高择优取向Mo薄膜的直流磁控溅射制备及其电学性能

使用直流磁控溅射法在玻璃基底上沉积Mo薄膜,采用X射线衍射仪、原子力显微镜和四探针测试系统研究了溅射工艺对Mo薄膜的结构、形貌和电学性能的影响.结果表明:当基片温度为150 ℃时,薄膜获得(211)晶面择优取向生长,而在低于250 ℃的其它温度条件下,样品则表现为(110)晶面择优取向生长.进一步的表面形貌分析显示:薄膜的粗糙度随基片温度变化不明显,其值大约为0.35 nm,随溅射功率密度的增大而变大|电学性能方面:随着溅射功率密度的升高,薄膜导电性能迅速增强,电阻率呈现近似指数函数衰减|随着基底温度的升高,薄膜的电阻率先减小后增大,当基底温度为150 ℃时,薄膜电阻率降低至最小值2.02×10-5 Ω·cm.     

Sputtering pressure influence on growth morphology,surface roughness,and electrical resistivity for strong anisotropy beryllium film

The strong anisotropy beryllium （Be） films are fabricated at different sputtering pressures by direct current magnetron sputtering. With the increase of pressure, the deposition rate of Be film first increases, and when the pressure exceeds 0.8 Pa, it gradually descends. The X-ray diffraction analysis indicates that Be film is of α-Be phase, its surface always reveals the （101） crystal plane possessing the low surface energy. As for the growth morphology of Be film, the surface is mainly characterized by the fibrous grains, while the cross section shows a transition from a columnar grain to a mixed grain consisting of a cone-shaped grain and a columnar grain as the sputtering pressure increases. The large grain fraction decays exponentially from 75.0% to 59.3% with the increase of sputtering pressure p, which can improve the grain size uniformity. The surface roughness increases due to the insufficient atom diffusion, which is comparable to its decrease due to the etching effect at p 〈 0.8 Pa, while it increases drastically at p 〉 0.8 Pa, and this increase is dominated by the atom diffusion. The electrical resistivity values of Be films range from 1.7 μΩ m to 2.7 μΩ m in the range 0.4 Pa-1.2 Pa, which is 50 times larger than the bulk resistivity.     

螺旋形超导带材的直流冲击实验研究

基于超导直流电缆应用,针对第二代高温超导带材Re BCO开展了直流冲击实验。首先,通过改变冲击条件(冲击电流大小和持续时间)得到带材的耐直流冲击特性,确定可保证带材性能完好的最大冲击电流幅值(安全电流)及其相应冲击时间。随后,针对实际电缆中超导带材是以螺旋形态缠绕于支撑管上,设计实验研究超导带材螺旋角和螺旋直径对其临界电流和耐冲击特性的影响规律,发现带材所能承受的最大冲击电流幅值随冲击作用时长的增加而逐渐下降、过大的螺旋角和过小的螺旋直径均会对带材造成损伤,影响其通流能力。上述研究结果为电缆的后续设计和制造提供了必要的参考依据。     

Nano-Crystalline Diamond Films with Pineapple-Like Morphology Grown by the DC Arcjet vapor Deposition Method

A nano-crystlline diamond film is grown by the dc arcjet chemical vapor deposition method. The film is characterized by scanning electron microscopy, high-resolution transmission electron microscopy （HRTEM）, x-ray diffraction （XRD） and Ftaman spectra, respectively. The nanocrystalline grains are averagely with 80hm in the size measured by XRD, and further proven by Raman and HRTEM. The observed novel morphology of the growth surface, pineapple-like morphology, is constructed by cubo-octahedral growth zones with a smooth faceted top surface and coarse side surfaces. The as-grown film possesses （100） dominant surface containing a little amorphous sp2 component, which is far different from the nano-crystalline film with the usual cauliflower-like morphology.     

