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61.
买买提吐送.买买提明 《应用声学》2013,32(4):325-封三
对不同厚度液体进行光强测量,深入探索空化气泡的运动,研究发光机理很有意义。用超声激励法在磷酸液体中实现多泡声致发光,研究不同共振频率下发光的特点。利用光电倍增管多次测量发光强度相互比较,结果是在液体厚度10 cm、驱动频率f=21.061kHz和f=20.316kHz时,周期性较好为50μs,液体通过漩涡集中气泡可以使更多气泡发光;在液体厚度3 mm、驱动频率f=17.91kHz和f=19kHz时,周期性很好为25μs;且光信号都较强。结论是磷酸中声致发光强度、周期与液体厚度、驱动频率密切相关。本文以磷酸液多泡声致发光实验研究为基础,从内部和外部原理来出发,详细介绍了光电倍增管在多泡声致发光光强测量中的实用,为今后研究者提供了一些经验。根据实验过程中遇到的一些实际问题提出了建议和改善意见。 相似文献
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Preliminary results for the design,fabrication,and performance of a backside-illuminated avalanche drift detector 下载免费PDF全文
The detection of low-level light is a key technology in various experimental scientific studies. As a photon detector, the silicon photomultiplier (SiPM) has gradually become an alternative to the photomultiplier tube (PMT) in many applications in high-energy physics, astroparticle physics, and medical imaging because of its high photon detection efficiency (PDE), good resolution for single-photon detection, insensitivity to magnetic field, low operating voltage, compactness, and low cost. However, primarily because of the geometric fill factor, the PDE of most SiPMs is not very high; in particular, for those SiPMs with a high density of micro cells, the effective area is small, and the bandwidth of the light response is narrow. As a building block of the SiPM, the concept of the backside-illuminated avalanche drift detector (ADD) was first proposed by the Max Planck Institute of Germany eight years ago; the ADD is promising to have high PDE over the full energy range of optical photons, even ultraviolet light and X-ray light, and because the avalanche multiplication region is very small, the ADD is beneficial for the fabrication of large-area SiPMs. However, because of difficulties in design and fabrication, no significant progress had been made, and the concept had not yet been verified. In this paper, preliminary results in the design, fabrication, and performance of a backside-illuminated ADD are reported; the difficulties in and limitations to the backside-illuminated ADD are analyzed. 相似文献
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Photoelectrical response characteristics of epitaxial graphene (EG) films on Si- and C-terminated 6H-SiC, and transferred chemical vapor deposition (CVD) graphene films on Si-terminated 6H-SiC have been investigated. The results show that upon illumination by a xenon lamp, the photocurrent of EG grown on Si-terminated SiC significantly increases by 147.6%, while the photocurrents of EG grown on C-terminated SiC, and transferred CVD graphene on Si-terminated SiC slightly decrease by 0.5% and 2.7%, respectively. The interfacial buffer layer between EG and Si-terminated 6H-SiC is responsible for the significant photoelectrical response of EG. Its strong photoelectrical response makes it promising for optoelectronic applications. 相似文献
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