, we show that the synthesis of AlCuFe nanoparticles can be achieved by a wet ball-milling process. The AlCuFe intermetallic system is highly sensitive to the environmental embrittlement mechanism. Taking advantage of this, the wet ball-milling was used to increase the rate of grinding and accelerate the characteristic cleavage fracture of these phases. This research was carried out by subjecting Al₆₄Cu₂₄Fe₁₂ pre-alloyed ribbons to high-energy ball-milling under different powder–humidity relationships. The pre-alloyed and milled powders were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), and scanning transmission electron microscopy (STEM). High resolution electron microscopy (HREM) measurements and energy-dispersive X-ray spectroscopy (EDXS) elemental chemical mapping confirm that the nanoparticles have a BCC structure with Al–Cu–Fe chemical composition. During the wet ball-milling, the aluminum content in the ψ-phase diminishes due to embrittlement mechanism which provokes its aperiodic disarrangement. This aluminum loss could be related with a ψ–β transformation.     

CMP流场的数值模拟及离心力影响分析

化学机械抛光(chemical mechanical polishing,CMP)是一项融合化学分解和机械力学的工艺, 其中包含了流体动力润滑的作用.在已有润滑方程的基础上, 提出并分析了带有离心力项的润滑方程.利用Chebyshev加速超松弛技术对有离心力项的润滑方程进行求解,得到离心力对抛光液压力分布的影响. 数值模拟结果表明,压力分布与不带离心力项的润滑方程得出的明显不同;无量纲载荷和转矩随中心膜厚、转角、倾角、抛光垫旋转角速度等参数的变化趋势相同,但数值相差较大, 抛光垫旋转角速度越大差别越大.      

Characterization of the gas pulse frequency, amplitude and velocity in non-steady dense phase pneumatic conveying of powders

Current modelling techniques for the prediction of conveying line pressure drop in low velocity dense phase pneumatic conveying are largely based on steady state analyses.Work in this area has been on-going for many years with only marginal improvements in the accuracy of prediction being achieved.Experimental and theoretical investigations undertaken by the authors suggest that the flow mechanisms involved in dense phase conveying are dominated by transient effects rather than those of steady state and are possibly the principal reasons for the limited improvement in accuracy.This paper reports on investigations on the pressure fluctuation behaviour in dense phase pneumatic conveying of powders.The pressure behaviour of the gas flow in the top section of the pipeline was found to exhibit pulsatile oscillations.In particular,the pulse velocity showed variation in magnitude while the frequency of the oscillations rarely exceeded 5 Hz.A wavelet analysis using the Daubechie 4 wavelet found that the amplitude of the oscillations increased along the pipeline.Furthermore,there was significant variation in gas pulse amplitude for different types of particulate material.     

Percolation in two-scale porous media

Two-scale porous media are generated by filtering a Gaussian random correlated field with a random correlated threshold field. The percolation threshold and the critical exponent ν are derived with the help of a finite-size scaling method. The percolation threshold for the three-dimensional media is a decreasing function of the variance and correlation length of the threshold field. A simplified model predicts these trends in 3d; moreover, it suggested some effects in 2d which were all numerically verified. Received 17 August 2000     

MoSi2 laser cladding—a comparison between two experimental procedures: Mo–Si online combination and direct use of MoSi2

There are very strong interests in developing low density advanced material systems for service at temperatures up to 1300°C. These materials should mainly have moderate fracture toughness at low and intermediate temperatures and should exhibit oxidation resistant behaviour. The intermetallic compound, MoSi₂ has been considered to be an attractive candidate due to its melting point (2030°C) and excellent oxidation resistance at high temperatures. In this paper, we compare the results obtained with two different techniques for laser cladding, one using an online combination between Mo and Si powders, the second using direct injection of the MoSi₂ powder.     

