Enhanced Photoluminescence of InGaN/GaN Green Light-Emitting Diodes Grown on Patterned Sapphire Substrate

Green InGaN/GaN based light-emitting diodes （LEDs） are fabricated both on planar and wet-etched patterned sapphire substrates by metalorganic vapour phase epitaxy （MOVPE）. Their photoluminescence （PL） properties of the two samples are studied. The results indicate that the PL integral intensity of the green LED on the patterned substrate is nearly two times of that on the planar one within the whole measured temperature range. The enhanced PL intensity in the green LED on the patterned substrate is shown completely contributed from the extraction efficiency, but not from the internal quantum efficiency. The conclusion is supported by temperature-dependent PL analysis on the two samples, and the mechanisms axe discussed.     

Generation of a Sub-10fs Laser Pulse by a Ring Oscillator with a High Repetition Rate

A compact femtosecond Ti：sapphire ring oscillator composed of chirped mirrors is designed. By accurately optimizing the intra-cavity dispersion and the mode locking range of the ring configuration, we generate laser pulses as short as 7.7fs with a repetition rate as high as 745 MHz. The spectrum spans from 660nm to 94Ohm and the average output power is 480mW under the cw pump laser of 7.5 W.     

Effect of Different Substrate Temperature on Phosphorus-Doped ZnO Thin Films Prepared by PLD on Sapphire Substrates

Phosphorus-doped ZnO （ZnO：P） thin films are deposited on a c-plane sapphire in oxygen at 350℃, 450℃, 550℃ and 650℃, respectively, by pulsed laser deposition （PLD）, then all the ZnO：P samples are annealed at 650℃ in oxygen with a pressure of 1 × 10^5 Pa. X-ray diffraction measurements indicate that the crystalline quality of the ZnO：P thin films is improved with the increasing substrate temperature from 350℃ to 550℃. With a further increase of the deposition temperature, the crystalline quality of the ZnO：P sample is degraded. The measurements of low-temperature photoluminescence spectra demonstrate that the samples deposited at the substrate temperatures of 350℃ and 450℃ show a strong acceptor-bound exciton （A^0X） emission. The electrical properties of ZnO：P films strongly depend on the deposition temperature. The ZnO：P samples deposited at 350℃ and 450℃ exhibit p-type conductivity. The p-type ZnO：P film deposited at 450℃ shows a resistivity of 1.846Ω·cm and a relatively high hole concentration of 5.100 × 10^17 cm^-3 at room temperature.     

退火对ZnO薄膜质量的影响

用金属有机化学气相沉积法（MOCVD）在蓝宝石（0001）衬底上制备了c轴取向的高质量的ZnO薄膜,通过在生长温度下氧气和氮气中退火处理的比较,研究了退火对ZnO薄膜结构和发光特性的影响。通过X射线衍射测量得知,经过氮气和氧气退火都可以使其002峰增强,且在氧退火中表现得尤为明显。光致发光测量发现氮气中退火的ZnO薄膜的紫外发光峰明显增强,而深能级发光峰明显减弱;而氧气中退火的ZnO薄膜的紫外发光峰略有减弱,而深能级峰显著增强。     

GaN微米片的制备及性能研究

通过采用化学气相沉积法(CVD),以金属Ga和NH3为原料,在Si (100)衬底和蓝宝石衬底上采用催化剂Ni合成了GaN微米片.利用X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)、X-ray能谱仪(EDS)、光致发光谱(PL)和霍尔效应测试仪(HMS-3000)对样品进行表征.结果表明,生成的微米片为六方纤锌矿结构的GaN;样品在360 nm处有一近带边紫外发射峰,在676 nm处有一个因缺陷引起的弱的红光发射峰;不同衬底上产物GaN的电学性能有所不同.最后,对本实验所得的GaN微米片的形成机理进行了分析.     

μ-PD法蓝宝石纤维晶体生长中传热传质的数值模拟

在μ-PD法纤维蓝宝石单晶生长中,利用Comsol软件数值分析了陶瓷管开裂现象、熔体对流和磁场分布.结果表明,试验中陶瓷管保温层总是在距底部0.03 m处断裂,数值模拟发现该处为温度和Von Mises应力最高点位置,验证了数值模拟的准确性;适当增大陶瓷管保温层厚度有利于降低陶瓷管温度,从而降低其开裂概率;熔体对流中Marangoni对流占主导,浮力对流可忽略;磁场分布能够满足μ-PD法蓝宝石晶体生长需求,“趋肤效应”使最高温度位于铱坩埚最上端.     

The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition

In situ optical reflectivity measurements are employed to monitor the GaN epilayer growth process above a low-temperature GaN buffer layer on a c-plane sapphire substrate by metalorganic chemical vapour deposition. It is found that the lateral growth of the GaN islands and their coalescence are promoted in the initial growth stage if optimized nitridation time and temperature are selected when the substrate is pre-exposed to ammonia. As confirmed by atomic force microscopy observations, the quality of the GaN epilayers is closely dependent on the surface morphology of the nitridated buffer layer, especially grain size and nucleation density.     

蓝宝石晶体生长过程中粘锅现象的实验研究

采用泡生法生长蓝宝石晶体的过程中,经常遇到粘锅问题.通过不同炉次的实验研究,分别分析了放肩阶段、等径生长阶段、收尾阶段等生长过程中产生粘锅的原因.指出温场的对称性是消除粘锅现象的最重要方式之一.同时,在放肩结束段及收尾阶段,为避免粘锅,可采用适当增大拉速及增加功率的措施.     

热屏结构对泡生法蓝宝石单晶炉功率影响研究

蓝宝石晶体因优异的综合性能被广泛用于航空航天等高性能要求领域.泡生法是目前生产大直径蓝宝石单晶的主要方法,热场对生产工艺、产品质量和单晶炉功率具有重要影响;并将影响生产成本.本文对氧化锆及钼金属组合式热屏中氧化锆材料内置、外置及材料不同组合方式对泡生法蓝宝石单晶炉功率的影响进行研究,得到合理的热场结构;并与实际生产结果进行验证.结果表明:相比于传统的15层钼保温结构,加入氧化锆保温层会明显降低单晶炉能耗,其中氧化锆内置的热场结构对单晶炉能耗降低影响更为明显;随着氧化锆层由0增加至15层,单晶炉能耗显著降低,相比传统15层钼保温结构,15层氧化锆保温结构炉体功率降低了38;.     

飞秒激光加工蓝宝石超衍射纳米结构

蓝宝石具有超强硬度及耐腐蚀、耐高温、在紫外-红外波段具有良好的透光性等优点,在军工业以及医疗器械方面具有广泛的应用前景.然而这些优点又对蓝宝石的机械加工或化学腐蚀加工带来困难.飞秒激光脉冲具有热损伤小、加工分辨率高、材料选择广等特点,被广泛应用于固体材料改性和高精度三维微纳器件加工.本文提出了利用飞秒激光多光子吸收特性在蓝宝石表面实现超越光学衍射极限的精细加工.利用聚焦后的波长为343 nm的飞秒激光,配合高精密三维压电位移台,实现激光焦点和蓝宝石晶体的相对三维移动,在蓝宝石晶体衬底上进行精确扫描,得到了线宽约61 nm的纳米线,纳米线间的最小间距达到142 nm左右.利用等离子体模型解释了加工得到的纳米条纹的产生原因,研究了激光功率、扫描速度对加工分辨率的影响.最终本工作实现了超越光学衍射极限的加工精度,为实现利用飞秒激光对高硬度材料的微纳结构制备提供了参考.