中国聚变工程实验堆大功率混合直流开关概念设计

中国聚变工程实验堆中的超导线圈失超保护开关要求的额定参数达到了10 kV/±100 kA,针对该运行参数提出了一种混合式直流开关。承担稳态通流的机械开关采用了三级触头结构,可以降低固态开关的通流时间。双向固态开关的阀串采用二极管桥与IGBT组合的形式,结温分析证明可以提高器件的流通电流限制,并对该基本单元拓扑进行了大电流开断实验,验证了该设计的可行性。     

Nitriding molybdenum： Effects of duration and fill gas pressure when using lO0-Hz pulse DC discharge technique

Molybdenum is nitrided by a 100-Hz pulsed DC glow discharge technique for various time durations and fill gas pressures to study the effects on the surface properties of molybdenum. X-ray diffractometry （XRD）, scanning electron microscopy （SEM）, and atomic force microscopy （AFM） are used for the structural and morphological analysis of the nitrided layers. Vickers＇ microhardness tester is utilized to investigate surface microhardness. Phase analysis shows the formation of more molybdenum nitride molecules for longer nitriding durations at fill gas pressures of 2 mbar and 3 mbar （1 bar = 105 Pa）. A considerable increase in surface microhardness （approximately by a factor of 2） is observed for longer duration （10 h） and 2-mbar pressure. Longer duration （10 h） and 2-mbar fill gas pressure favors the formation of homogeneous, smooth, hard layers by the incorporation of more nitrogen.     

直流电弧等离子体喷射化学气相沉积高质量金刚石膜残余应力分布的拉曼谱分析

不同工艺条件下在钼衬底(φ60mrn)上用100kW直流电弧等离子体喷射化学气相沉积设备进行金刚石膜的制备。金刚石膜用扫描电镜(SEM)、拉曼谱(激光激发波长为488m)和X射线衍射来表征。研究结果表明，在直流电弧等离子体喷射化学气相沉积金刚石膜的过程中，内应力大小从金刚石膜的中央到边缘是增加的，并且应力形式是压应力。这说明了在金刚石膜中存在明显的应力不均。甲烷浓度和衬底温度都影响金刚石膜中的内应力。随着甲烷浓度和衬底温度的提高，金刚石膜中的内应力呈增加的趋势。     

砷化镓光阴极直流高压注入器研究进展

主要介绍自由电子激光相干强太赫兹源（FEL-THz）装置上的砷化镓光阴极直流高压注入器的研究进展,并讨论其驱动未来高重复频率短波长自由电子激光器的差距。通过综合砷化镓阴极寿命的三大影响因素,提出了其工作寿命的定性物理模型;通过该模型对阴极和注入器进行优化,在直流高压电子枪上得到了5 mA, 32 min的连续稳定输出;测量了电子束在4.8 mA下归一化发射度约为4.0 mmmrad,阴极热发射度约为0.6 mmmrad,电子束本征横向能量约为92 meV,250 keV电子束在距离阴极90.6 cm处纵向均方根长度约为11.5 ps。这一束流状态已经基本满足FEL-THz需求。     

直流等离子体炬放电特性研究

对于磁约束直流等离子体炬,用氩－氢等离子体的放电体系,研究了等离子体炬几何结构、真空室气压、弧电流、外磁场与比变化等对等离子体炬放电特性的影响。得到了影响等离子体炬宏观和微观参数变化的一些基本规律。     

微波复合直流等离子体转化天然气制乙炔的研究

利用微波复合直流等离子体对天然气转化制乙炔反应进行了研究. 考察了氢烷比、气体流量、功率等参数对装置的能量利用率以及天然气转化反应的影响, 并考核了微波复合直流等离子体转化天然气制乙炔工艺的稳定性. 实验结果表明: 微波复合直流等离子体装置的能量利用率随等离子体工作气体的流量的增加而提高; 由于微波的作用使传统直流柱状等离子体分化为多根丝状等离子体, 从而使得电极的烧蚀方式由传统的点烧蚀变为面烧蚀, 并大幅度提高等离子体转化天然气工艺的稳定性和电极寿命; 甲烷的转化率和乙炔的收率随功率的增加而提高, 随CH₄/H₂比和气体流量的增加而降低, 在氢烷比为0.9、总气体流量为760 L/min、微波源输出电功率6 kW、直流电源输出功率90 kW时, 甲烷转化率可达84.4%, 乙炔选择性为75.6%, 乙炔收率为63.8%, 乙炔能耗达10.8 kWh•kg^－1; 电极寿命超过200 h.