光化学气相淀积SiGe/Si材料的机制分析

本文对光化学气相淀积SiGe/Si过程中气相反应机制和表面反应历程进行了分析和讨论.利用表面反应动力学的有关理论,结合光化学气相淀积的特点,推导出光化学气相淀积SiGe/Si过程中的生长速率和生长压力的关系.并给出该理论结果和实际实验结果的比较.     

锰结核中硅,铝,铁,镁,磷,钾,锰,钛的XRFA

本文叙述了用XRF分析锰结核中Si、Al、Fe、Mg、P、K、Mn和Ti的方法。按照通常锰结核的主次成分制备6个人工合成标准,根据Sherman方程计算了已知成分(二元系统)的相对强度。用L-T方求得了互致元素校正的理论α系数(基本的、混合的、修正的),用DATAFLEX151B计算机以BASIC语言汇了“PRA,APU”计算机程序。然后进行非线性回归分析了锰结核样品得到了满意的结果。     

Si1－xGex/Si量子阱发光材料的分子束外延生长及其结构研究

采用固源Si分子束外延,在较高的生长温度于Si(100)衬底上制备出Si1－xGex/Si量子阱发光材料。发光样品的质量和特性通过卢瑟福背散射、X射线双晶衍射及光致发光评估。背散射实验中观察到应变超晶格的反常沟道效应;X射线分析表明材料的生长是共度的、无应力释放的,结晶完整性好。低温光致发光主要是外延合金量子阱中带边激子的无声发射和横光学声子参与的激子复合。并讨论了生长温度对量于阱发光的影响。     

Complex impedance spectra of chip inductor using Li–Zn–Cu–Mn ferrite

A multi-layer chip inductor (MCI) was fabricated using polycrystalline Li–Zn–Cu–Mn ferrite and the green-sheet technique, and its complex impedance spectrum was evaluated with the help of numerical calculations. The complex impedance spectra of the MCI component using Ni–Zn–Cu ferrite, which have been widely used for this application, were very sensitive to the residual stress and deviated much from the calculated values; however, it was found that the complex impedance spectrum of the MCI component using Li–Zn–Cu–Mn ferrite is quite well reproduced by calculation, where the complex permittivity and permeability of the polycrystalline ferrite as well as the MCI dimensions, were used. It implied that the magneto-striction effect was negligible in case of MCI using Li–Zn–Cu–Mn ferrite, and that the difference was related to magneto-strictive coefficient of the polycrystalline ferrite. Consequently, utilization of Li–Zn–Cu–Mn ferrite enabled us to easily design the complex impedance of MCI component.     

Si衬底上ZnSe外延膜的低压MOCVD生长

以硒化氢（H2Se）和二甲基锌为源材料，生长温度是300℃时，用低压金属有机化学气相沉积（LP－MOCVD）系统在Si(111)衬底上外延生长了ZnSe薄膜。通过X射线衍射（XRD）、扫描电子显微镜的能量色散（EDS）以及光致发光（PL）实验验证ZnSe外延膜的质量，在X射线衍射谱中只有一个强的ZnSe(111)面衍射峰，这说明外延膜是（111）取向的单晶薄膜，在能量色散谱中除了Si,Zn和Se原子外，没有观测到其他原子，说明ZnSe外延膜中杂质含量较少。ZnSe外延膜中Zn/Se原子比接近1，有较好的化学配比。在ZnSe外延膜的77K光致发光谱中没有观测到与深中心发射相关的发光峰，表明ZnSe外延膜的晶格缺陷密度较小。77K时的近带边发射峰447nm在室温时移至465nm附近。     

