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1.
This paper presents in-time motion adjustment in laser cladding manufacturing process as a means to improve dimensional accuracy and surface finish of the built part. Defects occurring during laser cladding degrade the part quality such as dimensional accuracy and surface finish. In this paper, in-time motion adjustment strategy was presented to remedy and eliminate defects occurring during laser cladding to improve the dimensional accuracy and surface finish. Based on the relationship between the motion of laser head relative to the growing part and other parameters in effects on clad profile, the laser traverse speed, stand-off distance and laser approach orientation to the existing clad layer were adjusted by instructions from a close-loop control system in real time to remedy and eliminate defects. The results of the experiments verified the effects of in-time motion adjustment on dimensional accuracy and surface finish.  相似文献   
2.
The task of image interpolation and re-sampling for particle image velocimetry (PIV) is investigated, which is used for window shifting with sub-pixel accuracy and image or window deformation. A new interpolation scheme based on a Gaussian filter is introduced and compared with commonly used and widely accepted interpolation techniques in terms of the achievable root mean square deviation of the displacement estimates.  相似文献   
3.
The miniaturized calorimetric devices furnish a reduced working flat surface and permits measurements with extremely low-mass quantities. The experimental sensitivity shows relevant position dependence with x-y surface coordinates and with z-distance. The device identification is realized via a 2-D model based in Fourier general equation. Using the Marquardt method the experimental flat surface device can be identified and the fitted parameters used to simulate the behavior of the experimental system. From the model, the effects of several dissipation configurations can be evaluated. Also, via the RC-analogy, a way to 3-D experimental devices is roughly described. This revised version was published online in July 2006 with corrections to the Cover Date.  相似文献   
4.
We derive and analyse four algorithms for computing the current induced on a thin straight wire by a transient electric field. They all involve solving the thin wire electric field integral equations (EFIEs) and consist of a very accurate differential equations solver together with various schemes to approximate the vector potential integral equation. We carry out a rigorous numerical stability analysis of each of these methods. This has not previously been done for solution schemes for the thin wire EFIEs. Each scheme is shown to be stable and convergent provided the radius of the wire is small enough for the thin wire equations to be a valid model.  相似文献   
5.
A generalized formulation is applied to implement the quadratic upstream interpolation (QUICK) scheme, the second-order upwind (SOU) scheme and the second-order hybrid scheme (SHYBRID) on non-uniform grids. The implementation method is simple. The accuracy and efficiency of these higher-order schemes on non-uniform grids are assessed. Three well-known bench mark convection-diffusion problems and a fluid flow problem are revisited using non-uniform grids. These are: (1) transport of a scalar tracer by a uniform velocity field; (2) heat transport in a recirculating flow; (3) two-dimensional non-linear Burgers equations; and (4) a two-dimensional incompressible Navier-Stokes flow which is similar to the classical lid-driven cavity flow. The known exact solutions of the last three problems make it possible to thoroughly evaluate accuracies of various uniform and non-uniform grids. Higher accuracy is obtained for fewer grid points on non-uniform grids. The order of accuracy of the examined schemes is maintained for some tested problems if the distribution of non-uniform grid points is properly chosen.  相似文献   
6.
光学光刻是目前超大规模集成电路(VLSI)制备中主要的微米和亚微米的图形加工技术,这一技术将继续保持其主导地位成为90年代VLSI发展的关键。本文综述了近年来光学光刻工艺的发展,主要介绍了G线(436nm)、Ⅰ线(365nm)和准分子激光光刻的现状,并对实现高的光学光刻分辨率所必须解决的透镜设计、套准精度和像场面积等问题作了详细描述。最后展望了发展方向、  相似文献   
7.
1 IntroductionFinitevolumeelementmethodorFVEMusesavolumeintegralformulationofthedif ferentialequationwithafinitepartitioningsetofvolumetodiscretizetheequation ,thenre strictstheadmissiblefunctionstoalinearfiniteelementspacetodiscretizethesolution ([1 -4 ] ) .…  相似文献   
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利用电位差计的高精度,设计出合理的实验电路对C31型电表进行校准,使得电表的准确度等级得以提高。  相似文献   
10.
面阵探测器的像点亚像素定位研究   总被引:22,自引:3,他引:19  
面阵探测器可直接探测点目标图像的位置,但其定位精度受到探测器分辨率的限制。因此,亚像元精度技术得到了发展。它是利用目标像点的灰度分布特性,通过内插细分算法,确定出像点位置。可将定位精度提高1—2个数量级。本文介绍了几种实现目标像点亚像素定位的内插细分算法。对它们的计算公式、特点进行了分析,并进行了实验验证。  相似文献   
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