高准确度玻璃光学元件的CMP技术研究

依据化学机械抛光（Chemical Mechanical Polishing,CMP）加工玻璃光学元件的原理,通过对抛光运动机理的理论分析,提出了抛光垫的磨削均匀性对光学元件面形的影响,并设计了新的工艺流程.通过工艺试验,完成了高准确度玻璃光学元件的CMP加工,获得了表面质量N<0.2,Rq<0.3 nm的玻璃光学元件.     

波长色散X射线荧光光谱法测定黄金饰品含金量

本文提出应用波长色散Ｘ射线荧光光谱仪测定黄金饰品含金量的方法，本法对原有样品盒进行了改造，增设特制窗口和采取样品固定等措施，以系列参考标样建立校准曲线，用经验系数法校正基体效应。比例模拟法校正含量。９个参考标样和１６个金标牌的测定结果表明，在含金量为３７．５０％－９９．９９％的范围内，方法的准确度好：含金量在９９．９９％－９８．９８％范围时，误差为０．０３％－０．１２％，在９８．９８％－３７．５０％范围时，误差为０．０１％－０．５２％，选用含金量不同的５个参考标样为代表，以０．７和１．４的模拟比例，经不同时间多次测定进行统计，相对标准偏差为０．０５％－０．５０％，说明方法的精密度好，本法操作方便，时样品无破坏     

Roughness measurement of metallic surfaces based on the laser speckle contrast method

A method of measuring surface roughness of flat lapped, ground and polished metallic surfaces, by the far-field speckle contrast method is presented in this paper. The laser speckle contrast technique depends on the existence of an approximately linear relationship between the speckle contrast and the roughness of the illuminated surface. Initially it was shown that the linear relationship existed up to 0.1 μm Ra (centre-line average) roughness using Helium–Neon light, after which a saturation effect was observed. The effect of varying the incident angle of illumination was investigated with a view to extending the measurement range. The use of high incident angles of illumination has been found to increase the surface roughness range up to 0.4 μm measurement Ra.     

Abrasive properties of nano silica particles prepared by a sol–gel method for polishing silicon wafers

Abrasive properties of cocoon shaped silica particles fabricated by a sol–gel method have been studied. Since silicon wafers are polished with slurry by the mechanism of Chemical Mechanical Polishing, polishing rates may depend on various chemical and mechanical factors, such as particle concentration in slurry, slurry pH and kinds of basic compounds for controlling the slurry pH. The silicon wafer was polished by slurry continuously fed on a pad, and the polishing rate was estimated as a weight loss of the wafer. For studying the effects of the various factors on the rate, the slurries were prepared by adding the silica particles, basic compounds or salts, and the polishing rates of the slurry were measured. The effects of the various factors were made clear as follows: For the effect of particle concentration, the rates increased with increasing of the concentrations up to 1.0 wt.%. And for the effect of the slurry pH, slurries added basic compounds, such as KOH, NaOH, ammonia, were tested, and it was found that increasing of the slurry pH brought increases of the polishing rates. KOH-containing slurry of pH 13.2 had the fastest rate, 3.6 times as fast as the standard slurry with pH 9.4. For the effect of the adding of salts, it was indicated that the salts, such as KCl, NaCl, NH₄Cl, NaNO₃ and K₂SO₄ increased the polishing rates, and that KCl-containing slurry of 0.36 mol/l had the highest polishing rate, 3.4 times as fast as that of the standard slurry containing no salts.     

共沉法制备PbTiO3微粉控制晶粒大小方法的研究

研究了超声分散作用和共沉物陈化条件对共沉法制备ＰｂＴｉＯ３微粉晶粒大小的影响，结果表明，在超声分散作用下进行共沉反应可使晶粒明显减小，并可降低ＰｂＴｉＯ３的晶化温度，共沉物在不同类型的表面活性剂水溶液中陈化效果不同，非离子型表面活性剂及其混合物可使陈化物粒子及ＰｂＴｉＯ３晶粒明显减小。