透明导电氧化铟锡薄膜的特殊应用

阐述了氧化铟锡（ＩＴＯ）薄膜的气敏特性及其导电扩散阻挡作用，对ＩＴＯ气敏薄膜及扩散阻挡层薄膜的制备过程、测试方法和应用进行了研究讨论。     

Universal Class of Criticality of Diluted Strongly Frustrated Systems

Using Monte Carlo simulations,we study the universal classes of criticality associated to the superlattices CddMn1-d Te/CdTe and the spinels ZndCd1-dCr2S[Se]4.Both systems are diluted frustrated antiferromagnets.The ratio d of dilution or substitution is found to greatly influence the nature of criticality.The effect of dimensionality in spin glass transitions is also investigated.     

Superconductivity and x—ray photoemission study of MgB2 thin films

Highly c-axis oriented MgB2 thin films with Tc^onset of 39.6K were fabricated by magnesium diffusing into pulsedlaser-deposited boron precursors.The estimation of critical current density Jc,using hysteresis loops and the Bean model,has given the value of 10^7A/cm^2(15K,0T),which is one of the highest values ever reported.The x-ray photoemission study of the MgB2 thin films has revealed that the binding energies of Mg 2p and B 1s are at 49.4eV and 186.9eV,which are close to those of metallic Mg and transition-metal diborides,respectively.     

三氧化钨电致变色薄膜最佳掺杂含量的理论计算

介绍电致变色薄材料最佳掺杂含量的定量理论。该理论建立了电子薄膜材料的某一物理性能与晶体结构、制备方法和掺杂剂含量之间的联系，给出了一个能够拟合实验曲线的具有确定物理意义的抛物线方程。该方程的极值点确定了最佳掺杂含量与晶体结构和制备方法之间的定量关系，进而得到了一个最佳掺杂含量的表达式。分析三氧化钨电致变色薄膜材料的掺杂改性的实验结果，应用最佳掺杂含量表达式定量计算了三氧化钨以及三氧化钼电致变色薄膜材料的最佳掺杂含量，定量计算的结果与实验数据相符合。该理论方法也适用于其他材料最佳掺杂粒子数分数的理论计算。     

用射频溅射方法制备的多晶ZnO薄膜的光响应与其结构变化

用射频溅射方法在较高氧压下沉积的多晶的ZnO薄膜,其光响应主要由两部分组成:第一部分来源于膜内晶粒界面所吸附氧原子的光脱附,该部分光响应可使膜的电导率增加两个数量级且响应速度较快;第二部分来源于薄膜表面所吸附氧原子的光脱附,此光响应可使膜的电导率增加4一5个数量级,但响应速度非常缓慢.两部分光响应都来自薄膜的结构变化,膜的结构变化与膜所处环境中气体的种类,压强以及膜的温度有关. 关键词：     

Photoluminescence Characterization of Nanocrystalline ZnO Array

High-density and uniform well-aligned ZnO sub-micron rods are synthesized on the silicon substrate over a large area. The morphology and structure of the ZnO sub-micron rods are investigated by x-ray diffraction, transmission electron microscopy and Raman spectra. It is found that the ZnO sub-micron rods are of high crystal quality with the diameter in the range of 400-600 nm and the length of several micrometres long. The optical properties were studied by photoluminescence spectra. The results show that the intensity of the ultraviolet emission at 3.3eV is rather high, meanwhile the deep level transition centred at about 2.38eV is weak. The free exciton emission could a/so be observed at low temperature, which implies the high optical quality of the ZnO sub-micron rods.This growth technique provides one effective way to fabricate the high crystal quality ZnO nanowires array, which is very important for potential applications in the new-type optoelectronic nanodevices.     

Electrical Properties of La-Doped Al2O3 Films on Si （100） Substrates as a High-Dielectric-Constant Gate Material

Amorphous La-doped Al2O3 （La： Al2O3） thin films are deposited on n-type （100） Si substrates by rf magnetron co-sputterlng. The composition of the deposited films is measured by energy dispersive x-ray spectroscopy： Capacitance-voltage measurement shows that the dielectric constant k of La-doped Al2O3 films ranges from 8.5 to 11.6 with the increasing La content, and the highest k value of 11.6 is obtained for the 20.14% La content film. In the structure of the Al/La：Al2O3/Si metal oxide semiconductor, the dominant conduction stems from the space- charge-limited current at different temperatures. In addition, the wavelength dependence of the transmittance is studied by ultraviolet spectroscopy and the band gap of all the deposited films is above 5.5eV. The results demonstrate that La-doped Al2O3 can meet the requirement of next-generation gate materials.     

Preparation of Cu（In,Ga）Se2 Thin Film Solar Cells by Selenization of Metallic Precursors in an Ar Atmosphere

Cu（In, Ga）Se2 thin films are deposited on Mo-coated glass substrates by Se vapour selenization of sputtered metallic precursors in the atmosphere of Ar gas flow under a pressure of about 10 Pa. The in situ heat treatment of as-grown precursor leads to the formation of a better alloy. During selenization, the growth of CuInSe2 phase preferably proceeds through Se-poor phases as CuSe and InSe at relatively low substrate temperature of 250℃, due to the absence of In2Se3 at intermediate stage at low reactor pressure. Subsequently, the Cu（In,Ga）Se2 phase is produced by the reactive diffusion of CuInSe2 with a Se-poor GaSe phase at high temperature of up to 560℃. The final film exhibits smooth surface and large grain size. The absorber is used to fabricate a glass/Mo/Cu（In, Ga）Se2/CdS/ZnO cell with the total-area efficiency of about 7%. The low open-circuit voltage value of the cell fabricated should result from the nonuniform distribution of In and Ga in the absorber, due to the diffusion-controlled reaction during the phase formation. The films, as well as devices, are characterized.     

Behaviour of Self-Standing CVD Diamond Film with Different Dominant Crystalline Surfaces in Thermal-Iron Plate Polishing

Self-standing CVD diamond films with different dominant crystalline surfaces are polished by the thermal-iron plate polishing method. The influence of the dominant crystalline surfaces on polishing etfficiency is investigated by measuring the removal rate and final roughness. The smallest rms roughness of 0.14 μm is measured with smallest removal rate in the films with the initial （220） dominant crystalline surface. Activation energy for the polishing is analysed by the Arrhenius relation. It is found that the values are 170kJ/mol, 222kJ/mol and 214kJ/mol for the film with three different dominant crystalline surfaces. Based on these values, the polishing cause is regarded as the graphitization-controlling process. In the experiment, we find that transformation of the dominant crystalline surfaces from （111） to （220） always appears in the polishing process when we polish the （111） dominant surface.