导弹目标单、双基地雷达散射截面对比分析

目标单、双基地雷达散射截面(RCS)反映了目标是否容易被单、双基地雷达检测到。目前缺乏单、双基地RCS对比的量化指标。首先定义了双基地RCS相对于单基地RCS的RCS增强因子和RCS增强率,然后应用该定义统计分析了某隐身目标和非隐身目标双基地RCS计算结果。结果显示：对隐身目标,RCS增强因子大,RCS增强率高,对于非隐身目标,其RCS增强因子显著下降,RCS增强率不高。结合指标含义,应用双基地RCS有助于隐身目标检测,而对非隐身目标效果并不明显,这与雷达界认识相一致。这也说明,应用上述两个指标进行单、双基地RCS对比分析是有效的。此外根据隐身目标在较窄双基地角范围内的双基地RCS分析结果,应用双基地角20°~40°范围内的双基地RCS即可提高对隐身目标的检测效果。     

Influence of Er-doped superfluorescent fiber source's spectrum-stability on the SNR of fiber optic gyroscopes

The output spectrum-stability of Er-doped superfluorescent fiber source (SFS) was measured by changing the temperature around the excited Er-doped fiber (EDF). With the experiment results, the influences of the SFS's spectrum-stability on the signal-to-noise ratio (SNR) of fiber optic gyroscope (FOG) were simulated. The simulated results demonstrate that the SNR of FOG will change no matter the power, mean wavelength or the spectral bandwidth of the light output from the Er-doped SFS is changing. The results show that the changing of SNR caused by the output power's variation is three orders of magnitude larger than that caused by the variation of mean wavelength or bandwidth. And the main factor influencing the stability of FOG's SNR is the temperature-stability of the output power of Er-doped SFS.     

高温超导电缆终端预制式应力锥的设计与分析

高温超导电缆终端是高温超导电缆系统的重要组成部分。借鉴常规电缆终端预制式应力锥的设计理论,结合高温超导带材的特殊工作特性,选用耐低温的绝缘材料,对高温超导电缆终端预制式应力锥进行设计。运用有限元分析软件ANSYS对设计的高温超导电缆终端预制式应力锥进行建模和仿真计算,得到终端处的电场和电位分布,并将仿真结果和理论计算结果进行对比分析,验证设计的可行性,为进一步的研究奠定了基础。     

强壮前沟藻的后向散射特性研究

基于2012年7月藻类培养实验期间的实测生物-光学数据,分析了强壮前沟藻的后向散射特性及其影响因素。结果表明,强壮前沟藻的后向散射系数值具有光谱变化性,并随叶绿素浓度的升高而增大,两者之间呈很好的幂函数关系,相关系数R2最小值可达0.96;此外,由于色素的吸收作用,使得其光谱形状会随叶绿素的变化而变化;同时获得的后向散射比率620 nm处的变化范围在0.006 4～0.011 6之间;总体上,各波段颗粒物后向散射比率也呈现随叶绿素浓度增加而增大的趋势,但在高叶绿素浓度下,这种变化规律并不明显,并且就其光谱形状而言,无论叶绿素浓度高低,其光谱形状始终保持一致;颗粒密度是影响后向散射比率的主要因素之一,两者之间呈幂函数关系,相关系数r在620 nm处高达0.98。     

Residual stress induced wetting variation on electric brush-plated Cu film

Nanocrystalline Cu film with a mirror surface finishing is prepared by the electric brush-plating technique. The as- prepared Cu film exhibits a superhydrophilic behavior with an apparent water contact angle smaller than 10°. A subsequent increase in the water contact angle and a final wetting transition from inherent hydrophilicity with water contact angle smaller than 90° to apparent hydrophobicity with water contact angle larger than 90° are observed when the Cu film is subjected to natural aging. Analysis based on the measurement of hardness with nanoindentation and the theory of the bond-order-length-strength correlation reveals that this wetting variation on the Cu film is attributed to the relaxation of residual stress generated during brush-plating deposition and a surface hydrophobization role associated with the broken bond polarization induced by surface nanostructure.     

高强度三次谐波转换对光束质量的影响

分别利用光强对比度和功率谱密度作为激光束的振幅调制和位相畸变的定量描述参量,研究了在高功率条件下,三次谐波转换过程对激光光束质量的影响,详细分析了基频光的光束质量与三倍频光光束质量的定量变化关系.     

阴极荧光光谱有效收集效率的计算与测量（I）

从点光源均匀发光模型出发,重点导出了回转半椭球面镜的阴极荧光(Cathodoluminescence,简称CL)光谱有效收集效率η_λ~(eff)的计算公式,分析讨论了收集效率η_λ~(eff)与椭球参数e、收集角、Δφ出射角Δ(?)以及出射光束方位角θ_N的关系,给出了相应的理论计算和模拟实验结果.研究表明,理论计算与实验结果一致.     

透射强度比X射线荧光光谱法测定金属镀层组分

本文介绍了X射线荧光光谱透射强度比测定中等可变厚度金属镀层的组分方法。采用镀层元素强度和基片透射强度之比对镀层元素镀布分量制作工作曲线。     

低温退火的X射线W/Si多层膜应力和结构性能

W/Si多层膜反射镜在硬X射线天文望远镜中有重要应用. 为减小其应力对反射镜面形和望远镜分辨率的影响, 同时保证较高的反射率, 采用150, 175和200 ℃ 的低温退火工艺对采用磁控溅射镀制的W/Si周期多层膜进行后处理. 利用掠入射X射线反射测试和样品表面面形测试对退火前后W/Si多层膜的应力和结构进行表征. 结果表明, 在150 ℃ 退火3 h 后, 多层膜1级峰反射率和膜层结构几乎没有发生变化, 应力减少约27%; 在175 ℃ 退火3 h后, 多层膜膜层结构开始发生变化, 应力减少约50%; 在200 ℃退火3 h 后, 多层膜应力减小超过60%, 但1级布拉格峰反射率相对下降17%, 且膜层结构发生了较大变化. W, Si界面层的增大和相互扩散加剧是应力和反射率下降的主要原因.     

Residual stress/strain analysis in thin films by X-ray diffraction

Residual stresses are found in the majority of multilayer thin film structures used in modem technology. The measurement and modeling of such stress fields and the elucidation of their effects on structural reliability and device operation have been a “growth area” in the literature, with contributions from authors in various scientific and engineering disciplines.

In this article the measurement of the residual stresses in thin film structures with X-ray diffraction techniques is reviewed and the interpretation of such data and their relationship to mechanical reliability concerns are discussed.