阳极氧化铝模板法可控制备金属纳米线和纳米管阵列的生长机制

利用阳极氧化铝模板(AAO)进行Ni的电化学沉积, 通过在溶液中引入螯合剂控制电解质的有效浓度和电沉积的过电位, 实现了Ni纳米线和纳米管阵列的可控制备. 通过分析电沉积过程中纳米线和纳米管在不同位置生长速率(侧壁(Vw)和底端(Vb))的控制因素, 我们提出了纳米线和纳米管生长的可能机制. 当电解质浓度高而还原电位更负(如-1.5 V)时, 或者当电解质浓度低而还原电位较负(如-0.5 V)时, Vw>Vb, 可以获得Ni纳米管阵列; 当电解质浓度高而还原电位较负(如-0.5 V)时, 或者当电解质浓度低而还原电位更负(如-1.5 V)时, Vw≈Vb, 可以获得Ni纳米线阵列. 这种生长机制适用于多种金属纳米管或者纳米线阵列的可控制备.     

Ultrasound-assisted anodization of aluminum in oxalic acid

Porous anodic alumina is an important nanoscale template for fabrication of various nanostructures. We report a new ultrasound-assisted anodization process in oxalic acid. Under the continuous irradiation of ultrasound, the one-step-anodized sample has a smooth and clean surface, and two-step-anodization brings ordered porous anodic alumina with higher growth rate of 52 μm/h. The ultrasound applied during the anodization can clean the surface and enhance the nanopore growth since it can accelerate the oxide dissolving on the electrolyte/oxide interface. The ultrasound-assisted anodization may be utilized for other anodizations.     

Dielectric properties of anodic films on sputter-deposited Ti-Si porous columnar films

For electrolytic capacitor application of the single-phase Ti alloys containing supersaturated silicon, which form anodic oxide films with superior dielectric properties, porous Ti-7 at% Si columnar films, as well as Ti columnar films, have been prepared by oblique angle magnetron sputtering on to aluminum substrate with a concave cell structure to enhance the surface area and hence capacitance. The deposited films of both Ti and Ti-7 at% Si have isolated columnar morphology with each column revealing nanogranular texture. The distances between columns are ∼500 nm, corresponding to the cell size of the textured substrate and the gaps between columns are 100-200 nm. When the porous Ti-7 at% Si film is anodized at a constant current density in ammonium pentaborate electrolyte, the growth of a uniform amorphous oxide film continues to ∼35 V, while it is limited to less than 6 V on the porous Ti film. The maximum voltage of the growth of uniform amorphous oxide films on the Ti-7 at% Si films is similar for both the flat and porous columnar films, suggesting little influence of surface roughness on the amorphous-to-crystalline transition of growing anodic oxide under the high electric field. Due to the suppression of crystallization to sufficiently high voltages, the anodic oxide films formed on the porous Ti-7 at% Si film shows markedly improved dielectric properties, in comparison with those on the porous Ti film.     

Magnetic properties of electroless-deposited Ni and Ni-NiO core-shell nano-arrays

Ni and Ni-NiO core-shell nano-arrays were fabricated by means of electroless deposition, where the latter was covered by a NiO shell of ∼10 nm by annealing the former at 350 °C for 30 min in an atmospheric condition. HRTEM showed that the NiO shell was developed at the expense of Ni at the array's surface. Ferromagnetic ordering of the Ni-NiO arrays was found to be suppressed compared with those of the less oxidized reference Ni arrays. This is attributed to the screening effect of the NiO shell, and weak ferromagnetism of inner Ni arrays resulted from the development of the NiO. X-ray absorption spectrum reveals that the reference Ni is partially oxidized. Also, X-ray magnetic circular dichroism suggests that the magnetic suppression of the Ni-NiO arrays is associated with a reduced spin moment.     

Electrochemical etching of silicon carbide

Both n- and p-type SiC of different doping levels were electrochemically etched by HF. The etch rate (up to 1.5 μm/min) and the surface morphology of p-type 6H-SiC were sensitive to the applied voltage and the HF concentration. The electrochemical valence of 6.3 ± 0.5 elementary charge per SiC molecule was determined. At p-n junctions (p-type layer on a n-type 6H-SiC substrate) a selective etching of the p-type epilayer could be achieved. For a planar 6H-4H polytype junction (n-type, both polytypes with equal doping concentrations) the 4H region was selectively etched under UV illumination. Thus polytype junctions could be marked by electrochemical etching. With HCl instead of HF no etching of SiC occurs, but a SiO₂ layer (thickness up to 8 μm) is formed by anodic oxidation. Received: 29 October 1998 / Accepted: 27 January 1999     

