金阴极微通道板能谱响应的理论研究

分析了金阴极微通道板在X射线段（0.1～10 keV）的能谱响应,从阴极量子效率,X射线在通道材料中的衰减,微通道壁的铅层的光电效应,微通道板通道增益等多个方面进行综合计算,结果表明:得出较完善的阴极型微通道板能谱响应理论公式及其数值模拟曲线.在只考虑一个通道,增益值为1时,微通道板的能谱响应完全取决于金阴极的量子效率,若考虑多通道效应,微通道板的能谱响应受通道材料元素吸收边的影响发生突变,且通道数目越多,影响越显著;能谱响应随电压增大呈增长趋势,但会受到微通道板饱和电流的限制.实验给出了微通道板能谱响应与入射角的关系曲线,确定了能获得增益的最小入射角.     

电子储存环中插入元件的非线性束流动力学的Lie代数方法

介绍了用能保证哈密顿系统“辛”性质的Lie映射方法来研究电子储存环中的插入元件对束流动力学的影响.并以此方法对合肥光源中将要安装的波荡器UD?–?1对储存环的影响作了初步的研究     

Optical design of high performance con-focal microscopy with digital micro-mirror and stray light filters

This research proposes a newly developed stray light filter in order to eliminate stray light, which otherwise might severely reduce the performance of the con-focal microscopy presented in this research. First, an optical design for con-focal microscopy with a digital micro-mirror device (DMD) is illustrated; second, a newly developed stray light filter is presented, which functions to eliminate possible stray light and ghost images without any sacrifice of luminance. It indicates that not only can the optical system be much simplified but also that its resolution could be one step higher, because the system employs neither a pinhole nor a CCD camera lens. Experimental results are shown in the paper, demonstrating an increase in contrast of up to 60%.     

长寿命导H^＋全固态电致变色器件的研究

研究了导Ｈ＾＋离子全固态电致变色器件性能退化摧在机制，发现有两个因素导致器件性能退化，在器件褪色过程中，存在于ＷＯ３薄膜中的水份将导致ＯＨ＾－在ＷＯ３中积累而在其中产生碱性环境，ＷＯ３溶于碱性环境而生成钨酸盐，在较高电压作用下Ｈ２Ｏ电解释放出气体Ｈ２和Ｏ２而使膜层剥落，通过改进器件结构和改善制备工艺条件，获得了光学密度高达０．５，着色／漂白（Ｃｏｌｏｒ／Ｂｌｅａｃｈ）循环次数高达１０＾６以上的性能     

三元铱配合物磷光体系的白光有机电致发光器件光谱特性研究

将黄光磷光材料bis[2-(4-tertbutylphenyl)benzothiazolato-N,C2’]iridium (acetylacetonate) [(t-bt)₂Ir(acac)]超薄层作为黄光发光层,两个蓝光磷光染料iridium(Ⅲ) bis(4’,6’-difluorophenylpyridinato)tetrakis(1-pyrazolyl)borate (FIr6)和bis[(4,6-difluorophenyl)-pyridinato-N,C2’](picolinate) iridium (Ⅲ) (FIrpic)掺杂层作为蓝光发光层,制备了三元发光层的白光有机电致发光器件。该器件具有三元磷光染料分子协同发光特性,并且利用合适厚度的隔层,将三线态激子束缚在各自激子复合区域内,获得了稳定电致发光光谱,CIE色坐标为(0.29±0.01, 0.34±0.01),处于理想的白光区域。通过器件电学特性的测试,验证了磷光染料在三元发光层器件中电致发光作用的机理,同时结果表明,三元发光层器件由于稳定的激子复合区域而有效减弱了器件效率滚降现象。     

计算机辅助电子线路实验的思考与探索

本文介绍了EltctronicWorkbench软件和计算机虚拟仪器系统，采用计算机模拟仿真技术对电子线路实验加以辅助设计和探索。     

Pixel-based partially coherent image method for maskless lithography system

Maskless lithography (ML) provides a fast and low-cost method for projecting the images of IC or micro features onto photoresist. However, it needs an efficient simulation method to evaluate the performance of lithography process. In this paper, a pixel-based partially coherent image method for digital micro-mirror device (DMD) based ML is proposed based on the linear invariant theory. In our method, the mask is sampled by DMD pixel (each pixel corresponding to each micro-mirror) and expressed by rect function. Using the shift theory of Fourier transform and the stacked pupil operator approach, we build a matrix Φ for system response function of rect function. If the DMD pixel state matrix is S, then the aerial image can be calculated with two matrix multiplication I(x,y) = SΦ.     

超导量子干涉器件

超导现象是一种宏观量子现象.磁通量子化和约瑟夫森效应是两个最能体现这种宏观量子特性的物理现象.超导量子干涉器件(superconducting quantum interference device,SQUID)是利用这两个特性而形成的超导器件.SQUID器件在磁信号灵敏探测方面具有广泛的应用.本文简要介绍低温超导和高温超导SQUID器件的相关背景和发展现状以及应用领域.     

基于器件结构提高TADF-OLED器件的发光性能

为了提高以TADF材料作为主体、天蓝色荧光材料作为客体的混合薄膜的OLED器件光电性能,我们调整了器件结构,使主体材料发挥其优势。制备了基本结构为ITO/NPB(40 nm)/DMAC-DPS∶x%BUBD-1(40 nm)/Bphen(30 nm)/LiF(0.5 nm)/Al的OLED器件。研究了主-客体材料在不同掺杂浓度下的OLED器件的光电特性。为了提高主体材料的利用率,在空穴传输层和发光层之间加入10 nm的DMAC-DPS作为间隔层;然后,在阳极和空穴传输层之间加入HAT-CN作为空穴注入层,形成HAT-CN/NPB结构的PN结,有效降低了器件的启亮电压(2.7 V)。测量了有无HAT-CN的单空穴器件的阻抗谱。结果表明,在最佳掺杂比例(2%)下,器件的外量子效率(EQE)达到4.92%,接近荧光OLED的EQE理论极限值;加入10 nm的DMAC-DPS作为间隔层,使得器件的EQE达到5.37%;HAT-CN/NPB结构的PN结有效地降低了器件的启亮电压(2.7 V),将OLED器件的EQE提高到5.76%;HAT-CN的加入提高了器件的空穴迁移率,降低了单空穴器件的阻抗...     

Design of broadband achromatic metasurface device based on phase-change material Ge2Sb2Te5

Based on the phase-change material Ge₂Sb₂Te₅ (GST), achromatic metasurface optical device in the longer-infrared wavelength is designed. With the combination of the linear phase gradient GST nanopillar and the adjustment of the crystalline fraction m value of GST, the polarization insensitive achromic metalenses and beam deflector metasurface within the longer-infrared wavelength 9.5 μm to 13 μm are realized. The design results show that the achromatic metalenses can be focused on the same focal plane within the working waveband. The simulation calculation results show that the full-width at half-maximum (FWHM) of the focusing spot reaches the diffraction limit at each wavelength. In addition, the same method is also used to design a broadband achromatic beam deflector metasurface with the same deflection angle of 19°. The method proposed in this article not only provides new ideas for the design of achromatic metasurfaces, but also provides new possibilities for the integration of optical imaging, optical coding and other related optical systems.