Divergence-free WKB theory

We present a divergence-free WKB theory, which is a new semiclassical theory modified by nonperturbative quantum corrections. Conventionally, the WKB theory is constructed upon a trajectory that obeys the bare classical dynamics expressed by a quadratic equation in momentum space. Contrary to this, the divergence-free WKB theory is based on a higher-order algebraic equation in momentum space, which represents a dressed classical dynamics. More precisely, this higher-order algebraic equation is obtained by including quantum corrections to the quadratic equation, which is the bare classical limit. An additional solution of the higher-order algebraic equation enables us to construct a uniformly converging perturbative expansion of the wavefunction. Namely, our theory removes the notorious divergence of wavefunction at a turning point from the WKB theory. Moreover, our theory is able to produce wavefunctions and eigenenergies more accurate than those given by the traditional WKB method. In addition, the divergence-free WKB theory that is based on the cubic equation allows us to construct a uniformly valid wavefunction for the nonlinear Schrödinger equation (NLSE). A recent short letter [T. Hyouguchi, S. Adachi, M. Ueda, Phys. Rev. Lett. 88 (2002) 170404] is the opening of the divergence-free WKB theory. This paper presents full formalism of this theory and its several applications concerning wavefunction and eigenenergy to show that our theory is a natural extension of the traditional WKB theory that incorporates nonperturbative quantum corrections.     

Fe/Si多层膜的层间耦合与界面扩散

对以本征Si及重掺杂ｐ型和ｎ型Si作为中间层的Fe/Si多层膜的层间耦合进行研究，并通过退火，增大Fe，Si之间的扩散，分析界面扩散对层间耦合的影响. 实验结果表明，层状结构良好的制备态的多层膜，Fe，Si之间也存在一定程度的扩散，它是影响层间耦合的 主要因素，远远超过了半导体意义上的重掺杂，使不同种类的Si作为中间层的层间耦合基本 一致.进一步还发现，在一定范围内增大Fe，Si之间的扩散，即使多层膜的层状结构已经有了相当的退化，Fe/Si多层膜的反铁磁耦合强度基本保持不变. 关键词： Fe/Si多层膜 层间耦合 界面扩散     

Luminescence enhancement by hydrogenation of Si:Er,O

Erbium (Er)- and oxygen (O)-doped Cz–Si was additionally doped with hydrogen, using plasma enhanced chemical vapour deposition. Photoluminescence (PL) spectra show a large enhancement especially for samples treated with solid phase epitaxy before hydrogenation and annealing at 900°C later. Secondary ion mass spectroscopy measurements give evidence for an enhanced diffusion of O and Er at this temperature towards the surface. Etching shows that the PL does not stem from the heavily doped surface layer but from a deeper region with lower Er concentration. This conclusion is supported by the appearance of the so-called “cubic” centre with low solubility. Comparing the PL yield of the hydrogenated samples to that of samples with similar Er volume concentration but without hydrogenation still gives a large enhancement. We thus conclude that hydrogen can enhance the solubility of the cubic centre in Si:Er,O.     

4英寸热氧化硅衬底上磁性隧道结的微制备

就如何在4英寸热氧化硅衬底上沉积高质量的磁性隧道结纳米多层薄膜材料和如何利用光刻方法微加工制备均匀性较好的磁性隧道结方面做了初步研究，并对磁性隧 道结的磁电性质及其工作特性进行了初步测量和讨论.利用现有的光刻设备和工艺条 件在4英寸热氧化硅衬底上直接制备出的磁性隧道结，其结电阻与面积的积 矢的绝对误差在10% 以内，隧穿磁电阻的绝对误差在7% 以内，样品的磁性隧道结性质具有较好的均匀性和一致性，可以满足研制磁随机存储器存储单元演示器件的基本要求. 关键词： 磁性隧道结 隧穿磁电阻 磁随机存储器 4英寸热氧化硅衬底     

Experimental evidence for anisotropic response of a driven vortex lattice

We present kinetic inductance measurements in current driven Josephson junction arrays. Measurements performed with circular coils indicate that this technique is very sensitive to the vortex mobility. Results obtained with anisotropic detection coils provide experimental evidence for the anisotropic response of a driven vortex lattice. Anisotropic behavior is obtained when rising the temperature or the mean vortex velocity as indicated by the loss of the superconducting shielding capability, first in the direction of vortex motion and then in the perpendicular direction.