Effect of annealing on structural and optical properties of lead tungstate microcrystals

Shuttle-like lead tungstate (PbWO₄) microcrystals are synthesized at room temperature using the precipitation method with the cetyltrimethyl ammonium bromide. Results from both the X-ray diffraction and the scanning electron microscopy show that the lattice distortions of the PbWO₄ microcrystals are reduced significantly when the annealing temperature is increased to 873 K. The result from the ultraviolet-visible diffuse reflectance spectroscopy shows that the exciton absorption appears in the sample annealed at 673 K. The self-trapped exciton luminescence due to the Jahn-Teller effect is also observed in the blue band. The interstitial oxygen ions in the WO₄^2- groups are mainly resposible for the enhancement effect of the green luminescence of the annealed samples. The above results are supported by the spectrum analysis of the as-grown and the post-annealed samples using the X-ray photoelectron spectroscopy.     

CdGeAs2晶体退火与红外光学均匀性分析

采用AIM-8800红外显微镜观察了CdGeAs2晶体的面扫描红外透过图像,分别在2.3～4μm、4～8 μm和8～18μm三个波段对退火前后的CdGeAs2晶片红外透过率和面扫描红外透过图像进行了对比分析,研究了晶体的红外均匀性.结果表明,CdGeAs2晶体在多晶粉末包裹下经450℃退火150 h后,其红外透过率和红外透过均匀性都得到较大程度的改善,其中在2.3 ～4μm和4～8μm波段的改善效果尤为显著;分析了影响晶体红外透过率和均匀性的主要因素,探讨了改善晶体均匀性的可能途径.研究结果对于快速评判CdGeAs2晶片质量具有重要的实用价值.     

ITER第一壁实验件的铍-铜连接界面分析

在ITER第一壁实验件的研究中,采用热等静压扩散连接技术对Be与CuCrZr合金进行连接实验,对完成扩散连接的部分连接件采用退火处理。对所有连接件进行超声波无损探伤后,检测到未退火的连接件Be/Cu连接界面存在缺陷。为分析扩散界面缺陷产生原因,从连接件的无缺陷区取样并进行界面微观分析。通过观察微观形貌和分析界面扩散层合金元素的变化,发现退火处理过的Be-Cu扩散界面的Cu-Ti扩散层和未扩散的Ti层厚度增加,中间层中Be与Cu元素形成脆性相的几率降低,整个扩散层厚度变大,扩散范围加大。实验表明退火工艺能改变Be/Cu热等静压扩散层连接结构组成,扩大扩散连接范围。     

溶胶-凝胶法制备高Mg含量Zn1-x MgxO薄膜

采用溶胶-凝胶法在石英玻璃基板上制备了ZB1-xMgxO薄膜,研究退火温度对高Mg含量Zn0.5Mg0.5O薄膜的相组成、相偏析及紫外-可见透过光谱中吸收边移动的影响,当退火温度≤500℃时,Zn0.5Mg0.5O薄膜未发生相偏析现象,且400℃退火处理制备的Zn0.5Mg0.5O薄膜的紫外-可见透过光谱中吸收边蓝移最大.因此,对于高Mg含量Zn0.5Mg0.5O薄膜,退火温度是影响Mg2+在ZnO中固溶度的关键因素,且400℃是其理想的退火温度.在此条件下研究了不同Mg含量对Zn1-xMgO(x=0～0.8)薄膜带隙调节的影响,随着Mg含量的增加,其紫外-可见透过光谱中紫外光区吸收边呈现规律性蓝移,光学带隙值Eg从纯ZnO的3.3 eV调节至4.2 eV.     

Two crucial factors influencing quality of GaAs on Ge substrate

High-quality GaAs films with fine surfaces and GaAs/Ge interfaces on Ge have been achieved via molecular beam epitaxy. The influence of low temperature annealing and low temperature epitaxy on the quality of the film when GaAs is grown on a （100） 6 ° offcut towards [111] Ge substrate are investigated by analyzing and comparing the GaAs films that are fabricated via three different processes. A low temperature annealing process after high temperature annealing and a low temperature epitaxy process after the initial GaAs growth play a vital role in improving the quality of GaAs film on a Ge substrate.     

