Reversed pyramids as novel optical micro-cavities

Pyramidal micro-cavities represent a novel promising class of semiconductor optical cavities. In contrast to our previous approach based on pyramids sitting on distributed Bragg reflectors, we investigate reversed freestanding GaAs pyramids. The latter are achievable by a wet-chemical etching process where an AlAs sacrificial layer in the epitaxially grown layer structure is used. In freestanding GaAs pyramids, light is simply confined by total internal reflection at the interface of the high refractive index material GaAs to the surrounding. Due to strong optical confinement within the pyramidal shape, small mode volumes are expected. Quality factors up to 3000 were measured in first structures. However, simulations suggest the possibility of much higher values. Therefore, these freestanding pyramids are promising for an optimized ratio between quality factor and mode volume, which is crucial for quantum-optical applications.     

Composition of the “GaAs” quantum dot,grown by droplet epitaxy

Self-assembled strain-free quantum dot (QD) structures were grown on AlGaAs surface by the droplet epitaxal method. The QDs were developed from pure Ga droplets under As pressure. The QDs were investigated by atomic force microscopy (AFM) and transmission electron microscopy (TEM). Both techniques show that the QDs are very uniform in size and their distribution on the surface is also homogeneous. The high resolution cross-sectional TEM investigation shows perfect lattice matching between the QD and the substrate, and also the faceting of the side walls of QD can be identified exactly by lattice planes. Analytical TEM (elemental mapping by EELS) unambiguously identifies the presence of Al in the QD.     

Molecular self-assembly and passivation of GaAs (0 0 1) with alkanethiol monolayers: A view towards bio-functionalization

Properties of as prepared or nanoengineered III-V semiconductor surfaces provide attractive means for photonic detection of different adsorbants from surrounding gaseous or liquid environments. To be practical, this approach requires that the surface is made selectively sensitive (functionalized) to targeted species. In addition, such surface has also to stay stable over extended period of time to make it available for rapid testing. Numerous reports demonstrate attractive properties of GaAs for sensing applications. One of the most fundamental issues relevant to these applications concerns the ability to functionalize chemically, or biologically, the surface of GaAs. The most studied method of GaAs surface functionalization is based on formation of self-assembled monolayers (SAMs) of various n-alkanethiols, HS-(CH₂)_n-T (T = CH₃, COOH, NH₂, etc.). In spite of multi-year research concerning this issue, it has only been recently that a comprehensive picture of SAMs formation on GaAs and an understanding of the natural limitation of the SAM-GaAs interface in some bio-chemical sensing architectures has begun to emerge.     

Study of n type porous GaAs by photoluminescence spectroscopy: Effect of the etching time on the deep levels

Photoluminescence (PL) analysis is used to study porous layers elaborated by electrochemical etching of n⁺ Si-doped GaAs substrate with different etching times. Temperature and power dependence photoluminescence (PL) studies were achieved to characterize the effect of the etching time on the deep levels of the n⁺ Si-doped GaAs. The energy emission at about 1.46 eV is attributed to the band-to-band (B-B) (e-h) recombination of a hole gas with electrons in the conduction band. The emission band is composed of four deep levels due to the complex of (V_AsSi_GaV_Ga), a complex of a (Ga vacancy - donor - As vacancy), a (Si_Ga-V_Ga³⁻) defect or Si clustering, and a (gallium antisite double acceptor-effective mass donor pair complex) and which peaked, respectively, at about (0.94, 1, 1.14, and 1.32 eV). The PL intensity behavior as function of the temperature is investigated, and the experimental results are fitted with a rate equation model with double thermal activation energies.     

氩、氢混合等离子体处理对GaAs表面性质及发光特性的影响

介绍了一种氩、氢混合等离子体清洗GaAs基片的实验工艺,深入研究了氩、氢等离子体清洗GaAs表面污染物和氧化层,并活化表面性能的基本原理,同时讨论了气体流量、溅射功率和清洗时间等不同溅射参数对等离子体清洗效果的影响。结果表明,在氩气和氢气流量分别为10 cm³/min和30 cm³/min,溅射功率为20 W,清洗时间为15 min的条件下,GaAs样品的光致发光强度提高达139.12%,样品表面的As-O键和Ga-O键基本消失。     

Ga1-xInxNyAs1-y/GaAs量子阱中电子-LO声子的散射率

在有效质量近似下利用打靶法求出Ga_1-xIn_xN_yAs_1-y/GaAs量子阱中的本征能级E_n, 并通过费米黄金规则计算电子-LO声子由第一激发态到基态的散射率和平均散射率随温度、阱宽以及氮(N)和铟(In)组分变化的规律. 计算结果表明: 在In 组分恒定的情况下, 随着N组分的增加, 散射率和平均散射率增加; 在N组分恒定的情况下, 随着In组分的增加, 散射率和平均散射率减小; 随着温度的增加, 在温度较低时散射率和平均散射率随温度的增加变化不大, 在温度较高时随温度的增加而增加; 随着阱宽的增加, 散射率和平均散射率都是先增加到一个最大值, 然后再减小, 最大值出现在阱宽200 Å附近. 计算结果对Ga_1-xIn_xN_yAs_1-y/GaAs量子阱在光电子器件应用方面有一定的指导意义. 关键词： 费米黄金规则 1-xIn_xN_yAs_1-y/GaAs量子阱')" href="#">Ga_1-xIn_xN_yAs_1-y/GaAs量子阱 LO声子 散射率     

GaAs薄膜的有效量子限制长度及其极化子特性

本文用分数维方法研究Al_xGa_1-xAs衬底上GaAs薄膜中的极化子特性, 提出了确定GaAs薄膜的有效量子限制长度的一个新方法, 解决了原来方法中在衬底势垒处有效量子限制长度发散的困难, 得到了Al_xGa_1-xAs衬底上GaAs薄膜中的极化子的维数和结合能. 关键词： 分数维方法 极化子 GaAs薄膜     

Investigations on the photographic elementary process in AgCl single crystal foils

The behaviour of the latent image produced by actinic radiation (λ = 365 nm and λ = 407 nm) in AgCl monocrystal foils highly doped with Cd and grown and annealed under various conditions was studied by extinction measurements in the near infrared. The photographic elementary process in these highly doped crystals cannot be described satisfactorily by the classical Gurney Mott model. Therefore another model was used based on the creation of anion vacancies and molecular chlorine complexes. The radiation-induced electrons occupy these anion vacancies, and quasi- metallic centres are formed. By this model the behaviour of the light-induced latent image can also be described as the nuclear particle track formation in the Cd doped AgCl crystals.