Effect of Sputtering Parameters on Film Composition,Crystal Structure,and Coercivity of SmCo Based Films Deposited on Si （100） Substrates

The sputtering parameter mediated composition （SPMC） effect of 3.0-μm-thick SmCo-based films is experimentally and theoretically studied. The experimental results give a clear indication that the Sm concentration increases with the decreasing sputtering power or with the increasing Ar gas pressure, which are in agreement with the calculated values when the preferential sputtering effect is disregarded. The SPMC effect provides an opportunity for the same composite target to fabricate films with an Sm concentration varying from 13.8at.% to 17.3at.%, which is reasonable for the magnetic phase transformation （Sm2Co17→SmCo7→SmCo5） and the enhanced coercivity.     

作者索引

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专利介绍

专利名称：水质测量装置 专利申请号：CN200420110604．3 公开号：CN2755610 申请日：2004—12—02 公开日：2006—02—01 申请人：台湾省廖益嘉 一种水质测量装置．其在一平板状主体上设立一凹陷处，该凹陷处可以容纳待测量水质的样品水，通过设置在该凹陷处内的正负极探针，将样品水的电荷信号传递至设于主体上的取样单元，再由微处理器运算得知其水质状况后，     

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Author Index to Vol. 26

A. Beniaiche see L. Krache 070307
A. John Peter Hydrogenic Donor in a Spherical Quantum Dot with Different Confinements 087302
A. M. Rana see Abdul Faheem Khan 077803
A. Mahmood see Abdul Faheem Khan 077803
A. V. Gopal see JIANG Lai-Dong 074201     

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