TEM study of ion implanted GaAs after pulsed electron beam annealing

Abstract

(001) GaAs single crystals were implanted with 150 keV Cr⁺ ions using a dose of 5 × 10¹⁵ ions cm^?2. The amorphized surface layers were subjected to pulsed electron beam annealing at energy densities in the range 0–1.3 J cm^?2. A detailed TEM investigation of the damaged and annealed surface layer was conducted. These observations were correlated with backscattering results.     

The improvement of InAs/GaAs quantum dot properties capped by Graphene

InAs self‐assembled quantum dots (QDs) were grown by molecular beam epitaxy on (001) GaAs substrate. Uncapped and capped QDs with GaAs and graphene layers were studied using atomic force microscopy and Raman spectroscopy. Graphene multi‐layer was grown by chemical vapor deposition and transferred on InAs/GaAs QDs. It is well known that the presence of a cap layer modifies the size, shape, and density of the QDs. According to the atomic force microscopy study, in contrast to the GaAs capped sample, which induce a dramatic decrease of the density and height of dots, graphene cap layer sample presents a slight influence on the surface morphology and the density of the islands compared with the uncapped one. The difference shown in the Raman spectra of the samples is due to change of strain and alloy disorder effects on the QDs. Residuals strain and the relaxation coefficients have been investigated. All results confirm the best crystalline quality of the graphene cap layer dots sample relative to the GaAs capped one. So graphene can be used to replace GaAs in capping InAs/GaAs dots. To our knowledge, such study has not been carried out until now. Copyright © 2013 John Wiley & Sons, Ltd.     

分数维方法研究GaAs薄膜中的极化子

本文采用分数维方法, 在讨论Al_0.3Ga_0.7As衬底上GaAs薄膜的分数维基础上, 计算了GaAs薄膜中的极化子结合能和有效质量. 随着薄膜厚度的增加, 极化子结合能和质量变化单调地减小. 当薄膜厚度L_w<70 Å并且衬底厚度L_b<200 Å时, 衬底厚度的变化对薄膜中极化子的结合能和质量变化的影响比较显著, 随着衬底厚度的增加, 薄膜中极化子的结合能和质量变化逐渐变大; 当薄膜厚度L_w>70 Å或者衬底厚度L_b>200 Å时, 衬底厚度的变化对薄膜中极化子的结合能和质量变化的影响不显著. 研究结果为GaAs薄膜电子和光电子器件的研究和应用提供参考. 关键词： 分数维方法 GaAs薄膜 极化子 低维异质结构     

三代像增强器用微通道板的改进与发展

简要说明了三代像增强器的特点，分析了微通道板的离子反馈形成机理，给出有效抑制离子反馈对光阴极造成伤害的2种方法，即一种是减少和清除微通道板的吸附气体，另一种是阻止反馈离子反馈到光阴极上。介绍了国外最新的三代像增强器，以及使用优化改进的高性能微通道板显著减薄甚至彻底去除微通道板离子反馈膜的方法，该方法能维持砷化镓光阴极足够长的工作寿命，还介绍了最新发展的体导电微通道板和硅微通道板。指出高可靠性无膜选通砷化镓像增强器技术的实现，不仅需要微通道板在抑制离子反馈方面取得突破，还需要砷化镓光阴极在耐受离子反馈能力上进一步提高，同时还要结合和拓展选通电源的应用。     

声表面波对GaAs(110)量子阱发光特性的调制

结合声表面波和光致发光谱在低温(15K)下对非故意掺杂的GaAs(110)量子阱结构的发光特性进行了研究.实验结果表明，由于声表面波的作用GaAs(110)量子阱的发光强度减弱,并且其对应的重空穴能级出现了分裂的现象，当施加的声波强度P_rf达到20dBm时，能级分裂ΔE达到了10meV.进一步讨论了声表面波对GaAs(110)量子阱圆偏振光自旋注入的影响. 关键词： 发光 GaAs量子阱 声表面波 自旋极化     

SOI新结构——SOI研究的新方向

SOI（silicon-on-insulator：绝缘体上单晶硅薄膜）技术已取得了突破性的进展，但一般SOI结构是以SiO2作为绝缘埋层，以硅作为顶层的半导体材料，这样导致了一些不利的影响，限制了其应用范围。为解决这些问题和满足一些特殊器件／电路的要求，探索研究新的SOI结构成为SOI研究领域新的热点。如SOIM，GPSOI，GeSiOI，SionAlN，SiCOI，GeSiOI，SSOI等。文章将结合作者的部分工作，报道SOI新结构研究的新动向及其应用。     

Passively Q-switched Self-frequency Doubling NYAB laser with GaAs Saturable Absorber

By using a passive Q-switch with GaAs saturable absorber, the Q-switched self-frequency doubling NYAB laser at 0.531μm has been successfully realized. The pulse width and the single pulse energy are measured. The numerical solutions of the coupling wave rate equations are in agreement with the experimental results.     

拉曼放大器中放大的自发拉曼散射与拉曼开-关增益关系的研究

研究了拉曼放大器中放大的自发拉曼散射对拉曼开－关增益的影响，并提出了一种利用自发拉曼散射谱来调整拉曼放大器位曼开－关增益平坦的方法，实验采用4个波长为14xx nm的激光二极管作为抽运源，75km的G．652光纤作为传输介质，获得了C波段附近的光放大，同时对此给出了合理的理论解释。     

在线原麦汁浓度检测仪

原麦汁浓度是啤酒生产过程中的一项重要指标。溶液的折射率是其浓度的函数 ,全反射的临界角与其浓度之间有一一对应关系。利用线阵CCD做为高精度探测器件 ,检测全反射临界角的变化 ,可测量溶液的浓度。临界角的变化与电源的波动及光源的强度变化等因素无关 ,并且溶液中的固体颗粒、小气泡等不影响检测精度。研制了一种在线检测原麦汁浓度的测试仪器 ,介绍了仪器的光学结构及数据处理方法。现场测量精度为± 0 1(以浓度表示)