薄膜界面粗糙对双晶摇摆曲线的影响

用X射线衍射动力学理论,模拟计算InP衬底上InGaAs/AllnAs超晶格和InGaAs单层膜的X射线双晶摇摆曲线,计算结果表明:薄膜界面粗糙对单层膜的衍射峰和超晶格的零级衍射峰影响较小,但却明显影响单层膜衍射干涉条纹和超晶格的±1级卫星峰,随着平均界面粗糙度的增大,单层膜衍射干涉条纹强度减弱并趋于消失;超晶格的±1级卫星峰变弱并逐渐展宽,理论计算的模拟双晶摇摆曲线与超晶格实验曲线比较表明:高质量匹配In_0.53Ga_0.47As(85?)/Al_{0.4 关键词：}     

对称半导体光放大器马赫—曾德尔干涉仪解复用器的开关特性分析

分析以以半导体光放大器（SOA）为基础的对称马赫－曾德尔干涉仪（MZI）解复用器在控制脉冲和信号脉冲反向传播（CPMZ）与同向传播（TPMZ）两种工作模式下的开关特性。研究表明：控制脉冲宽度、半导体光放大器的长度和非线性增益压缩影响着控制脉冲和信号脉冲反向传播开关窗口的大小，是限制控制脉冲和信号脉冲反向传播高速工作的主要因素。当控制脉冲宽度小于半导体光放大器的渡越时间时，如时延量小于于两位的半导体光放大器渡越时间，控制脉冲和信号脉冲以向传播的峰值开关比开始恶化；当控制脉冲宽度超过半导体光放大器的渡越时间时，即使时延量大于两倍的半导体光放大器滤越时间，峰值开关比也出现恶化。因此当控制脉冲和信号脉冲反向传播高速工作时，控制脉冲应尽可能窄，且时延量必须大于两倍的半导体光放大器渡越时间以确保有较高的峰值开关比，而半导体光放大器长度效应对控制脉冲和信号脉冲同向传播的影响甚微。     

CdZnTe核探测器的蒙特卡罗模拟的初步研究

以CdZnTe核探测器的工作原理为依据,探测器内反应的随机性和反应产生的电子空穴对数目的统计规律为物理模型,应用Visual C + + 自行编制了蒙特卡罗模拟软件.模拟了γ射线在CdZnTe探测器中的响应能谱,并将模拟结果与实际器件的测试结果进行了比较讨论.模拟能谱与实际测得的能谱的主峰符合较好.此外,通过分析⁵⁷Co源辐照下探测效率与器件厚度的关系,可以推测探测效率达到最大时所对应CdZnTe探测器的理想厚度     

Preparation and Optical Properties of SnO2／SiO2 Nanocomposite

SnO2/SiO2 nanocomposites have been prepared by the soaking-thermal-decomposing method, tin oxide nanoparticles are uniformly dispersed in the mesopores of silica. The optical absorption edge of the obtained nanocomposite presents a redshift compared with bulk tin oxide, With the increasing annealing temperature during the procedure of the sample preparation, the optical absorption edge of the sample moves to shorter wavelength (blueshift). These optical properties can be ascribed to the amorphous structure and band defects of surface layers of the tin oxide nanoparticles.     

Field Emission from Silicon Nanocrystallite Films with Compact Alignment and Uniform Orientation

Patterned silicon nanocrystallite (SINC) films were fabricated on (100) orientation p-type boron-doped sificon wafer by the hydrogen ion implantation technique and the anodic etching method. The efficient field emission with low turn-on field of about 3.5V/μm at current density of 0.1μA/cm^2 was obtained. The emission current density from the SiNC films reached 1mA/cm^2 under a bias field of about 9.1V/μm. The experimental results demonstrate that there are great potential applications of the SiNC films for fiat panel displays. A surface treatment with hydrogen plasma was performed on the SiNC films and a significant improvement of emission properties was achieved.     

一类退化半导体方程弱解存在性的研究

文章研究了当■(s)=sm(m>1),b(s)=s2和初值为u0,v0∈L 2(Ω)时一类退化半导体方程弱解的存在性．文章首先将原问题正则化,然后对正则化问题在L 2(Ω)空间上做出了有界估计,最后利用收敛性得到了问题的结论．     

用等离子体治疗牙病

等离子体清洗经常使用在材料处理和半导体工业上，虽然等离子体也可以快速地消灭细菌，但由于它们都处于高温状态，所以一直无法应用到生物医学领域．三年前，荷兰Eindhoven大学的一些物理学家发展了一种可在室温下工作的“等离子体针”。     

中科院完成返回式卫星搭载实验

近日，中科院物理所和金属所合作，共同参与搭载我国第22颗返回式卫星进行空间微重力实验。在空间微重力环境下，观察了银基合金和半导体化合物熔滴形貌变化、液／固界面的润湿过程及熔滴凝固前后接触角的差异，研究了液／固界面反应及特性表征，并成功地完成了近距离摄像机、有视窗加热炉等硬件的研制，取得了预定结果。     

A Novel Contactless Method for Characterization of Semiconductors：Surface Electron Bean Induced Voltage in Scanning Electron Microscopy

We present a novel contactless and nondestructive method called the surface electron beam induced voltage (SEBIV) method for characterizing semiconductor materials and devices.The SEBIV method is based on the detection of the surface potential induced by electron beams of scanning electron microscopy (SEM).The core part of the SEBIV detection set-up is a circular metal detector placed above the sample surface.The capacitance between the circular detector and whole surface of the sample is estimated to be about 0.64pf.It is large enough for the detection of the induced surface potential.The irradiation mode of electron beam (e-beam) influences the signal generation When the e-beam irradiates on the surface of semiconductors continuously,a differential signal is obtained.The real distribution of surface potentials can be obtained when a pulsed e-beam with a fixed frequency is used for irradiation and a lock-in amplifier is employed for detection.The polarity of induced potential depends on the structure of potential barriers and surface states of samples.The contrast of SEBIV images in SEM changes with irradiation time and e-beam intensity.     

化合物半导体-绝缘体界面的界面态(续)

 三、界面态连续体的动态响应和分布多年来的大量研究结果表明把界面态处理为局域在半导体界面平面处的经典理论完全不能够解释化合物半导体-绝缘体界面的行为特点,从而使人们逐渐认识到界面态的空间分布特征.图3为半导体界面的能带结构示意图.在实际的I-S界面上,界面态是在绝缘体-半导体界面附近,在能量上和空间上的连续分布体(如图中点所示). 这里以n型半导体为例,通过绝缘体中的界面态对电子的捕获和发射过程说明界面态动态响应的特点.由于势垒△Ec的存在,空间分布的界面态与电子的作用只能依介量子力学的隧道效应得以进行.