COMPLETE EXTREMAL SURFACES OF MIXED TYPE IN 3-DIMENSIONAL MINKOWSKI SPACE

ＣＯＭＰＬＥＴＥＥＸＴＲＥＭＡＬＳＵＲＦＡＣＥＳＯＦＭＩＸＥＤＴＹＰＥＩＮ３－ＤＩＭＥＮＳＩＯＮＡＬＭＩＮＫＯＷＳＫＩＳＰＡＣＥ￥ＧＵＣＨＡＯＨＡＯ（ＩｎｓｔｉｔｕｔｅｏｆＭａｔｈｅｍａｔｉｃｓ，ＦｕｄａｎＵｎｉｖｅｒｓｉｔｙ，Ｓｈａｎｇｈａｉ２００...     

金属上化学吸附的族模型量子化学研究

簇模型方法是研究化学吸附的最重要的量子化学方法之一。本文对＇簇－－表面类比法＇的物理内涵、研究现状、以及发展趋势作了简要的评述。     

锂离子电池负极碳材料的表面改性与修饰：Ⅲ,人工施加的固体电解质膜…

研究了人工施加的无机固体电解质体膜对锂碳负极电池性能的影响作用，结果表明碳电极的容量及首次充放电效率相对于未改性电极都得到了一定程度的提高。显示了以这层外界人工施加的晶体膜替代的电极体系本身所形成的钝化膜之有效性，扫描电子显微镜的研究直观地显示了这层人工施加膜的均匀，致密性质。     

分析型反射电子显微镜和表面科学：实验技术和发展

本文综述了反射电子显微术(REM)和反射电子能量损失谱(REELS)在表面科学中的应用。较详细地给出了用这些方法研究表面原子结构、化学成份和电子态的基本实验和理论,指出了发展这一学科对表面研究的重要性。     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.