全文获取类型
收费全文 | 602篇 |
免费 | 134篇 |
国内免费 | 41篇 |
专业分类
化学 | 318篇 |
晶体学 | 2篇 |
力学 | 10篇 |
综合类 | 2篇 |
物理学 | 445篇 |
出版年
2024年 | 1篇 |
2023年 | 2篇 |
2022年 | 5篇 |
2021年 | 10篇 |
2020年 | 18篇 |
2019年 | 7篇 |
2018年 | 13篇 |
2017年 | 16篇 |
2016年 | 23篇 |
2015年 | 35篇 |
2014年 | 42篇 |
2013年 | 50篇 |
2012年 | 39篇 |
2011年 | 78篇 |
2010年 | 43篇 |
2009年 | 65篇 |
2008年 | 56篇 |
2007年 | 47篇 |
2006年 | 50篇 |
2005年 | 30篇 |
2004年 | 32篇 |
2003年 | 32篇 |
2002年 | 21篇 |
2001年 | 11篇 |
2000年 | 14篇 |
1999年 | 5篇 |
1998年 | 6篇 |
1997年 | 6篇 |
1996年 | 2篇 |
1995年 | 4篇 |
1994年 | 3篇 |
1993年 | 3篇 |
1992年 | 1篇 |
1991年 | 1篇 |
1990年 | 1篇 |
1988年 | 1篇 |
1987年 | 2篇 |
1984年 | 1篇 |
1981年 | 1篇 |
排序方式: 共有777条查询结果,搜索用时 328 毫秒
81.
Sourendu Gupta 《Pramana》2003,61(5):877-888
I describe how lattice computations are being used to extract experimentally relevant features of the quark gluon plasma.
I deal specifically with relaxation times, photon emissivity, strangeness yields, event-by-event fluctuations of conserved
quantities and hydrodynamic flow. Finally I give evidence that the plasma is rather liquid-like in some ways. 相似文献
82.
X射线光刻技术的进展及问题 总被引:2,自引:0,他引:2
X射线光刻是一种能满足下世纪初超大规模集成电路(VLSI)生产的深亚微米图形加工技术。论述了这种光刻技术的发展历史及近年来的主要进展。重点讨论了在X射线源、接近式曝光和全反射投影曝光等方面取得的成就与存在的问题。展望了这种技术的发展前景 相似文献
83.
84.
用无衍射光子束写入细微图形的CAM技术 总被引:1,自引:1,他引:0
本文提出了用无衍射光子束写入细微图形的新方法,从理论上论证了无衍射光子束的生成机理.设计了无衍射光子束的发生装置.介绍了已研制成功的CAM光刻机. 相似文献
85.
采用标量衍射理论和严格耦合波理论分别计算和讨论了金自支撑透射光栅的衍射效率随波长和光栅周期变化的情况并设计了光栅的结构参数.制作了周期为300 nm、线宽/周期比为055、厚度为200 nm、总面积为1 mm×1 mm、有效面积比为65%的金自支撑透射光栅.在国家同步辐射实验室检测了该光栅在55—38 nm波长范围内的绝对衍射效率.检测结果表明所制作的光栅在8 nm附近具有接近10%的最大衍射效率,并且该光栅对于波长15—35 nm范围内的极紫外波段具有基本稳定的衍射效率.
关键词:
自支撑透射光栅
电子束光刻
电镀 相似文献
86.
光学特异材料的设计 总被引:2,自引:0,他引:2
Christian Helgert Thomas Pertsch Carsten Rockstuhl Ekaterina PshenaySeverin Christoph Menzel ErnstBernhard Kleyet.al 《中国光学》2010,3(1):1-10
In this contribution we review our latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials(MMs) at will. We give three examples of metamaterial designs that have been realized by means of electron-beam lithography and whose spectroscopic characteristics have been comprehensively investigated. In every case, our experiments are complemented by rigorous numer ical simulations. Particular emphasis is put on the significance of such tailored effective properties of optical MMs 相似文献
87.
88.
Molecular dynamics simulations of nanoimprint lithography (NIL) were performed to investigate the effects of three critical process parameters in NIL: stamp shape, adhesive energy between the stamp and polymer film, and imprint temperature. The proposed simulation model of the NIL process consists of an amorphous SiO2 stamp with a line pattern, an amorphous poly(methylmethacrylate) film, and a Si substrate under the periodic boundary condition in the horizontal direction to simulate a real NIL process imprinting periodical line patterns. The behavior of polymer deformation and the effects of adhesion on pattern transfer were investigated by observing the deformation process, calculating the imprint and separation forces, and analyzing the density and stress distribution inside the polymer film. In addition, their dependency on the process parameters is also discussed with reference to the changes in pattern shape, adhesive energy between the stamp and polymer atoms, and imprint temperature of the polymer film. During the imprint process, the rectangular pattern shows inferior cavity filling and higher stress concentration compared to trapezoidal and triangular patterns because it requires much larger flow and deformation of the polymer film. Low imprint temperature also produces high stress concentration and large imprint force due to the lower fluidity of polymer film. In the separation process, the rectangular pattern generates the largest separation force and causes the most serious defects of the transferred pattern and even the polymer film, while the triangular pattern shows the most satisfactory pattern transfer. In addition, the adhesive energy between the stamp and the polymer film also strongly influences the adhesion between the stamp and the polymer film. Low adhesive energy reduces the separation force of the stamp and transferred pattern defects, and therefore enhances the quality of pattern transfer. 相似文献
89.
A kinetic equation approach is applied to model anomalous J/ψ suppression at RHIC and SPS by absorption in a hadron resonance gas which successfully describes statistical hadron production in both experiments. The puzzling rapidity dependence of the PHENIX data is reproduced as a geometric effect due to a longer absorption path for J/ψ production at forward rapidity. 相似文献
90.
We suggest baryon–baryon correlations as an experimentally accessible signature for a first-order phase transition between a baryon-rich phase, like quarkyonic, and a baryon-suppressed hadronic phase in the QCD phase diagram. We examine the consequences of baryon-rich bubble formation in an expanding medium and show how the two-particle correlations vary in the transverse and longitudinal direction depending on the strength of the radial flow, the bubble temperature, and the time when the baryons are emitted. 相似文献