Recent Advances on Bismuth-based 2223 and 2212 Superconductors: Synthesis,Chemical Properties,and Principal Applications

This article is focused on principal Bi-containing superconductors. Recent results obtained on Bi-2212, Bi-2223, and related composite materials are discussed. Special attention is paid to various advanced methods of synthesis. Optimization of the superconducting properties by the chemical modifications is considered in terms of most important practical applications.     

Growth,structural, spectral,optical and electrical properties of 2-aminophenol single crystals

Good quality single crystals of 2-aminophenol were grown by slow evaporation solution growth technique at room temperature. Crystal structure and crystalline nature was determined by X-ray diffraction studies. Prescence of functional groups in the crystal was confirmed by FT-IR analysis. UV transmittance study shows the large transmittance in the entire visible region. Dielectric constant and loss for the crystals were taken at different tempeature. Photoconductivity study exhibits positive nature of the grown crytal. DC conductivity studies were also carried out for the grown crystal.     

Growth,structure and physical properties of gadolinium doped Sr2IrO4 single crystal

A series of Gd-doped Sr₂IrO₄ single crystals were grown using a flux method. Analysis of the temperature-dependent resistance of these crystals reveals that these samples show two-dimensional weak localization at 150 to 300 K, while three-dimensional variable range hopping (VRH) behavior is observed at temperatures lower than 150 K. Two localization lengths are observed in the VRH behavior, with a transition temperature of around 88 K. Correspondingly, temperature-dependent magnetization observations along the ab-plane reveal magnetic anomalies at both 150 and 85 K. This work demonstrates the correlation between the electrical and magnetic properties of 5d transition-metal compounds.     

双靶磁控溅射聚焦共沉积AlN薄膜生长速率研究

采用直流双靶磁控溅射聚焦共沉积技术在Fe衬底上高速率生长A lN薄膜,结果表明,双靶共沉积技术有效地提高了A lN薄膜生长速率,相同工作气压或低N2浓度时双靶磁控溅射沉积速率约为单靶沉积速率的2倍;随着溅射系统内工作气压或N2浓度的升高,薄膜生长速率不断减小;薄膜择优取向与薄膜生长速率相互影响,随着工作气压的升高,(100)晶面的择优生长减缓了薄膜生长速率的降低,随着N2浓度的升高,(002)晶面的择优生长加剧了薄膜生长速率的降低,而相对较低的溅射沉积速率有利于(002)晶面择优取向生长。     

Resistivity distribution of silicon single crystals using codoping

Numerous studies including continuous Czochralski method and double crucible technique have been reported on the control of macroscopic axial resistivity distribution in bulk crystal growth. The simple codoping method for improving the productivity of silicon single-crystal growth by controlling axial specific resistivity distribution was proposed by Wang [Jpn. J. Appl. Phys. 43 (2004) 4079]. Wang [J. Crystal Growth 275 (2005) e73] demonstrated using numerical analysis and by experimental results that the axial specific resistivity distribution can be modified in melt growth of silicon crystals and relatively uniform profile is possible by B–P codoping method. In this work, the basic characteristic of 8 in silicon single crystal grown using codoping method is studied and whether proposed method has advantage for the silicon crystal growth is discussed.     

Czochralski法生长Lu2SiO5：Ce晶体的发光特性

本文使用铱坩埚感应加热Czochralski法成功地生长出了无色透明且尺寸达5 0mm× 6 0mm的Lu2 SiO5:Ce晶体。XRD结构分析表明 ,该晶体为单斜结构。在室温下分别以X射线和紫外光为激发源测量了该晶体的发射光谱 ,获得的发射波长分别为 4 0 3nm和 4 2 0nm ,光衰减时间为 4 1ns,光产额达 32 0 0 0p/MeV。发射光谱的双峰结构以及晶体的发光特性证明其发光源于Ce3 离子的 5d1→5F5/ 2 和 5d1→5F7/ 2 跃迁。     

Strong and stable red photoluminescence from porous silicon prepared by Fe-contaminated silicon

Strong red photoluminescence (PL) spectra appeared at porous silicon (PS) samples prepared by a chemical anodization of Fe-contaminated Si substrates. The Fe1000 sample with Fe contamination of 1000 ppb showed a ten times stronger red PL than that of the reference PS sample without any Fe contamination, and this sample also showed the higher thermal stability for PL spectra as compared with the reference PS sample. Furthermore, the PL intensity from the PS with Fe contamination is linearly proportional to the Fe-related trap concentrations of Si substrates obtained from DLTS. Especially, all the PS samples exhibit the same PL peak position regardless of Fe contamination concentrations, as compared with that of the reference PS. This means that there is no significant effect such as the variation of size distribution of nanocrystalline Si in PS layer formed on Fe-contaminated Si substrate. Based on the results of PL and DLTS, we found that the PL efficiency depends strongly on the Fe-related trap concentration in Si substrates.     

Surface growth mechanisms and structural faulting in the growth of large single and spherulitic titanosilicate ETS-4 crystals

Morphological, surface and crystallographic analyses of titanosilicate ETS-4 products, with diverse habits ranging from spherulitic particles composed of submicron crystallites to large single crystals, are presented. Pole figures revealed that crystal surfaces with a-, b- and c- axes corresponded to 110, 010 and 001 directions, respectively. Thus, technologically important 8-membered ring pores and titania chains in ETS-4 run along the b-axis of single crystals and terminate at the smallest crystal face. Height of the spiral growth steps observed on 1 0 0 and 0 0 1 surfaces corresponded to the interplanar spacings associated with their crystallographic orientation, and is equivalent to the thickness of building units that form the ETS-4 framework. Data suggest that the more viscous synthesis mixtures, with a large driving force for growth, increased the two- and three-dimensional nucleation, while limiting the transport of nutrients to the growth surface. These conditions increase the tendency for stacking fault formation on 1 0 0 surfaces and small angle branching, which eventually results in spherulitic growth. The growth of high quality ETS-4 single crystals (from less viscous synthesis mixtures) occurred at lower surface nucleation rates. Data suggest that these high quality, large crystals grew due to one-dimensional nucleation at spiral hillocks, and indicate that under these conditions un-faulted growth is preferred.     

结晶生长的化学键合理论

针对一般晶体的生长过程,在测定相应溶液(熔体)组成结构的基础上,我们引入了晶体生长过渡相区的概念,并采用键价模型来衡量生长过程中发生变化的化学键的键强度。过饱和溶液(熔体)中的生长单元经过生长过渡相区时,依据彼此之间弱的化学键合作用来微调其内部强的化学键,并以单个生长单元或者生长单元的简单连接体的形式键合进入晶格。在整个结晶生长过程中,生长单元之间弱的键合作用对整个结晶过程(生长速度、晶相的形成)起着决定性作用;同时,中等强度的化学键在生长过渡相区中的变化情况对晶体的最终形貌具有重要影响。