ICP-AES测定彩涂前处理表面调整转化层中Ti、Ni含量及钝化膜中Cr含量

采用电感耦合等离子体-原子发射光谱法同时测定彩涂前处理表面调整转化层中Ti、Ni含量及钝化膜中Cr含量.以表征表面调整转化层厚度及钝化膜厚度,采用本方法准确度高、快速简便,经试验结果令人满意.     

甲基百里(香)酚蓝新负载树脂的特 性及应用

本文以金属指示剂甲基百里(香)酚蓝作为鳌合剂制得具有相应鳌合基团的负载树脂.研究了该树脂的某些分析特性及其在富集天然水中微量铜、钻、镍、锌中的应用.     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

等温平台石墨炉原子吸收光谱法测定高纯镍中痕量杂质锑

利用石墨炉原子吸收法，在等温平台条件下直接测定高纯镍中的痕量杂质锑，对石墨炉加热程序中的干燥时间、灰化温度及原子化温度进行了优化，同时考察了介质酸度的影响。试验表明，基体镍对锑的测定有显著的影响，为此进行了标准系列基体匹配。该法的特征质量为6．6pg；相对标准偏差为6．5％；加标回收率为100％-103％。