热漫散射贡献的高能电子衍射吸收结构因子的Doyle—Turner解析表达

给出了一种数值计算高能电子衍射吸收结构因子的方法，并利用模拟退火结合保温相变以及线性最小二乘拟合等算法，对所计算的吸收结构因子数值进行了含１０个参数的Ｄｏｙｌｅ－Ｔｕｒｎｅｒ解析表述的拟合，作为示例，给出Ｂｅ，Ａｌ，Ａｓ，Ａｇ，Ａｕ等５个元素的拟合结果和精度，并作出Ａｌ的绝对偏差量和相对偏差量曲线。     

电子与原子、离子碰撞过程的相对论效应

在玻恩近似下,建立了高能电子与原子、离于非弹性碰撞过程的相对论性理论计算方法,并以类Li等电子系列为例,阐明了电子与原子、离子非弹性碰撞过程的相对论效应.它包括:1.靶原子的相对论效应,它随原子序数的增加而增大.低z靶(如Li)的相对论效应可以忽略;对Au~(+76)靶的2_3—3p跃迁,广义振子强度相对论性计算值比相应的非相对论性值小27.1%.2.入射电子的相对论效应,它随入射电子能量的增加而增大.对高能入射电子,在特殊角度,要考虑广义振子强度横场项对微分截面的影响.在极端相对论情况下,如入射电子动能 关键词：     

Thermal Rate Constants of the N（^4S）＋O2（X^3∑g^-） → NO（X^2Ⅱ） ＋O（^3P） Reaction on the ^2A′ Potential Energy Surface

A quasiclassical trajectory study with the sixth-order explicit symplectic algorithm for the N（^4S）＋O2（X^3∑g^-） → NO（X^2Ⅱ） ＋O（^3P） reaction has been reported by employing a new ground potential energy surface. We have discussed the influence of the relative translational energy, the vibrational and rotational levels of O2 molecules on the total reaction cross section. Thermal rate constants at temperatures 300, 600, and 1000 K determined in this work for the reaction are 4.4 × 10^7, 1.8 × 10^10, and 3.1 × 10^11 cm^3mol^-1s^-1, respectively. It is found that they are in better agreement with the experimental data than previous theoretical values.     

Effect of Hydrogen Implantation on SIMOX SOI Materials

Hydrogen ions were implanted into separation by implantation of oxygen (SIMOX) silicon-on-insulator (SOI) wafers near the oxygen-implantation-induced damage peak under different conditions of energy and dose. It was found that the implanted hydrogen ions not only accelerate the diffusion of oxygen atoms from the annealing ambience into the wafer but also cause an outward diffusion of oxygen atoms in the buried oxide (BOX) layer. Thus, greatly broadened buried oxygen-rich (BOR) layers were formed in our experiments, which are 18%-79% broader than the BOX layer of standard SIMOX SOI wafers under the same conditions of oxygen implantation. The mechanism was discussed. A potential low cost method to fabricate SIMOX SOI wafers is proposed.     

Yb:FAP和Yb:C3S2-FAP晶体光谱的温度特性和选择激发

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Sn+1(1)内凸超曲面为边界的区域的第一特征值估计

M是Sn+1(1)内紧致嵌入凸超曲面.M分Sn+1(1)为两个连通区域Ω1和Ω2. Ω1=M和Ω1是凸的.本文估计了Ω1的Laplace算子的第一特征值的下界.     

函数模拟法求解锥形模超塑挤压的力学场——超塑挤压解析理论之一

本文首次用模拟位移函数的方法,给出锥形模超塑挤压力学场的解析式以及应变、应变速率和应力的约束方程。由于实验选用的是典型超塑性合金ZnAl₅,所以结果有相当的包络性。即使对于非典型超塑性材料,这种方法亦有普遍意义。     

Influences of Thalliation on the Morphology and Critical Temperature of Tl2Ba2CaCu2O8 Thin Films

Tl2Ba2CaCu2Ox(Tl-2212) thin films were prepared by the two-step technique.A precursor film was first prepared by the pulsed laser deposition method,and then experienced the incorporation of thalliation in a one-step or two-step annealing process.The experimental results show that the two-step annealing process produces dense and smooth films,and that the one-step annealing process produces a high critical temperature film of 101K,but the transition width is wide.Precursor films with homogeneous Ba2Ca1.3Cu2.1Ox composition are essential for producing high-quality Tl-2212 films.