Evaluation of aerosol lead measurement techniques using laboratory generated super-micrometer particles

High levels of lead in some occupational environments still exist. These include lead paint abatement sites, smelting operations, small arms firing ranges, and other construction scenarios. New emerging technologies provide the capability to provide an on-site alternative to conventional laboratory methods for airborne lead. In this paper we describe the evaluation of two such technologies using laboratory prepared lead-laden super-micron aerosol particles. Size measurements by TSI Aerodynamic Particle Sizer™ indicated the fluctuation of the peak particle sizes varying less than 1% among different runs for a given solution concentration. The content of lead embedded in the particles varied from 14 to 18% between runs of three different lead solution concentrations. A commercially available instrument for airborne lead measurement, AeroLead™, showed promise of becoming fully validated with the addition of design enhancements, although not fully validated by the end of the research program. Some of these areas being reworked by the manufacturer include working electrode issues, such as a more uniform surface area. Once these have been addressed, the manufacturer plans to complete the field and laboratory validation procedures. In a subsequent study, the ABF-LIPS results shown in this paper indicated that the technology could be used to quantify lead in aerosol form with a signal-to-noise ratio of three or larger of approximately 100 μg m⁻³ or higher quantity in a few minutes of measurement interval. The estimated detection limit for Pb using the ABF-LIPS prototype was approximately 60 μg m⁻³. In comparison the Resource Conservation and Recovery Act (RCRA) limit for Pb emission is 250 μg m⁻³.     

Dual effects of ultrasound on fabrication of anodic aluminum oxide

Ultrasound has been proven to enhance the mass transfer process and impact the fabrication of anodic aluminum oxide (AAO). However, the different effects of ultrasound propagating in different media make the specific target and process of ultrasound in AAO remain unclear, and the effects of ultrasound on AAO reported in previous studies are contradictory. These uncertainties have greatly limited the application of ultrasonic-assisted anodization (UAA) in practice. In this study, the bubble desorption and mass transfer enhancement effects were decoupled based on an anodizing system with focused ultrasound, such that the dual effects of ultrasound on different targets were distinguished. The results showed that ultrasound has the dual effects on AAO fabrication. Specifically, ultrasound focused on the anode has a nanopore-expansion effect on AAO, leading to a 12.24 % improvement in fabrication efficiency. This was attributed to the promotion of interfacial ion migration through ultrasonic-induced high-frequency vibrational bubble desorption. However, AAO nanopores were observed to shrink when ultrasound was focused on the electrolyte, accompanied by a 25.85 % reduction in fabrication efficiency. The effects of ultrasound on mass transfer through jet cavitation appeared to be the reason for this phenomenon. This study resolved the paradoxical phenomena of UAA in previous studies and is expected to guide AAO application in electrochemistry and surface treatments.     

Palladium‐Catalyzed C−H Functionalization of Phenyl 2‐Pyridylsulfonates

An efficient palladium(II)‐catalyzed intermolecular direct ortho ‐alkenylation and acetoxylation of phenols has been developed. The reaction proceeded via a seven‐membered cyclopalladated intermediate and showed complete regio‐ and diastereoselectivity. The approach also provided an efficient route for the synthesis of coumarins and benzofurans.     

Determination of As(III) by anodic stripping voltammetry using a lateral gold electrode: experimental conditions, electron transfer and monitoring of electrode surface

The aim of this work is to evaluate the efficiency of the determination of As(III) by anodic stripping voltammetry (ASV) using a lateral gold electrode and to study the modifications of the electrode surface during use. Potential waveforms (differential pulse and square wave), potential scan parameters, deposition time, deposition potential and surface cleaning procedure were examined for they effect on arsenic peak intensity and shape. The best responses were obtained with differential pulse potential wave form and diluted 0.25 M HCl as supporting electrolyte. The repeatability, linearity, accuracy and detection limit of the procedure and the interferences of cations and anions in solution were evaluated. The applicability of the procedure for As(III) determination in drinking waters was tested. Cyclic voltammetry (CV) was used to study the electrochemical behaviour of As(III) and for the daily monitoring of electrode surface. Also scanning electron microscopy (SEM) analysis was used to control the electron surface. Finally we evaluated the possibility to apply the equations valid for flow systems also to a stirred system, in order to calculate the number of electrons transferred per molecule during the stripping step.