聚4—氨基联苯溶液的性质

本文报导了聚4-氨基联苯的电化学合成,测定了它的ESR、IR及紫外可见光谱。聚合物在THF、DMF和DMSO中能全部溶解。界面移动法测得聚4-氨基联苯的DMF饱和溶液中正离子的迁移率为1.48×10~(-8)m~2·S~(-1)·V~(-1)。     

基于CH3NH3PbI3单晶的Ta2O5顶栅双极性场效应晶体管

Organic-inorganic hybrid perovskite methylammonium lead iodide (CH₃NH₃PbI₃) generally tends to show n-type semiconductor properties. In this work, a field-effect transistor (FET) device based on a CH₃NH₃PbI₃ single crystal with tantalum pentoxide (Ta₂O₅) as the top gate dielectric was fabricated. The p-type field-effect transport properties of the device were observed in the dark. The hole mobility of the device extracted from transfer characteristics in the dark was 8.7×10^-5 cm²·V^-1·s^-1, which is one order of magnitude higher than that of polycrystalline FETs with SiO₂ as the bottom gate dielectric. In addition, the effect of light illumination on the CH₃NH₃PbI₃ single-crystal FET was studied. Light illumination strongly influenced the field effect of the device because of the intense photoelectric response of the CH₃NH₃PbI₃ single crystal. Different from a CH₃NH₃PbI₃ polycrystalline FET with a bottom gate dielectric, even with the top gate dielectric shielding, light illumination of 5.00 mW·cm^-2 caused the hole current to increase by one order of magnitude compared with that in the dark (V_GS (gate-source voltage)=V_DS (drain-source voltage)=20 V) and the photoresponsivity reached 2.5 A·W^-1. The introduction of Ta₂O₅ as the top gate dielectric selectively enhanced hole transport in the single-crystal FET, indicating that in the absence of external factors, by appropriate device design, CH₃NH₃PbI₃ also has potential for use in ambipolar transistors.     

任意多阶梯度场强毛细管凝胶电泳中谱带的迁移和展宽

在自行制备的毛细管凝胶电泳柱上，通过实验考察毛细管凝胶电泳（ＣＧＥ）中场强（Ｅ）和组分迁移率（μ）的关系，发现在一般ＣＧＥ使用的场强范围内，μ随Ｅ增大而成近似线性的增加。并讨论了产生这种现象的原因。以此为基础提供了任意多阶梯度场强毛细管凝胶电泳中组分的迁移时间和距离的计算公式，用于编制计算机程序。     

基于RTD和HEMT的D触发器设计

共振隧穿二极管(RTD)作为一种新的量子器件和纳米电子器件,具有负内阻、电路功耗低、工作频率高、双稳态和自锁等特性,可突破CMOS工艺尺寸的物理极限,在数字集成电路领域有更为广阔的发展空间.针对RTD的特性,采用3个RTD串联的单双稳态转换逻辑单元(MOBILE)和类SR锁存器,设计了基于RTD和HEMT(高电子迁移率晶体管)的D触发器.较于其他研究的D触发器,该D触发器能有效降低电路的器件数量和复杂度,且能抗S、R信号的延时差异干扰,具有更稳健的输出.     

低栅极电压控制下带有phenyltrimethoxysilane单分子自组装层的有机薄膜晶体管场效应特性研究

制作了底栅极顶接触有机薄膜晶体管器件,60 nm的pentacene被用作有源层,120 nm热生长的SiO₂作为栅极绝缘层.通过采用不同自组装修饰材料对器件的有源层与栅极绝缘层之间的界面进行修饰,如octadecyltrichlorosilane （OTS）,phenyltrimethoxysilane （PhTMS）,来比较界面修饰层对器件性能的影响.同时对带有PhTMS修饰层的OTFTs器件低栅极电压调制下的场效应行为及其载流子的传输机理进行研究.结果得到,当|V 关键词： 有机薄膜晶体管 自组装单分子层 场效应迁移率 低栅极调制电压     

