大焦深成像系统仿真实验研究

如何增大非相干光学成像系统的焦深是应用光学研究领域的热点问题.本文对采用高次非球面光学掩模板与图像处理相结合增大成像光学系统焦深的新方法进行了深入分析,建立了大焦深成像系统仿真实验模型,并进行了大焦深成像系统仿真实验.实验结果证明了该方法在维持原相对孔径的同时使光学系统在较大的离焦范围内有好的成像质量.实际应用中还要综合考虑模板参量、信噪比等关键因素.     

用于近场集成光学头微透镜器件的灰度掩模技术

讨论了制作适用于近场集成光学头中的凸形、凹形微透镜和折衍射复合微透镜的灰度掩模技术。定性地给出了与几种典型的凸形、凹形微透镜和折衍射复合微透镜对应的灰度掩模版的设计实例 ,以及将它应用于光刻操作的情况 ,为采用灰度掩模技术制作适用于近场集成光学头中的微透镜器件奠定了基础。灰度掩模技术在微透镜器件的制作方面具有重要的应用前景 ,有助于简化制备工艺 ,降低制作成本 ,优化微透镜阵列的结构参数。     

Stencil lithography of gold-black IR absorption coatings

Gold black coatings are deposited through a stencil shadow mask to produce infrared-absorbing patterns with sub-mm lateral dimensions. Such dimensions match the characteristic pitch of Long Wave Infrared (LWIR) array bolometers. Infrared spectral imaging with sub-micron spatial resolution reveals the spatial distribution of absorption across the pattern.     

Research on high-quality projecting reduction lithography system based on digital mask technique

In this paper, digital mask technique is presented, and a high-quality projecting reduction lithography system has been set up successfully. The core device of digital mask technique is digital micromirror device (DMD) which belongs to one of the electrically addressed spatial light modulators. The output image of DMD can be equivalent to a gray-scale mask of high precision, which can control the exposure precisely. If it is combined with a high-quality projecting reduction system, the fabrication of submicron diffractive optical elements can be realized successfully. The overall design of the system is described in detail, and some diffractive optical element masks are fabricated. Experimental results verify that the system is feasible. In the end, system characteristics and system error are summarized.     

光束发散度对紫外写入光纤光栅的影响

用傅里叶衍射光学分析了准分子激光束发散度对于光纤光栅制备的影响，发现光束发散角使光纤光栅的布拉格波长发生改变，相位版后干涉场沿光纤轴向和径向不均匀，对制备30dB高反射率光纤光栅造成困难。实验结果与理论分析基本一致，相对于理想平行光束情况，会聚光束使得光纤光栅布拉格波长出现在短波一边，发射光束使得光纤光栅布拉格波长出现在长波一边。     

短波FH／MFSK编码系统中部分频带单音阻塞的性能

研究了带反馈链路的选择式频率分集的短波信道ＦＨ／ＭＦＳＫ编码系统，在具有加性白高斯噪声（ＡＷＧＮ）的瑞利衰落信道中，存在部分频带单音阻塞时的性能，并给出了采用ＲＳ码、双－ｋ码、重发码时，无编码与有编码系统的码符差错率与比特能量噪声比的关系曲线．     

二元光学元件及其应用

叙述一种新型衍射光学元件──—二元光学元件的设计原理及其制造方法。分析二元光学元件的衍射效率和色差，讨论光刻法对其最小特征线宽的限制因素，阐明二无光学元件的特点及应用。     

An Accurate Characterization of CRT Monitor (I) Verifications of Past Studies and Clarifications of Gamma

CRT monitors are widely used to view images on the Internet. The color images on the computer graphic display can be printed out or displayed on other monitors through the Internet, and color matching between the original and the reproduction is very important. The color management systems (CMSs) are useful for the color matching. CMSs utilize device profiles, in which color characteristic information is stored, and these profiles are generated by device characterization. Thus, an accurate characterization of the monitor is essential for better color matching. CRT monitor characteristics can be described by the tone reproduction curves (TRCs) of each channel, and color additive matrix. In this paper, these characteristics were investigated from a physical point of view. Various kinds of flare and the interdependence among the channels were also investigated and verified. The definition of the term “gamma” is clarified, which is very often used to describe the TRC. Various definitions are compared and a new definition of S-γ is proposed.     

Surface analysis of ripple pattern on PS and PEN induced with ring‐shaped mask due to KrF laser treatment

The approach for ripple nanopattern construction on surface of two polymer substrates [polyethylene naphthalate (PEN) and polystyrene (PS)] exposed by a KrF pulse excimer UV laser through a contact lithographic mask with circular slit was proposed in this paper. Thin layer of gold was deposited on samples after the laser treatment. Changes in the morphology of the surface of both the shielded and exposed areas of the substrates, as well as the dimensions of the laser‐induced periodic surface structures, were determined (by atomic force microscopy, laser confocal microscopy and scanning electron microscopy), compared with observations and measurements made on samples treated directly (without a contact mask) under the same conditions. The morphology of the interface between the treated and untreated regions was also closely studied. Surface chemistry of treated samples was studied in detail by X‐ray Photoelectron Spectroscopy. The detailed study of surface chemistry of modified PEN and PS revealed a significant increase of oxygen concentration for laser treated PS and increase of carboxyl groups in case of PEN. The potential application of this research can be found in biotechnology, micro technology and several other fields. Copyright © 2016 John Wiley & Sons, Ltd.