Effect of alumina thickness on Al_2O_3/InP interface with post deposition annealing in oxygen ambient

In this paper, the effect of alumina thickness on Al2O3/InP interface with post deposition annealing （PDA） in the oxygen ambient is studied. Atomic layer deposited （ALD） Al2O3 films with four different thickness values （5 nm, 7 nm, 9 nm, 11 rim） are deposited on InP substrates. The capacitance-voltage （C-V） measurement shows a negative correlation between the alumina thickness and the frequency dispersion. The X-ray photoelectronspectroscopy （XPS） data present significant growth of indium-phosphorus oxide near the Al2O3/InP interface, which indicates serious oxidation of InP during the oxygen annealing. The hysteresis curve shows an optimum thickness of 7 nm after PDA in an oxygen ambient at 500 ℃ for 10 min. It is demonstrated that both sides of the interface are impacted by oxygen during post deposition annealing. It is suggested that the final state of the interface is of reduced positively charged defects on Al2O3 side and oxidized InP, which degrades the interface.     

物理所氧化亚铜新能源材料研究获进展

<正>氧化亚铜(Cu2O)是一种性能优异的半导体材料,它具有2.1 e V(590 nm)的直接帯隙以及很高的可见光吸收系数,再加上它具有无毒、低价、原料丰富等优点,已成为太阳能转化与利用研究领域的重要材料。理论预计基于Cu2O的太阳能电池效率可达20%,通过掺杂引入合适的中间带(intermediate band)后,其光电     

Effects of Annealing on Schottky Characteristics in A1GaN/GaN HEMT with Transparent Gate Electrode

A1GaN/GaN heterostructure transistors are promising for power and switching applications. In addition, the transparent wide band-gap A1GaN/GaN heterostructure systems have received considerable attention to transparent electronics. Nowdays, Al-doped ZnO （AZO） thin film plays an increas- ingly important role in various fields of transparent electronics.The AZO-gated A1GaN/GaN HEMT with good dc characteristics and frequency character- istics has been reported. Annealing is widely used to improve the electri- cal characteristics of A1GaN/GaN HEMTs. It is re- ported that the Schottky leakage current can be re- duced by over four orders of magnitude by annealing in an A1GaN/GaN heterostructure with ITO/Ni/Au electrode. Pei et al. reported that the transparency of Ni/ITO gates of A1GaN/GaN HEMTs has been sig- nificantly improved after annealing. However, the evaluation of Schottky C V characteristics was ab- sent. Up to now, few results are reported on the Schot- tky annealing characteristics of AZO in A1GaN/GaN HEMT. Thus the effects of annealing on the leakage current, transparency and interface states character- istics need further study.     

Radiation Induced Optical Absorption of Cubic Lead Fluoride Crystals and the Effect of Annealing

Transparent and colorless lead fluoride crystals with sizes of 20 × 20 × 20 （ram3） are irradiated with several doses of γ-rays from a ^60Co source. Their transmittance spectra before and after irradiation are measured, and a new parameter ΔT = Tb - Ta is defined to evaluate the irradiation damage. Three optical absorption bands peaking at 27Onto, 37Onto and 50Onto are found in the plots of AT versus wavelength, and their intensities increase with the irradiation dose. These optical absorption bands, except the one at 27Onto, can recover spontaneously with time. Thermal annealing treatment can enhance this recovery of the transmittance, while the optimum annealing temperature for different samples depends on the irradiation dose.     

溶剂预处理结合热退火提升聚噻吩结晶度及其光伏性能

活性层的微观形貌在很大程度上决定了聚合物光伏器件的性能表现并依赖于制备工艺条件。为了改善薄膜内部分子排布结构并追求较高的器件光电转化效率,采用溶液法制备了基于P3HT：PCBM的聚合物太阳能电池（器件结构:ITO/PEDOT：PSS/P3HT：PCBM/Al）,通过改变器件制备流程中活性层退火处理工艺,研究了热退火、溶剂退火以及溶剂预处理结合热处理的双重退火对聚合物太阳电池性能的影响。研究发现:双重退火的光伏器件的各项性能参数均优于单一退火处理器件,获得了3.25%的光电转化效率。原子力显微镜及X射线衍射仪的表征结果进一步证明:双重退火处理能够在促进聚合物给体良好有序结晶的同时保证共混组分适度地相分离,从而有利于光生激子的解离以及载流子的传输。