生物分子膜门电极AlGaN/GaN高电子迁移率晶体管(HEMT)生物传感器研究

设计并制作了结构尺寸为毫米量级的AlGaN/GaN高电子迁移率晶体管(HEMT)生物传感器,采用数值分析的方法分析了器件传感区域长度与宽度比值及待测物调控二维电子气(2DEG)距离与感测信号之间的关系,给出了结构尺寸为毫米量级的AlGaN/GaN HEMT生物传感器的设计依据,以不同浓度的前列腺特异性抗原(PSA)为待测物,对制作的AlGaN/GaN HEMT生物传感器进行了初步测量,测试结果表明,在50 mV的电压下,毫米量级的AlGaN/GaN HEMT生物传感器的对PSA的探测极限低于0.1 pg/ml.实验表明毫米量级的AlGaN/GaN HEMT生物传感器具有灵敏度高,易于集成等优点,具备良好的应用前景.     

Simulation and Experimentation for Low Density Drain AlGaN/GaN HEMT

In order to improve the breakdown voltage of AlGaN/GaN high electron mobility transistors （HEMTs）, we report a feasible method of low density drain （LDD） HEMT. The fluoride-based plasma treatment using CF4 gas is performed on the drain-side of the gate edge. The channel two-dimensional electron gas （2DEG） concentrations are modulated by fluoride plasma treatment, and the peak electric field at the gate edge is effectively reduced, so the breakdown voltage is improved. The electric field distributions of the LDD-HEMTs are simulated using the Silvaco software, and the peak of the electric field on the gate edge is effectively reduced. Experimental results show that, compared with the conventional HEMT, LDD-HEMTs have a lower reverse leakage current of the gate, and the breakdown voltage is increased by 36%. The current collapse characteristics of the LDD-HEMTs are confirmed by dual-pulse measurement, and an obvious pulse current reduction is due to the surface states by implanting F ions between the gate and the drain.     

溶胶凝胶法制备高性能锆铝氧化物作为绝缘层的薄膜晶体管

本文采用溶胶凝胶法制备了锆掺杂铝氧化物(锆铝氧化物)和铪铟锌氧化物薄膜,并用于制造薄膜晶体管的绝缘层和有源层.锆铝氧化物绝缘层具有较高的介电常数,其相对介电常数为19.67,且薄膜表面光滑,致密,其表面粗糙度仅为0.31 nm.获得的薄膜晶体管具备良好的器件性能,当器件宽长比为5时,器件的饱和迁移率为21.3 cm2/V·s,阈值电压为0.3 V,开关比可以达到4.3×107,亚阈值摆幅仅有0.32 V/dec.     

高迁移率聚合物薄膜晶体管

以高掺杂Si单晶片作为栅电极, 热生长SiO₂作为栅介质层, 聚三己基噻吩薄膜作为半导体活性层, Au作为源、漏电极, 并采用十八烷基三氯硅烷（OTS）对栅介质表面改性, 在空气环境下成功地制备出高性能聚合物薄膜晶体管. 结果表明, 通过采用OTS对栅介质层表面修饰大幅度地改善了聚合物薄膜晶体管的电性能, 器件的场效应迁移率高达0.02 cm²/（Vs）, 开关电流比大于10⁵. 关键词： 聚合物薄膜晶体管 聚三己基噻吩 场效应迁移率 表面修饰     

衬底对PTCDA薄膜结构与电荷输运特性的影响

在不同导电衬底(Au,Al和ITO)上制备了PTCDA薄膜,用XRD和AFM技术研究了PTCDA薄膜的结构和表面形貌。结果表明,薄膜中的大部分PTCDA分子平面与衬底不平行,这表明薄膜垂直方向的电流传导将以电子传输为主;在ITO和Au衬底上生长的PTCDA薄膜晶粒排列规则,在薄膜垂直方向呈现出较好的电子传输性能;而在Al衬底上生长的PTCDA薄膜晶粒排列无序,电子传输性能差。通过制备单层结构有机薄膜器件,研究了PTCDA薄膜垂直方向的电子迁移率。综合应用金属-有机界面的热电子发射理论和有机层体内空间电荷限制传导理论,并考虑电场强度对迁移率变化的影响,对ITO/PTCDA/Al器件的电流密度-电压曲线进行拟合,得到ITO衬底上生长的PTCDA薄膜在垂直方向随电场强度变化的电子迁移率数值。