Nonlocality Property of Three—Mode Correlated Fields

Four three-mode correlated states are generated by two beam splitters.We show that,by means of parity measurement,those light fields exhibit the nonlocality represented by the violation of the Bell inequality.The conditions fo the maximum violation are also studied.     

Robust adaptive matched field processing with sector eigenvector constraints

Standard adaptive beamforming or matched field processing requires accurate replica fields finely gridded over the search parameter space for localization with sidelobe control. This paper presents an Adaptive Matched Field Processing (AMFP) algorithm, which aims at gaining robustness for the environmental mismatch, and simultaneously reducing the real-time computational load. The new method integrates the merits of several AMFP beam-formers with neighboring location constraints, environmental perturbation constraints and sector focusing constraints. The robustness and effectiveness of the suggested algorithm has been illustrated through the numerical simulation and the experimental Mediterranean benchmark shallow-water data.     

The Casimir effect of Reissner-NordstrSm black hole

The stress tensor of a massless scalar field satisfying a mixed boundary condition in a （1 ＋ 1）-dimensional Reissner- Nordstrom black hole background is calculated by using Wald＇s axiom. We find that Dirichlet stress tensor and Neumann stress tensor can be deduced by changing the coefficients of the stress tensor calculated under a mixed boundary condition. The stress tensors satisfying Dirichlet and Neumann boundary conditions are discussed. In addition, we also find that the stress tensor in conformal flat spacetime background differs from that in flat spacetime only by a constant.     

格子点上列完全马氏场的刻划

对于格子点上的马氏规范我们引入“转移律”的概念,并证明了列完全马氏场与转移律之间存在一一对应关系。     

散斑条纹的快速高精度处理技术

本文提出一种快速高精度散斑杨氏条纹(斑纹)场处理方法——同态阀值滤波法。用它实现了散斑场条纹的快速、逐点连续高精度处理。     

超大规模集成电路光学光刻技术的现状与展望

光学光刻是目前超大规模集成电路(VLSI)制备中主要的微米和亚微米的图形加工技术,这一技术将继续保持其主导地位成为90年代VLSI发展的关键。本文综述了近年来光学光刻工艺的发展,主要介绍了G线(436nm)、Ⅰ线(365nm)和准分子激光光刻的现状,并对实现高的光学光刻分辨率所必须解决的透镜设计、套准精度和像场面积等问题作了详细描述。最后展望了发展方向、     

A New Holographic Entropy Bound from Conformal Field Theory at the Killing Horizon

A new holographic entropy bound is obtained by using conformal field theory at the Killing horizon.The entropy bound is tighter than the well-known bounds,such as the Bekenstein,Bekenstein-Mayo and‘t Hooft bounds.The result shows that the entropy of a system decreases when quantum effects are included.Therefore,the quantum effect will increase the degree of order of the system.     

重建吸收介质参数(ρ(3),α(3))(英)

本文考虑重建吸收介质的密度ρ（3）和吸收系数α（3）的双参数反演问题。通过波动方程特征积分的方法并引人辅助函数，我们得到了原反问题的一个等价的封闭的积分方程组。利用本文的反演方法，ρ（3）tα（3）可以由反射数据f（t）和透射数据g（t）在深度变量子下同时恢复出来。     

电子直线加速器束流均方根发射度变化方程

本文导出了考虑外场和束流效应后束流均方根发射度平方变化方程的一般表达式,并就仅考虑外场,仅考虑空间电荷场和仅考虑尾场等三种特殊情况进行了分析。